Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A3 | Q01959 | 5/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | BRS3 | P32247 | 1/20 | 0.32 |
| ▸ | KCNQ3 | O43525 | 1/20 | 0.31 |
| ▸ | KCNQ2 | O43526 | 1/20 | 0.31 |
| ▸ | KCNQ4 | P56696 | 1/20 | 0.31 |
| ▸ | KCNQ5 | Q9NR82 | 1/20 | 0.31 |
| ▸ | GRM1 | Q13255 | 1/20 | 0.31 |
| ▸ | ELANE | P08246 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
| ▸ | SLC6A4 | P31645 | 3/20 | 0.30 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26939569 | 0.85 | SLC6A3 (0.34) | SLC6A3EPHX2ATMBRS3ELANE | |
| SCHEMBL3674828 | 0.84 | SLC6A3 (0.34) | SLC6A3EPHX2ATMPOLBBRS3 | |
| SCHEMBL106940 | 0.84 | EPHX2 (0.36) | SLC6A3EPHX2POLBBRS3GRM1 | |
| SCHEMBL4900373 | 0.83 | SLC6A3 (0.33) | SLC6A3EPHX2ATMPOLBBRS3 | |
| SCHEMBL20215445 | 0.82 | EPHX2 (0.35) | EPHX2POLBGRM1L3MBTL1 | |
| SCHEMBL18469141 | 0.81 | EPHX2 (0.32) | EPHX2BRS3 | |
| SCHEMBL19497268 | 0.80 | KMT2A (0.37) | SLC6A3EPHX2POLBL3MBTL1 | |
| SCHEMBL120796 | 0.80 | EPHX2 (0.40) | SLC6A3EPHX2POLBBRS3GRM1 | |
| SCHEMBL9608692 | 0.80 | KMT2A (0.37) | SLC6A3EPHX2POLBL3MBTL1 | |
| SCHEMBL13920801 | 0.79 | EPHX2 (0.34) | EPHX2BRS3GRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| EP-3556783-B1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL CO (JP) | 2022-12-28 | — | — | EP | disclosed |
| EP-3581594-B1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL CO (JP) | 2021-12-29 | — | — | EP | disclosed |
| US-10781198-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-09-22 | — | — | US | disclosed |
| US-20200218154-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-09 | — | — | US | disclosed |
| EP-3556781-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | Sumitomo Chemical Company, Limited (JP) | 2019-10-23 | — | — | EP | disclosed |
| EP-3556783-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | Sumitomo Chemical Company, Limited (JP) | 2019-10-23 | — | — | EP | disclosed |
| US-20170329223-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-11-16 | — | — | US | disclosed |
| US-9771346-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-09-26 | — | — | US | disclosed |
| US-9758466-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9580402-B2 | Salt, acid generator, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-28 | — | — | US | disclosed |
| US-20160237190-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-18 | — | — | US | disclosed |
| US-20160168115-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-06-16 | — | — | US | disclosed |
| US-20160139508-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-19 | — | — | US | disclosed |
| US-20160130212-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-12 | — | — | US | disclosed |
| US-20160131971-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-12 | — | — | US | disclosed |
| US-20160062234-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-03 | — | — | US | disclosed |
| US-20160062233-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-03 | — | — | US | disclosed |
| US-20160052877-A1 | SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-25 | — | — | US | disclosed |
| US-20150118628-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2015-04-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (9 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160062233-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | XDH, HAX1, MLX | SLC6A3 1296/4885EPHX2 1991/4885ATM 3009/4885 |
| US-20160131971-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, RXRA, C1R | SLC6A3 3641/4885EPHX2 344/4885ATM 3478/4885 |
| US-20160237190-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | HAX1, F11, RXRA | SLC6A3 3630/4885EPHX2 1009/4885ATM 1963/4885 |
| US-10781198-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | RER1, BRIX1, NR2E3 | SLC6A3 4088/4885EPHX2 1792/4885ATM 1141/4885 |
| US-20160130212-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | C1R, C9, RER1 | SLC6A3 4002/4885EPHX2 370/4885ATM 3697/4885 |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SCO2, CBR1, OXGR1 | SLC6A3 3193/4885EPHX2 516/4885ATM 2366/4885 |
| US-20160168115-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | FGFR1, RER1, FRG1 | SLC6A3 1239/4885EPHX2 1815/4885ATM 2764/4885 |
| US-20160139508-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | AFF1, AFF2, AFF4 | SLC6A3 4017/4885EPHX2 432/4885ATM 4211/4885 |
| US-20160052877-A1 | SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, AFF1, FRG1 | SLC6A3 1751/4885EPHX2 4251/4885ATM 3816/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.