SCHEMBL202550

SCHEMBL202550

C=CC(=O)OCCOc1ccc(C(C)(C)c2ccc(OCCOC(=O)C=C)c(OCC)c2OCC)c(OCC)c1OCC

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 5/20 0.45
TSHR P16473 5/20 0.38
HPGD P15428 2/20 0.38
ALDH1A1 P00352 7/20 0.37
TP53 P04637 2/20 0.37
HIF1A Q16665 2/20 0.37
HSD17B10 Q99714 2/20 0.37
FDPS P14324 1/20 0.35
L3MBTL1 Q9Y468 4/20 0.35
LMNA P02545 2/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
MAPK1 P28482 1/20 0.34
CYP3A4 P08684 1/20 0.34
PPARA Q07869 1/20 0.32
POLB P06746 2/20 0.32
THRA P10827 1/20 0.32
CASP6 P55212 1/20 0.32
KDM4E B2RXH2 2/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8926524 0.91 THRB (0.41) THRBTSHRHPGDALDH1A1TP53
SCHEMBL9517386 0.84 THRB (0.46) THRBTSHRHPGDALDH1A1L3MBTL1
SCHEMBL32674609 0.84 THRB (0.46) THRBTSHRHPGDALDH1A1L3MBTL1
SCHEMBL29385502 0.84 THRB (0.39) THRBTSHRHPGDALDH1A1HSD17B10
SCHEMBL228775 0.84 THRB (0.39) THRBTSHRHPGDALDH1A1HSD17B10
SCHEMBL9065182 0.83 THRB (0.38) THRBTSHRHPGDALDH1A1HSD17B10
SCHEMBL10708460 0.83 THRB (0.38) THRBTSHRHPGDALDH1A1HSD17B10
SCHEMBL203765 0.82 THRB (0.43) THRBTSHRHPGDALDH1A1HSD17B10
SCHEMBL32674611 0.81 THRB (0.43) THRBTSHRHPGDALDH1A1L3MBTL1
SCHEMBL8651164 0.81 THRB (0.46) THRBTSHRHPGDALDH1A1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 115 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0716102-B1 TRANSPARENT PLASTIC MATERIAL, OPTICAL ARTICLE MADE THEREFROM, AND PRODUCTION PROCESS SEIKO EPSON CORP (JP) 2002-02-06 EP claimed
EP-2213707-B1 INK COMPOSITION SEIKO EPSON CORP (JP) 2018-07-18 EP disclosed
US-9979048-B2 Polymer electrolyte for lithium battery and lithium battery employing the polymer electrolyte SAMSUNG ELECTRONICS CO., LTD. (KR) 2018-05-22 US disclosed
US-9725608-B2 Ink jet recording ink, ink jet recording ink set, recording method, recorded matter and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2017-08-08 US disclosed
EP-2879224-B1 Polymer electrolyte for lithium battery and lithium battery employing the polymer electrolyte SAMSUNG ELECTRONICS CO LTD (KR) 2017-05-31 EP disclosed
US-20150323850-A1 METHOD FOR PREPARING ELECTROPHORETIC PARTICLES, ELECTROPHORETIC PARTICLES, ELECTROPHORETIC DISPERSION, ELECTROPHORETIC SHEET, ELECTROPHORETIC APPARATUS, AND ELECTRONIC DEVICE SEIKO EPSON CORPORATION (JP) 2015-11-12 US disclosed
US-20150155594-A1 POLYMER ELECTROLYTE FOR LITHIUM BATTERY AND LITHIUM BATTERY EMPLOYING THE POLYMER ELECTROLYTE SAMSUNG ELECTRONICS CO., LTD. (KR) 2015-06-04 US disclosed
EP-2879224-A1 Polymer electrolyte for lithium battery and lithium battery employing the polymer electrolyte Samsung Electronics Co., Ltd (KR) 2015-06-03 EP disclosed
US-9025237-B2 Electrophoresis particle, method of manufacturing electrophoresis particle, electrophoresis dispersion liquid, electrophoresis sheet, electrophoresis device and electronic apparatus SEIKO EPSON CORPORATION (JP) 2015-05-05 US disclosed
EP-1295916-B1 INK-JET RECORDING INK, INK-JET RECORDING INK SET, RECORDING METHOD, PRINT, AND INK-JET RECORDING APPARATUS SEIKO EPSON CORP (JP) 2014-11-26 EP disclosed
EP-1195822-A2 Lithium based battery with extensible cover NISSHINBO INDUSTRIES INC. (JP) 2002-04-10 EP disclosed
US-20020034685-A1 Prevention of short-circuit current ITOCHU CORPORATION (JP) 2002-03-21 US disclosed
EP-0716102-B1 TRANSPARENT PLASTIC MATERIAL, OPTICAL ARTICLE MADE THEREFROM, AND PRODUCTION PROCESS SEIKO EPSON CORP (JP) 2002-02-06 EP disclosed
US-20020009649-A1 Polymer battery and method of manufacture NISSHINBO INDUSTRIES, INC. (JP) 2002-01-24 US disclosed
EP-1164654-A2 Polymer battery and method of manufacture NISSHINBO INDUSTRIES, INC. (JP) 2001-12-19 EP disclosed
EP-1153991-A1 INK SET FOR INK-JET RECORDING, PROCESS FOR PRODUCING THE SAME, METHOD OF IMAGE RECORDING, AND PRINT SEIKO EPSON CORPORATION (JP) 2001-11-14 EP disclosed
EP-1107267-A1 ELECTROLYTE COMPOSITION FOR ELECTRIC DOUBLE LAYER CAPACITOR, SOLID POLYMER ELECTROLYTE, COMPOSITION FOR POLARIZABLE ELECTRODE, POLARIZABLE ELECTRODE, AND ELECTRIC DOUBLE LAYER CAPACITOR NISSHINBO INDUSTRIES, INC. (JP) 2001-06-13 EP disclosed
EP-1090956-A1 COMPOSITION FOR IONICALLY CONDUCTIVE SOLID POLYMER, IONICALLY CONDUCTIVE SOLID POLYELECTROLYTE, BINDER RESIN, AND SECONDARY BATTERY NISSHINBO INDUSTRIES, INC. (JP) 2001-04-11 EP disclosed
EP-1057869-A1 COMPOSITION FOR IONICALLY CONDUCTIVE POLYELECTROLYTE AND IONICALLY CONDUCTIVE SOLID POLYELECTROLYTE NISSHINBO INDUSTRIES, INC. (JP) 2000-12-06 EP disclosed
EP-0716102-A1 TRANSPARENT PLASTIC MATERIAL, OPTICAL ARTICLE MADE THEREFROM, AND PRODUCTION PROCESS SEIKO EPSON CORPORATION (JP) 1996-06-12 EP disclosed