Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM2 | P08172 | 5/20 | 0.33 |
| ▸ | CHRM4 | P08173 | 5/20 | 0.33 |
| ▸ | CHRM1 | P11229 | 5/20 | 0.33 |
| ▸ | CHRM3 | P20309 | 5/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 3/20 | 0.31 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.31 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.31 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19261189 | 0.87 | MEN1 (0.30) | CHRM2CHRM4CHRM1CHRM3 | |
| SCHEMBL19261187 | 0.85 | — | — | |
| SCHEMBL24944950 | 0.84 | — | — | |
| SCHEMBL20215441 | 0.84 | CHRM2 (0.32) | CHRM2CHRM4CHRM1CHRM3 | |
| SCHEMBL20215440 | 0.83 | EPHX1 (0.30) | EPHX1 | |
| SCHEMBL110826 | 0.82 | EPHX2 (0.36) | CHRM2CHRM4CHRM1CHRM3EPHX1 | |
| SCHEMBL13137680 | 0.82 | EPHX2 (0.36) | CHRM2CHRM4CHRM1CHRM3EPHX1 | |
| SCHEMBL22402970 | 0.82 | PDK1 (0.32) | CHRM2CHRM4CHRM1CHRM3 | |
| SCHEMBL22402971 | 0.80 | — | — | |
| SCHEMBL825461 | 0.80 | EPHX2 (0.34) | CHRM2CHRM4CHRM1CHRM3EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10234757-B2 | Polymer, making method, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-03-19 | — | — | US | disclosed |
| US-9989847-B2 | Onium salt compound, resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-05 | — | — | US | disclosed |