SCHEMBL20215441

SCHEMBL20215441

CCC(I)C(=O)OC(C)(CC)C1CCCCC1

nearest known ligand 0.36

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CHRM2 P08172 3/20 0.32
CHRM4 P08173 3/20 0.32
CHRM1 P11229 3/20 0.32
CHRM3 P20309 3/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19261180 0.88
SCHEMBL19261186 0.86
SCHEMBL20215438 0.84 CHRM2 (0.33) CHRM2CHRM4CHRM1CHRM3
SCHEMBL825572 0.83 EPHX2 (0.35) CHRM2CHRM4CHRM1CHRM3
SCHEMBL20215440 0.83 EPHX1 (0.30)
SCHEMBL9608665 0.83 CHRM2 (0.33) CHRM2CHRM4CHRM1CHRM3
SCHEMBL14617234 0.81 EPHX2 (0.33) CHRM2CHRM4CHRM1CHRM3
SCHEMBL9608664 0.81 FKBP1A (0.32) CHRM2CHRM4CHRM1CHRM3
SCHEMBL22402970 0.79 PDK1 (0.32) CHRM2CHRM4CHRM1CHRM3
SCHEMBL22402971 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10234757-B2 Polymer, making method, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-03-19 US disclosed
US-9989847-B2 Onium salt compound, resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-05 US disclosed