Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 4/20 | 0.39 |
| ▸ | THRA | P10827 | 1/20 | 0.39 |
| ▸ | EGFR | P00533 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.33 |
| ▸ | HCRTR1 | O43613 | 2/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | TYMS | P04818 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 3/20 | 0.32 |
| ▸ | RAB9A | P51151 | 3/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.32 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29385502 | 1.00 | THRB (0.39) | THRBTHRAEGFRALDH1A1SMN1; SMN2 | |
| SCHEMBL8926524 | 0.94 | THRB (0.41) | THRBTHRAEGFRALDH1A1SMN1; SMN2 | |
| Methacrylic Acid SCHEMBL9099472 | 0.93 | THRB (0.35) | THRBTHRAEGFRALDH1A1MEN1 | |
| Phenol SCHEMBL5441534 | 0.92 | THRB (0.39) | THRBTHRAALDH1A1SMN1; SMN2MEN1 | |
| SCHEMBL32674600 | 0.91 | TSHR (0.35) | THRBTHRAEGFRALDH1A1SMN1; SMN2 | |
| SCHEMBL11136673 | 0.91 | TSHR (0.35) | THRBTHRAEGFRALDH1A1SMN1; SMN2 | |
| SCHEMBL11212312 | 0.91 | THRB (0.34) | THRBTHRACYP2C19TSHR | |
| SCHEMBL10708460 | 0.90 | THRB (0.38) | THRBTHRAEGFRALDH1A1SMN1; SMN2 | |
| SCHEMBL9065182 | 0.90 | THRB (0.38) | THRBTHRAEGFRALDH1A1SMN1; SMN2 | |
| SCHEMBL8950107 | 0.89 | THRB (0.40) | THRBTHRAEGFRALDH1A1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1133 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12552956-B2 | Photopolymerizable type dental surface coating composition | SHOFU INC. (JP) | 2026-02-17 | — | — | US | claimed |
| WO-2010021476-A2 | PHOTOPOLYMERIZABLE OLIGOMER, PHOTOPOLYMERIZABLE RESIN COMPOSITION CONTAINING THE SAME, AND OPTICAL FIBER | 에스에스씨피 주식회사 (KR) | 2010-02-25 | — | — | WO | claimed |
| EP-0735062-B1 | ACTINIC-RADIATION-CURABLE COMPOSITION AND LENS SHEET | MITSUBISHI RAYON CO (JP) | 2002-01-30 | — | — | EP | claimed |
| US-6206550-B1 | BACKLIGHT WITH LENS PORTION MADE FROM A CURABLE COMPOSITION WHICH INCLUDES A BIS(4-(METH)ACRYLOYL-THIOPHENYL) SULFIDE AND (METH)ACRYLATES; HIGH BRIGHTNESS-ENHANCING EFFECT ON LENSES OF PROJECTION TVS AND STEREOSCOPIC PHOTOGRAPHY. | MITSUBISHI RAYON COMPANY LTD. (JP) | 2001-03-27 | — | — | US | claimed |
| US-6177511-B1 | ANIONIC, CATIONIC, NONIONIC OR AMPHOTERIC SURFACTANTS; DIACRYLATES AND/OR OLIGOACRYLATES | WACKER-CHEMIE GMBH (DE) | 2001-01-23 | — | — | US | claimed |
| EP-0626431-B1 | PHOTOCURABLE CONDUCTIVE COATING COMPOSITION | SEKISUI CHEMICAL CO LTD (JP) | 2000-01-26 | — | — | EP | claimed |
| US-5969867-A | ACRYLIC ESTERS | MITSUBISHI RAYON COMPANY LTD. (JP) | 1999-10-19 | — | — | US | claimed |
| US-5886136-A | Pattern forming process | NIPPON ZEON CO., LTD. (JP) | 1999-03-23 | — | — | US | claimed |
| US-5777068-A | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 1998-07-07 | — | — | US | claimed |
| EP-0735062-A1 | ACTINIC-RADIATION-CURABLE COMPOSITION AND LENS SHEET | MITSUBISHI RAYON CO., LTD. (JP) | 1996-10-02 | — | — | EP | claimed |
| US-5429846-A | Antimony oxide-containing tin oxide powder, (meth) acrylate compound, acetal resin, photopolymerization initiator and organic solvent | SEKISUI CHEMICAL CO., LTD. (JP) | 1995-07-04 | — | — | US | claimed |
| EP-0626431-A1 | PHOTOCURABLE CONDUCTIVE COATING COMPOSITION | SEKISUI CHEMICAL CO., LTD. (JP) | 1994-11-30 | — | — | EP | claimed |
| EP-0321618-B1 | PHOTOSENSITIVE HARDENABLE COMPOSITIONS | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 1993-02-17 | — | — | EP | claimed |
| EP-0035574-B1 | PHOTO-POLYMERIZABLE LIGHT-SENSITIVE RESIN COMPOSITION AND LIGHT-SENSITIVE SHEET MATERIAL | ARAI, Tokuji (JP) | 1985-02-06 | — | — | EP | claimed |
| EP-0012948-B1 | SCRATCH-RESISTANT, DYEABLE COATING COMPOSITIONS FOR SYNTHETIC RESIN ARTICLES | MITSUBISHI RAYON CO., LTD. (JP) | 1983-02-02 | — | — | EP | claimed |
| US-4370403-A | BENZIL AND /DIMETHYLAMINO/BENZALDEHYDE PHOTOINITIATORS | Arai, Tokuji (JP) | 1983-01-25 | — | — | US | claimed |
