SCHEMBL20215440

SCHEMBL20215440

CCC(I)C(=O)OC(CC)(CC)C1CCCCC1

nearest known ligand 0.37

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.30
FKBP1A P62942 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19261181 0.87
SCHEMBL19261188 0.85
SCHEMBL20215441 0.83 CHRM2 (0.32)
SCHEMBL20215438 0.83 CHRM2 (0.33) EPHX1
SCHEMBL6367790 0.83 EPHX2 (0.35) EPHX1FKBP1A
SCHEMBL9608667 0.82 EPHX1 (0.33) EPHX1FKBP1A
SCHEMBL14617233 0.81 EPHX2 (0.33) EPHX1FKBP1A
SCHEMBL9608663 0.80 FKBP1A (0.33) EPHX1FKBP1A
SCHEMBL10199610 0.79 TSHR (0.31) EPHX1FKBP1A
SCHEMBL14838672 0.78 EPHX1 (0.33) EPHX1FKBP1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10234757-B2 Polymer, making method, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-03-19 US disclosed
US-9989847-B2 Onium salt compound, resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-05 US disclosed