SCHEMBL2023940

SCHEMBL2023940

C=CC(=O)OCCOC(=O)c1cccc2sc3ccccc3c(=O)c12

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.42
MAOB P27338 2/20 0.40
MAOA P21397 1/20 0.40
MAPT P10636 5/20 0.38
CYP3A4 P08684 2/20 0.38
NPC1 O15118 2/20 0.38
HPGD P15428 2/20 0.38
RAB9A P51151 2/20 0.38
CYP1A2 P05177 1/20 0.38
CYP2C9 P11712 1/20 0.38
CYP2C19 P33261 1/20 0.38
TSHR P16473 4/20 0.37
ALDH1A1 P00352 6/20 0.36
GAA P10253 2/20 0.36
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
POLB P06746 1/20 0.36
TP53 P04637 2/20 0.35
HIF1A Q16665 2/20 0.35
HSD17B10 Q99714 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12795174 0.91 MAOA (0.39) THRBMAOBMAOAMAPTCYP3A4
SCHEMBL16574414 0.89 SCN1A (0.43) MAOBMAOAMAPTCYP3A4RAB9A
SCHEMBL20124723 0.88 MAOA (0.34) THRBMAOBMAOAMAPTCYP3A4
SCHEMBL20428260 0.88 MAPT (0.34) THRBMAOBMAOAMAPTCYP3A4
SCHEMBL11994248 0.88 ADRB2 (0.35) THRBMAOBMAOAMAPTCYP3A4
SCHEMBL28295910 0.84 TSHR (0.56) MAOBMAOAMAPTCYP3A4NPC1
SCHEMBL2022526 0.84 ADRB2 (0.34) THRBMAOBMAOAMAPTCYP3A4
SCHEMBL10844883 0.84 MAOB (0.45) MAOBMAOAMAPTCYP3A4NPC1
SCHEMBL10030951 0.83 THRB (0.45) THRBMAPTCYP3A4NPC1HPGD
SCHEMBL10843627 0.83 MAOB (0.44) MAOBMAOAMAPTCYP3A4NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2889340-A1 INK COMPOSITION, IMAGE FORMATION METHOD, AND PRINTED MATTER FUJIFILM Corporation (JP) 2015-07-01 EP disclosed
US-20150132544-A1 INK COMPOSITION, IMAGE FORMING METHOD, AND PRINTED MATERIAL FUJIFILM CORPORATION (JP) 2015-05-14 US disclosed
US-20150132544-A1 INK COMPOSITION, IMAGE FORMING METHOD, AND PRINTED MATERIAL FUJIFILM CORPORATION (JP) 2015-05-14 US disclosed
US-8536217-B2 Radiation curable compositions AGFA GRAPHICS NV (BE) 2013-09-17 US disclosed
US-8536217-B2 Radiation curable compositions AGFA GRAPHICS NV (BE) 2013-09-17 US disclosed
US-8536217-B2 Radiation curable compositions AGFA GRAPHICS NV (BE) 2013-09-17 US disclosed
US-8530510-B2 Polymerizable photoinitiators and radiation curable compositions AGFA GRAPHICS NV (BE) 2013-09-10 US disclosed
US-8530510-B2 Polymerizable photoinitiators and radiation curable compositions AGFA GRAPHICS NV (BE) 2013-09-10 US disclosed
US-8530510-B2 Polymerizable photoinitiators and radiation curable compositions AGFA GRAPHICS NV (BE) 2013-09-10 US disclosed
US-8414982-B2 Process for the production of strongly adherent coatings BASF SE (DE) 2013-04-09 US disclosed
US-20100178512-A1 CHANGING SURFACE PROPERTIES BY FUNCTIONALIZED NANOPARTICLES CIBA CORPORATION (US) 2010-07-15 US disclosed
WO-2010029017-A1 POLYMERIZABLE PHOTOINITIATORS AND RADIATION CURABLE COMPOSITIONS AGFA GRAPHICS NV (BE) 2010-03-18 WO disclosed
WO-2010029016-A1 RADIATION CURABLE COMPOSITIONS AGFA GRAPHICS NV (BE) 2010-03-18 WO disclosed
EP-2161264-A1 Polymerizable photoinitiators and radiation curable compositions Agfa Graphics N.V. (BE) 2010-03-10 EP disclosed
EP-2161290-A1 Radiation curable compositions Agfa Graphics N.V. (BE) 2010-03-10 EP disclosed
US-20090092768-A1 Process for the Production of Strongly Adherent Coatings CIBA SPECIALTY CHEMICALS CORP. 2009-04-09 US disclosed
US-7455891-B2 Process for the production of strongly adherent coatings CIBA SPECIALTY CHEMICALS CORPORATION (US) 2008-11-25 US disclosed
US-20070128441-A1 Process for the production of strongly adherent coatings CIBA SPECIALTY CHEMICALS CORP. 2007-06-07 US disclosed
US-20070128441-A1 Process for the production of strongly adherent coatings CIBA SPECIALTY CHEMICALS CORP. 2007-06-07 US disclosed
EP-1772479-A1 Silicon coated release substrate Ciba Specialty Chemicals Holding Inc. (CH) 2007-04-11 EP disclosed