| US-4291097-A | PHOTOPOLYMERIZATION OF AN ACRYLIC ESTER MIXTURE WITH PHOSPHORIC ACID ESTER AND AN ETHANOLAMINE | MITSUBISHI RAYON CO., LTD. (JP) | 1981-09-22 | — | — | US | claimed |
| EP-0035574-A1 | PHOTO-POLYMERIZABLE LIGHT-SENSITIVE RESIN COMPOSITION AND LIGHT-SENSITIVE SHEET MATERIAL | ARAI, Tokuji (JP) | 1981-09-16 | — | — | EP | claimed |
| EP-0012948-A1 | Scratch-resistant, dyeable coating compositions for synthetic resin articles | MITSUBISHI RAYON CO., LTD. (JP) | 1980-07-09 | — | — | EP | claimed |
| JP-62074912-A | — | — | None | — | — | JP | disclosed |
| JP-3070715-A | — | — | None | — | — | JP | disclosed |
| JP-6230571-A | — | — | None | — | — | JP | disclosed |
| JP-63004988-A | — | — | None | — | — | JP | disclosed |
| JP-5096630-A | — | — | None | — | — | JP | disclosed |
| US-20260110823-A1 | OPTICAL ELEMENT, OPTICAL APPARATUS, IMAGING APPARATUS, AND COMPOUND | CANON KK (JP) | 2026-04-23 | — | — | US | disclosed |
| US-12529822-B2 | Optical element, optical apparatus, imaging apparatus, and compound | CANON KABUSHIKI KAISHA (JP) | 2026-01-20 | — | — | US | disclosed |
| US-12479976-B2 | Cured product, optical element, optical apparatus, and imaging apparatus | CANON KABUSHIKI KAISHA (JP) | 2025-11-25 | — | — | US | disclosed |
| US-12393130-B2 | Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus | CANON KABUSHIKI KAISHA (JP) | 2025-08-19 | — | — | US | disclosed |
| EP-3929237-B1 | COMPOSITE PARTICLES, COMPOSITE-PARTICLE COMPOSITION, AND METHOD FOR PRODUCING COMPOSITE-PARTICLE COMPOSITION | TOPPAN INC (JP) | 2025-07-09 | — | — | EP | disclosed |
| US-20250206888-A1 | PHOTOREACTIVE ORGANOPOLYSILOXANE, METHOD FOR PRODUCING SAME, AND PHOTOCURABLE COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-06-26 | — | — | US | disclosed |
| US-20250155846-A1 | VOLUME HOLOGRAM LAMINATE, METHOD FOR PRODUCING VOLUME HOLOGRAM LAMINATE, VOLUME HOLOGRAM TRANSFER FOIL, VOLUME HOLOGRAM LABEL, VOLUME HOLOGRAM SHEET FOR EMBEDDING, CARD, AND HOLOGRAM STICKER-TYPE PRODUCT | DAI NIPPON PRINTING CO., LTD. (JP) | 2025-05-15 | — | — | US | disclosed |
| EP-4512849-A1 | PHOTOREACTIVE ORGANOPOLYSILOXANE, METHOD FOR PRODUCING SAME, AND PHOTOCURABLE COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-02-26 | — | — | EP | disclosed |
| US-20250034294-A1 | CURED PRODUCT, OPTICAL ELEMENT, OPTICAL APPARATUS, AND IMAGE PICKUP APPARATUS | CANON KK (JP) | 2025-01-30 | — | — | US | disclosed |
| US-12195608-B2 | Composite particles, composite-particle composition, and method for producing composite-particle composition | TOPPAN INC. (JP) | 2025-01-14 | — | — | US | disclosed |
| US-12146011-B2 | Cured product, optical element, optical apparatus, and image pickup apparatus | CANON KABUSHIKI KAISHA (JP) | 2024-11-19 | — | — | US | disclosed |
| WO-2024228369-A1 | OPTICAL ELEMENT, METHOD FOR MANUFACTURING OPTICAL ELEMENT, MATERIAL SET, OPTICAL APPARATUS, AND SYSTEM | ソニーグループ株式会社 | 2024-11-07 | — | — | WO | disclosed |
| EP-4459379-A1 | VOLUME HOLOGRAM LAMINATE, METHOD FOR PRODUCING VOLUME HOLOGRAM LAMINATE, VOLUME HOLOGRAM TRANSFER FOIL, VOLUME HOLOGRAM LABEL, VOLUME HOLOGRAM SHEET FOR EMBEDDING, CARD, AND HOLOGRAM STICKER-TYPE PRODUCT | Dai Nippon Printing Co., Ltd. (JP) | 2024-11-06 | — | — | EP | disclosed |
| EP-3591441-B1 | OPTICAL ELEMENT, MATERIAL, OPTICAL DEVICE AND COMPOUND | CANON KK (JP) | 2024-11-06 | — | — | EP | disclosed |
| EP-3736297-B1 | COMPOSITE PARTICLES, PRODUCTION METHOD FOR COMPOSITE PARTICLES, DRY POWDER, AND RESIN COMPOSITION FOR MOLDING | TOPPAN PRINTING CO LTD (JP) | 2024-10-16 | — | — | EP | disclosed |
| US-12075775-B2 | Sustained-release composite particles, method for producing sustained-release composite particles, dry powder, and wallpaper | TOPPAN PRINTING CO., LTD. (JP) | 2024-09-03 | — | — | US | disclosed |
| EP-4095167-B1 | CURED PRODUCT, OPTICAL ELEMENT, OPTICAL APPARATUS, AND IMAGE PICKUP APPARATUS | CANON KK (JP) | 2024-08-28 | — | — | EP | disclosed |
