Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 1/20 | 0.35 |
| ▸ | GRM1 | Q13255 | 1/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | GFER | P55789 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20215442 | 0.87 | EPHX2 (0.34) | EPHX2GRM1HSD11B1NPC1ALDH1A1 | |
| SCHEMBL20215446 | 0.87 | EPHX2 (0.34) | EPHX2GRM1HSD11B1NPC1ALDH1A1 | |
| SCHEMBL106940 | 0.85 | EPHX2 (0.36) | EPHX2GRM1HSD11B1NPC1ALDH1A1 | |
| SCHEMBL16684205 | 0.82 | SLC6A3 (0.33) | EPHX2GRM1L3MBTL1POLB | |
| SCHEMBL13920801 | 0.81 | EPHX2 (0.34) | EPHX2GRM1HSD11B1 | |
| SCHEMBL14410159 | 0.81 | EPHX2 (0.33) | EPHX2GRM1HSD11B1 | |
| SCHEMBL13496185 | 0.81 | EPHX2 (0.33) | EPHX2GRM1HSD11B1 | |
| SCHEMBL120796 | 0.79 | EPHX2 (0.40) | EPHX2GRM1HSD11B1NPC1ALDH1A1 | |
| SCHEMBL26939569 | 0.78 | SLC6A3 (0.34) | EPHX2L3MBTL1 | |
| SCHEMBL3674828 | 0.77 | SLC6A3 (0.34) | EPHX2NPC1RAB9AL3MBTL1POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10234757-B2 | Polymer, making method, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-03-19 | — | — | US | disclosed |
| US-9989847-B2 | Onium salt compound, resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-05 | — | — | US | disclosed |