| US-12066593-B2 | (Meth)acrylate compound | CANON KABUSHIKI KAISHA (JP) | 2024-08-20 | — | — | US | disclosed |
| WO-2024143098-A1 | URETHANE (METH)ACRYLATE, CURABLE COMPOSITION, CURED BODY, LAMINATE, OPTICAL ARTICLE, LENSES, AND EYEGLASSES | 株式会社トクヤマ | 2024-07-04 | — | — | WO | disclosed |
| US-20240218215-A1 | COMPOSITION | DENKA COMPANY LIMITED (JP) | 2024-07-04 | — | — | US | disclosed |
| EP-3995493-B1 | CHROMENE COMPOUND AND PHOTOCHROMIC OPTICAL ARTICLE | TOKUYAMA CORP (JP) | 2024-07-03 | — | — | EP | disclosed |
| WO-2024128160-A1 | CURABLE COMPOSITION, CURED BODY, LAMINATE, LENS, AND SPECTACLES | 株式会社トクヤマ | 2024-06-20 | — | — | WO | disclosed |
| WO-2024128158-A1 | CURABLE COMPOSITION, CURED BODY, LAMINATE, LENS, AND SPECTACLES | 株式会社トクヤマ | 2024-06-20 | — | — | WO | disclosed |
| WO-2024128159-A1 | CURABLE COMPOSITION, CURED BODY, LAMINATE, LENS, AND SPECTACLES | 株式会社トクヤマ | 2024-06-20 | — | — | WO | disclosed |
| EP-3498742-B1 | PHOTOCHROMIC CURABLE COMPOSITION, USE THEREOF, AND POLYROTAXANE MONOMERS | TOKUYAMA CORP (JP) | 2024-06-12 | — | — | EP | disclosed |
| US-20240182749-A1 | PHOTOCHROMIC CURABLE COMPOSITION, PHOTOCHROMIC LAMINATE AND METHOD FOR PRODUCING THE SAME | TOKUYAMA CORPORATION (JP) | 2024-06-06 | — | — | US | disclosed |
| US-20240158647-A1 | PHOTOCHROMIC CURABLE COMPOSITION | TOKUYAMA CORPORATION (JP) | 2024-05-16 | — | — | US | disclosed |
| US-11976149-B2 | Curable composition for optical materials, and optical material | TOKUYAMA CORPORATION (JP) | 2024-05-07 | — | — | US | disclosed |
| EP-3689936-B1 | BLOCKED POLYISOCYANATE COMPOSITION AND USE THEREOF | ASAHI CHEMICAL IND (JP) | 2024-03-06 | — | — | EP | disclosed |
| EP-4328279-A1 | COMPOSITION | Denka Company Limited (JP) | 2024-02-28 | — | — | EP | disclosed |
| EP-4306318-A1 | PHOTOCHROMIC CURABLE COMPOSITION, PHOTOCHROMIC LAMINATE, AND METHOD FOR PRODUCING SAME | Tokuyama Corporation (JP) | 2024-01-17 | — | — | EP | disclosed |
| EP-4306319-A1 | PHOTOCHROMIC CURABLE COMPOSITION | Tokuyama Corporation (JP) | 2024-01-17 | — | — | EP | disclosed |
| US-20230409150-A1 | TOUCH PANEL CONDUCTIVE MEMBER AND METHOD FOR PRODUCING TOUCH PANEL CONDUCTIVE MEMBER | FUJIFILM CORPORATION (JP) | 2023-12-21 | — | — | US | disclosed |
| WO-2023203869-A1 | PHOTOREACTIVE ORGANOPOLYSILOXANE, METHOD FOR PRODUCING SAME, AND PHOTOCURABLE COMPOSITION | 信越化学工業株式会社 | 2023-10-26 | — | — | WO | disclosed |
| US-20230320972-A1 | COMPOSITE PARTICLES, METHOD OF PRODUCING COMPOSITE PARTICLES AND DRY POWDER OF COMPOSITE PARTICLES, SKIN APPLICATION COMPOSITION AND METHOD OF PRODUCING THE SKIN APPLICATION COMPOSITION | TOPPAN INC. (JP) | 2023-10-12 | — | — | US | disclosed |
| EP-3506394-B1 | COMPOSITION FOR NONAQUEOUS SECONDARY BATTERY FUNCTIONAL LAYERS, FUNCTIONAL LAYER FOR NONAQUEOUS SECONDARY BATTERIES, NONAQUEOUS SECONDARY BATTERY, AND METHOD FOR PRODUCING ELECTRODE FOR NONAQUEOUS SECONDARY BATTERIES | ZEON CORP (JP) | 2023-10-11 | — | — | EP | disclosed |
| US-20230220183-A1 | CURED PRODUCT, OPTICAL ELEMENT, OPTICAL APPARATUS, AND IMAGING APPARATUS | CANON KABUSHIKI KAISHA (JP) | 2023-07-13 | — | — | US | disclosed |
| EP-3345954-B1 | POLYROTAXANE, PRODUCTION METHOD THEREFOR, AND OPTICAL COMPOSITION CONTAINING SAID POLYROTAXANE | TOKUYAMA CORP (JP) | 2023-07-05 | — | — | EP | disclosed |
| US-11685799-B2 | Composite particles, method of producing composite particles, dry powder, and molding resin composition | TOPPAN PRINTING CO., LTD. (JP) | 2023-06-27 | — | — | US | disclosed |
| WO-2023113043-A1 | VOLUME HOLOGRAM LAMINATE, METHOD FOR PRODUCING VOLUME HOLOGRAM LAMINATE, VOLUME HOLOGRAM TRANSFER FOIL, VOLUME HOLOGRAM LABEL, VOLUME HOLOGRAM SHEET FOR EMBEDDING, CARD, AND HOLOGRAM STICKER-TYPE PRODUCT | 大日本印刷株式会社 | 2023-06-22 | — | — | WO | disclosed |
| US-11674053-B2 | Composition for forming underlayer film of self-assembled film including aliphatic polycyclic structure | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-06-13 | — | — | US | disclosed |
| US-11661473-B2 | Blocked polyisocyanate composition and use thereof | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2023-05-30 | — | — | US | disclosed |
| US-11649327-B2 | Photochromic curable composition, use thereof, and polyrotaxane monomers | TOKUYAMA CORPORATION (JP) | 2023-05-16 | — | — | US | disclosed |
| US-11643561-B2 | Process for the preparation of metallic nano-particle layers and their use for decorative or security elements | BASF SE | 2023-05-09 | — | — | US | disclosed |
| EP-4163270-A1 | COMPOUND FOR OPTICAL MATERIAL, CURABLE COMPOSITION, CURED BODY, AND OPTICAL ARTICLE | Tokuyama Corporation (JP) | 2023-04-12 | — | — | EP | disclosed |
| US-20230109024-A1 | PHOTOCHROMIC CURABLE COMPOSITION AND PHOTOCHROMIC OPTICAL ARTICLE | TOKUYAMA CORPORATION (JP) | 2023-04-06 | — | — | US | disclosed |
| US-20230104741-A1 | Primer Composition for Optical Article, and Laminate | TOKUYAMA CORPORATION (JP) | 2023-04-06 | — | — | US | disclosed |
| US-20230088268-A1 | MOISTURE CURABLE POLYURETHANE COMPOSITION AND LAMINATE | TOKUYAMA CORPORATION (JP) | 2023-03-23 | — | — | US | disclosed |
| US-20230090596-A1 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS | CANON KABUSHIKI KAISHA (JP) | 2023-03-23 | — | — | US | disclosed |
| US-11597874-B2 | Photochromic curable composition | TOKUYAMA CORPORATION (JP) | 2023-03-07 | — | — | US | disclosed |
| EP-3653615-B1 | CHROMENE COMPOUND, CURABLE COMPOSITION COMPRISING SAME, AND OPTICAL ARTICLE COMPRISING CURED PRODUCT FORMED OF CURABLE COMPOSITION | TOKUYAMA CORP (JP) | 2023-03-01 | — | — | EP | disclosed |
| EP-3228672-B2 | COATING COMPOSITION, AND OPTICAL PRODUCT HAVING COATING LAYER MADE FROM SAID COATING COMPOSITION | TOKUYAMA CORP (JP) | 2023-02-15 | — | — | EP | disclosed |
| US-11578174-B2 | Polyrotaxane, production method therefor, and optical composition containing said polyrotaxane | TOKUYAMA CORPORATION (JP) | 2023-02-14 | — | — | US | disclosed |
| US-11567238-B2 | Laminate, antireflection product having three-dimensional curved surface, and method of manufacturing antireflection product | FUJIFILM CORPORATION (JP) | 2023-01-31 | — | — | US | disclosed |
| EP-4112299-A1 | MOISTURE CURABLE POLYURETHANE COMPOSITION AND LAMINATE | Tokuyama Corporation (JP) | 2023-01-04 | — | — | EP | disclosed |
| EP-4112663-A1 | PHOTOCHROMIC CURABLE COMPOSITION AND PHOTOCHROMIC OPTICAL ARTICLE | Tokuyama Corporation (JP) | 2023-01-04 | — | — | EP | disclosed |
| US-20220403066-A1 | CURED PRODUCT, OPTICAL ELEMENT, OPTICAL APPARATUS, AND IMAGE PICKUP APPARATUS | CANON KABUSHIKI KAISHA (JP) | 2022-12-22 | — | — | US | disclosed |
| EP-3770182-B1 | PHOTOCHROMIC CURABLE COMPOSITION | TOKUYAMA CORP (JP) | 2022-12-07 | — | — | EP | disclosed |
| EP-4095167-A1 | CURED PRODUCT, OPTICAL ELEMENT, OPTICAL APPARATUS, AND IMAGE PICKUP APPARATUS | CANON KABUSHIKI KAISHA (JP) | 2022-11-30 | — | — | EP | disclosed |
| US-11500129-B2 | Optical element, material, optical apparatus and compound | CANON KABUSHIKI KAISHA (JP) | 2022-11-15 | — | — | US | disclosed |
| WO-2022230874-A1 | COMPOSITION | デンカ株式会社 | 2022-11-03 | — | — | WO | disclosed |
| WO-2022210415-A1 | MULTILAYER BODY, CURED PRODUCT OF SAME, AND ELECTRONIC COMPONENT COMPRISING SAID CURED PRODUCT | 太陽インキ製造株式会社 | 2022-10-06 | — | — | WO | disclosed |
| US-20220226198-A1 | REDOX CURING DENTAL COMPOSITION | DENTSPLY SIRONA INC. (US) | 2022-07-21 | — | — | US | disclosed |
| US-20220213050-A1 | CHROMENE COMPOUND AND PHOTOCHROMIC OPTICAL ARTICLE | TOKUYAMA CORPORATION (JP) | 2022-07-07 | — | — | US | disclosed |
| US-20220176682-A1 | INTERMEDIATE FILM FOR LAMINATED GLASS AND LAMINATED GLASS | SEKISUI CHEMICAL CO., LTD. (JP) | 2022-06-09 | — | — | US | disclosed |
| EP-3995514-A1 | COMPOSITE PARTICLE AND METHOD FOR PRODUCING COMPOSITE PARTICLE | TOPPAN INC. (JP) | 2022-05-11 | — | — | EP | disclosed |
| EP-3995493-A1 | CHROMENE COMPOUND AND PHOTOCHROMIC OPTICAL ARTICLE | Tokuyama Corporation (JP) | 2022-05-11 | — | — | EP | disclosed |
| US-20220137261-A1 | OPTICAL ELEMENT, OPTICAL APPARATUS, IMAGING APPARATUS, AND COMPOUND | CANON KABUSHIKI KAISHA (JP) | 2022-05-05 | — | — | US | disclosed |
| EP-3981796-A1 | COMPOSITE PARTICLE AND METHOD FOR PRODUCING SAME, PERSONAL CARE PRODUCT, PARTICLES FOR PERSONAL CARE AND METHOD FOR PRODUCING SAME, PERSONAL CARE GOODS, AND COMPOSITION FOR PERSONAL CARE | TOPPAN INC. (JP) | 2022-04-13 | — | — | EP | disclosed |
| US-20220106412-A1 | COMPOSITE PARTICLES AND METHOD FOR PRODUCING COMPOSITE PARTICLES | TOPPAN INC. (JP) | 2022-04-07 | — | — | US | disclosed |
| US-20220087910-A1 | COMPOSITE PARTICLES AND METHOD OF PRODUCING THE SAME, PERSONAL CARE PRODUCT, PERSONAL CARE PARTICLES AND METHOD OF PRODUCING THE SAME, PERSONAL CARE ARTICLE, AND PERSONAL CARE COMPOSITION | TOPPAN INC. (JP) | 2022-03-24 | — | — | US | disclosed |
| US-20220056187-A1 | CURABLE COMPOSITION FOR OPTICAL MATERIALS, AND OPTICAL MATERIAL | TOKUYAMA CORPORATION (JP) | 2022-02-24 | — | — | US | disclosed |
| US-20220049039-A1 | RADICAL POLYMERIZABLE RESIN COMPOSITION AND STRUCTURE REPAIRING MATERIAL | SHOWA DENKO K.K. (JP) | 2022-02-17 | — | — | US | disclosed |
| US-20220049037-A1 | CURABLE COMPOSITION FOR OPTICAL MATERIALS, AND OPTICAL MATERIAL | TOKUYAMA CORPORATION (JP) | 2022-02-17 | — | — | US | disclosed |
| EP-3943291-A1 | INTERMEDIATE FILM FOR LAMINATED GLASS, AND LAMINATED GLASS | SEKISUI CHEMICAL CO., LTD. (JP) | 2022-01-26 | — | — | EP | disclosed |
| EP-3929237-A1 | COMPOSITE PARTICLES, COMPOSITE-PARTICLE COMPOSITION, AND METHOD FOR PRODUCING COMPOSITE-PARTICLE COMPOSITION | TOPPAN INC. (JP) | 2021-12-29 | — | — | EP | disclosed |
| US-11194169-B2 | Light diffraction film and wearable display device | FUJIFILM CORPORATION (JP) | 2021-12-07 | — | — | US | disclosed |
| US-20210363329-A1 | COMPOSITE PARTICLES, COMPOSITE-PARTICLE COMPOSITION, AND METHOD FOR PRODUCING COMPOSITE-PARTICLE COMPOSITION | TOPPAN INC. (JP) | 2021-11-25 | — | — | US | disclosed |
| EP-3901180-A1 | CURABLE COMPOSITION FOR OPTICAL MATERIALS, AND OPTICAL MATERIAL | Tokuyama Corporation (JP) | 2021-10-27 | — | — | EP | disclosed |
| EP-3901185-A1 | CURABLE COMPOSITION FOR OPTICAL MATERIALS, AND OPTICAL MATERIAL | Tokuyama Corporation (JP) | 2021-10-27 | — | — | EP | disclosed |
| US-20210283655-A1 | STRUCTURE REPAIRING METHOD | SHOWA DENKO K.K. (JP) | 2021-09-16 | — | — | US | disclosed |
| US-20210284866-A1 | HARDCOAT FILM AND ARTICLE AND IMAGE DISPLAY DEVICE HAVING HARDCOAT FILM | FUJIFILM CORPORATION (JP) | 2021-09-16 | — | — | US | disclosed |
| US-20210247546-A1 | (METH)ACRYLATE COMPOUND | CANON KABUSHIKI KAISHA (JP) | 2021-08-12 | — | — | US | disclosed |
| WO-2021153943-A1 | POLYMERIZATION CURING RATE-ADJUSTED COMPOSITION FOR HIGHLY REFRACTIVE EPISULFIDE-BASED OPTICAL MATERIAL AND METHOD FOR MANUFACTURING OPTICAL MATERIAL BY USING SAME | 주식회사 케이오씨솔루션 | 2021-08-05 | — | — | WO | disclosed |
| EP-3858880-A1 | RADICAL POLYMERIZABLE RESIN COMPOSITION AND STRUCTURE REPAIRING MATERIAL | Showa Denko K.K. (JP) | 2021-08-04 | — | — | EP | disclosed |
| EP-3858805-A1 | STRUCTURE REPAIRING METHOD | Showa Denko K.K. (JP) | 2021-08-04 | — | — | EP | disclosed |
| US-11078314-B2 | Fluorine-containing copolymer, composition for forming film, and optical film | FUJIFILM CORPORATION (JP) | 2021-08-03 | — | — | US | disclosed |
| US-11066523-B2 | Photochromic polyrotaxane compound and curable composition comprising the photochromic polyrotaxane compound | TOKUYAMA CORPORATION (JP) | 2021-07-20 | — | — | US | disclosed |
| US-20210214471-A1 | RADICALLY POLYMERIZABLE PUTTY-LIKE RESIN COMPOSITION, SEALING AGENT AND CRACK REPAIRING METHOD | SHOWA DENKO K.K. (JP) | 2021-07-15 | — | — | US | disclosed |
| US-20210171786-A1 | PROCESS FOR THE PREPARATION OF METALLIC NANO-PARTICLE LAYERS AND THEIR USE FOR DECORATIVE OR SECURITY ELEMENTS | BASF SE (DE) | 2021-06-10 | — | — | US | disclosed |
| EP-3825346-A1 | PHOTOCHROMIC COMPOUND AND CURABLE COMPOSITION CONTAINING SAID PHOTOCHROMIC COMPOUND | Tokuyama Corporation (JP) | 2021-05-26 | — | — | EP | disclosed |
| US-20210086545-A1 | PROCESS FOR THE PRODUCTION OF STRONGLY ADHERENT (EMBOSSED) FILMS ON FLEXIBLE SUBSTRATES | BASF SE (DE) | 2021-03-25 | — | — | US | disclosed |
| EP-3786232-A1 | COMPOSITE PARTICLES, METHOD FOR PRODUCING COMPOSITE PARTICLES, DRY POWDER, COMPOSITION FOR APPLICATION TO SKIN, AND METHOD FOR PRODUCING COMPOSITION FOR APPLICATION TO SKIN | Toppan Printing Co., Ltd. (JP) | 2021-03-03 | — | — | EP | disclosed |
| EP-3784499-A1 | PROCESS FOR THE PRODUCTION OF STRONGLY ADHERENT (EMBOSSED) FILMS ON FLEXIBLE SUBSTRATES | BASF SE (DE) | 2021-03-03 | — | — | EP | disclosed |
| EP-3786231-A1 | SUSTAINED-RELEASE COMPOSITE PARTICLES, METHOD FOR PRODUCING SUSTAINED-RELEASE COMPOSITE PARTICLES, DRY POWDER, AND WALLPAPER | Toppan Printing Co., Ltd. (JP) | 2021-03-03 | — | — | EP | disclosed |
| US-20210051950-A1 | SUSTAINED-RELEASE COMPOSITE PARTICLES, METHOD FOR PRODUCING SUSTAINED-RELEASE COMPOSITE PARTICLES, DRY POWDER, AND WALLPAPER | TOPPAN PRINTING CO.,LTD. (JP) | 2021-02-25 | — | — | US | disclosed |
| US-10930912-B2 | Composition for non-aqueous secondary battery functional layer, functional layer for non-aqueous secondary battery, non-aqueous secondary battery, and method of producing electrode for non-aqueous secondary battery | ZEON CORPORATION (JP) | 2021-02-23 | — | — | US | disclosed |
| EP-3770182-A1 | PHOTOCHROMIC CURABLE COMPOSITION | Tokuyama Corporation (JP) | 2021-01-27 | — | — | EP | disclosed |
| US-20210002545-A1 | PHOTOCHROMIC CURABLE COMPOSITION | TOKUYAMA CORPORATION (JP) | 2021-01-07 | — | — | US | disclosed |
| US-20200397687-A1 | COMPOSITE PARTICLES, METHOD OF PRODUCING COMPOSITE PARTICLES AND DRY POWDER OF COMPOSITE PARTICLES, SKIN APPLICATION COMPOSITION AND METHOD OF PRODUCING THE SKIN APPLICATION COMPOSITION | TOPPAN PRINTING CO.,LTD. (JP) | 2020-12-24 | — | — | US | disclosed |
| US-10870224-B2 | Method of manufacturing antireflection film | FUJIFILM CORPORATION (JP) | 2020-12-22 | — | — | US | disclosed |
| EP-3269774-B1 | METHOD FOR PRODUCING PHOTOCHROMIC CURED BODY | TOKUYAMA CORP (JP) | 2020-12-09 | — | — | EP | disclosed |
| EP-3736297-A1 | COMPOSITE PARTICLES, PRODUCTION METHOD FOR COMPOSITE PARTICLES, DRY POWDER, AND RESIN COMPOSITION FOR MOLDING | Toppan Printing Co., Ltd. (JP) | 2020-11-11 | — | — | EP | disclosed |
| US-20200332040-A1 | COMPOSITE PARTICLES, METHOD OF PRODUCING COMPOSITE PARTICLES, DRY POWDER, AND MOLDING RESIN COMPOSITION | TOPPAN PRINTING CO., LTD. (JP) | 2020-10-22 | — | — | US | disclosed |
| US-20200308338-A1 | BLOCKED POLYISOCYANATE COMPOSITION AND USE THEREOF | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2020-10-01 | — | — | US | disclosed |
| US-20200292878-A1 | LOUVER FILM, PLANAR LIGHT SOURCE DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2020-09-17 | — | — | US | disclosed |
| EP-3689936-A1 | BLOCKED POLYISOCYANATE COMPOSITION AND USE THEREOF | Asahi Kasei Kabushiki Kaisha (JP) | 2020-08-05 | — | — | EP | disclosed |
| US-20200230646-A1 | PROCESS FOR THE PREPARATION OF METALLIC NANO-PARTICLE LAYERS AND THEIR USE FOR DECORATIVE OR SECURITY ELEMENTS | BASF SE (DE) | 2020-07-23 | — | — | US | disclosed |
| US-20200223125-A1 | RESIN FOR NANOIMPRINTING, LAMINATE CONTAINING RESIN FOR NANOIMPRINTING, PRINTED BOARD CONTAINING RESIN FOR NANOIMPRINTING, AND METHOD FOR PRODUCING NANOIMPRINT SUBSTRATE | JAPAN SCIENCE & TECH AGENCY (JP) | 2020-07-16 | — | — | US | disclosed |
| WO-2020129931-A1 | CURABLE COMPOSITION FOR OPTICAL MATERIALS, AND OPTICAL MATERIAL | 株式会社トクヤマ | 2020-06-25 | — | — | WO | disclosed |
| WO-2020129930-A1 | CURABLE COMPOSITION FOR OPTICAL MATERIALS, AND OPTICAL MATERIAL | 株式会社トクヤマ | 2020-06-25 | — | — | WO | disclosed |
| US-20200190106-A1 | CHROMENE COMPOUND, CURABLE COMPOSITION COMPRISING THE COMPOUND, AND OPTICAL ARTICLE INCLUDING A CURED BODY OF THE CURABLE COMPOSITION | TOKUYAMA CORPORATION (JP) | 2020-06-18 | — | — | US | disclosed |
| US-20200172681-A1 | PHOTOCHROMIC POLYROTAXANE COMPOUND AND CURABLE COMPOSITION COMPRISING THE PHOTOCHROMIC POLYROTAXANE COMPOUND | TOKUYAMA CORPORATION (JP) | 2020-06-04 | — | — | US | disclosed |
| EP-3658701-A1 | PROCESS FOR THE PREPARATION OF METALLIC NANO-PARTICLE LAYERS AND THEIR USE FOR DECORA-TIVE OR SECURITY ELEMENTS | BASF SE (DE) | 2020-06-03 | — | — | EP | disclosed |
| US-10625534-B2 | Printing diffraction gratings on paper and board | BASF SE (DE) | 2020-04-21 | — | — | US | disclosed |
| EP-3625296-A1 | PROCESS FOR THE PREPARATION OF METALLIC NANO-PARTICLE LAYERS AND THEIR USE FOR DECORATIVE OR SECURITY ELEMENTS | BASF SE (DE) | 2020-03-25 | — | — | EP | disclosed |
| US-20200071467-A1 | Polyrotaxane, Production Method Therefor, and Optical Composition Containing said Polyrotaxane | TOKUYAMA CORPORATION (JP) | 2020-03-05 | — | — | US | disclosed |
| US-20200064647-A1 | LIGHT DIFFRACTION FILM AND WEARABLE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2020-02-27 | — | — | US | disclosed |
| CN-110832110-A | Method for producing a metal nanoparticle layer and use thereof in decorative or security elements | 巴斯夫欧洲公司 | 2020-02-21 | — | — | CN | disclosed |
| CN-110832040-A | Method for producing a metal nanoparticle layer and use thereof in decorative or security elements | 巴斯夫欧洲公司 | 2020-02-21 | — | — | CN | disclosed |
| EP-3228672-B1 | COATING COMPOSITION, AND OPTICAL PRODUCT HAVING COATING LAYER MADE FROM SAID COATING COMPOSITION | TOKUYAMA CORP (JP) | 2020-02-05 | — | — | EP | disclosed |
| EP-2899188-B1 | METHOD FOR STORING EPISULFIDE COMPOUND AND METHOD FOR PREPARING THIOEPOXY-BASED OPTICAL MATERIAL USING SAID EPISULFIDE COMPOUND | KOC SOLUTION CO LTD (KR) | 2020-01-08 | — | — | EP | disclosed |
| EP-3327472-B1 | HOLOGRAPHIC OPTICAL ELEMENT AND PRODUCTION METHOD THEREFOR | KONICA MINOLTA INC (JP) | 2019-10-30 | — | — | EP | disclosed |
| US-10459290-B2 | Optical film, polarizing plate, and image display device | FUJIFILM CORPORATION (JP) | 2019-10-29 | — | — | US | disclosed |
| US-20190310396-A1 | OPTICAL FILM AND METHOD FOR MANUFACTURING OPTICAL FILM | FUJIFILM CORPORATION (JP) | 2019-10-10 | — | — | US | disclosed |
| US-RE47556-E1 | Optical element compound, optical material, and optical element | CANON KABUSHIKI KAISHA (JP) | 2019-08-06 | — | — | US | disclosed |
| US-10370474-B2 | Optical composition, cured product, and optical element | CANON KABUSHIKI KAISHA (JP) | 2019-08-06 | — | — | US | disclosed |
| US-20190232711-A1 | PRINTING DIFFRACTION GRATINGS ON PAPER AND BOARD | BASF SE (DE) | 2019-08-01 | — | — | US | disclosed |
| US-10365411-B2 | Hardcoat film, polarizing plate, liquid crystal display, and method for manufacturing hardcoat film | FUJIFILM CORPORATION (JP) | 2019-07-30 | — | — | US | disclosed |
| EP-2682430-B2 | METHOD FOR MANUFACTURING RESIN FOR THIOURETHANE-BASED OPTICAL MATERIAL USING UNIVERSAL POLYISOCYANATE COMPOUND, RESIN COMPOSITION, AND OPTICAL MATERIAL MANUFACTURED THEREBY | KOC SOLUTION CO LTD (KR) | 2019-07-17 | — | — | EP | disclosed |
| CN-109976096-A | Hardening resin composition, dry film, solidfied material and printed circuit board | 太阳油墨（苏州）有限公司 | 2019-07-05 | — | — | CN | disclosed |
| US-20190207189-A1 | COMPOSITION FOR NON-AQUEOUS SECONDARY BATTERY FUNCTIONAL LAYER, FUNCTIONAL LAYER FOR NON-AQUEOUS SECONDARY BATTERY, NON-AQUEOUS SECONDARY BATTERY, AND METHOD OF PRODUCING ELECTRODE FOR NON-AQUEOUS SECONDARY BATTERY | ZEON CORPORATION (JP) | 2019-07-04 | — | — | US | disclosed |
| EP-3506394-A1 | COMPOSITION FOR NONAQUEOUS SECONDARY BATTERY FUNCTIONAL LAYERS, FUNCTIONAL LAYER FOR NONAQUEOUS SECONDARY BATTERIES, NONAQUEOUS SECONDARY BATTERY, AND METHOD FOR PRODUCING ELECTRODE FOR NONAQUEOUS SECONDARY BATTERIES | Zeon Corporation (JP) | 2019-07-03 | — | — | EP | disclosed |
| US-10338276-B2 | Antireflective film, polarizing plate, cover glass, image display device, and method of manufacturing antireflective film | FUJIFILM CORPORATION (JP) | 2019-07-02 | — | — | US | disclosed |
| EP-3498742-A1 | PHOTOCHROMIC CURABLE COMPOSITION, USE THEREOF, AND POLYROTAXANE MONOMERS | Tokuyama Corporation (JP) | 2019-06-19 | — | — | EP | disclosed |
| US-10322603-B2 | Printing diffraction gratings on paper and board | BASF SE (DE) | 2019-06-18 | — | — | US | disclosed |
| US-20190161585-A1 | Photochromic Curable Composition, Use Thereof, and Polyrotaxane Monomers | TOKUYAMA CORPORATION (JP) | 2019-05-30 | — | — | US | disclosed |
| US-10301485-B2 | Coating composition and optical article having a coat layer made of the coating composition | TOKUYAMA CORPORATION (JP) | 2019-05-28 | — | — | US | disclosed |
| EP-3070142-B1 | PHOTOCHROMIC COMPOSITION | TOKUYAMA CORP (JP) | 2019-05-22 | — | — | EP | disclosed |
| US-10292262-B2 | Reinforcing-plate-integrated flexible printed circuit board | KANEKA CORPORATION (JP) | 2019-05-14 | — | — | US | disclosed |
| US-10280328-B2 | Bottom layer film-forming composition of self-organizing film containing styrene structure | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-05-07 | — | — | US | disclosed |
| EP-2390684-B1 | OPTICAL ELEMENT COMPOUND, OPTICAL MATERIAL, AND OPTICAL ELEMENT | CANON KK (JP) | 2019-04-24 | — | — | EP | disclosed |
| US-10240033-B2 | Optical film and method for manufacturing same, polarization plate, and liquid crystal display apparatus | FUJIFILM CORPORATION (JP) | 2019-03-26 | — | — | US | disclosed |
| CN-105531620-B | Optical film, barrier film, light converting member, back light unit and liquid crystal display device | 富士胶片株式会社 | 2019-02-15 | — | — | CN | disclosed |
| WO-2019020682-A1 | PROCESS FOR THE PREPARATION OF METALLIC NANO-PARTICLE LAYERS AND THEIR USE FOR DECORA-TIVE OR SECURITY ELEMENTS | BASF SE (DE) | 2019-01-31 | — | — | WO | disclosed |
| US-10182980-B2 | Method of making an amino silicone nanoemulsion | THE PROCTER & GAMBLE COMPANY (US) | 2019-01-22 | — | — | US | disclosed |
| US-20190011604-A1 | LAMINATE, METHOD OF MANUFACTURING LAMINATE, AND METHOD OF MANUFACTURING ANTIREFLECTION FILM | FUJIFILM CORPORATION (JP) | 2019-01-10 | — | — | US | disclosed |
| US-10160846-B2 | Optical film, and polarizing plate and liquid crystal display device employing same | FUJIFILM CORPORATION (JP) | 2018-12-25 | — | — | US | disclosed |
| WO-2018210597-A1 | PROCESS FOR THE PREPARATION OF METALLIC NANO-PARTICLE LAYERS AND THEIR USE FOR DECORATIVE OR SECURITY ELEMENTS | BASF SE (DE) | 2018-11-22 | — | — | WO | disclosed |
| EP-3242165-B1 | PRINTING DIFFRACTION GRATINGS ON POLYMER SUBSTRATE | BASF SE (DE) | 2018-11-14 | — | — | EP | disclosed |
| US-10125309-B2 | Photochromic composition | TOKUYAMA CORPORATION (JP) | 2018-11-13 | — | — | US | disclosed |
| US-10125278-B2 | Coating compositions for security elements and holograms | BASF SE (DE) | 2018-11-13 | — | — | US | disclosed |
| US-20180319945-A1 | BLACK RESIN COMPOSITION, POLYIMIDE WITH BLACK RESIN CURED FILM AND PRODUCTION METHOD THEREFOR, AND FLEXIBLE PRINTED WIRING BOARD USING BLACK RESIN CURED FILM | KANEKA CORPORATION (JP) | 2018-11-08 | — | — | US | disclosed |
| US-20180312643-A1 | Polyrotaxane, Production Method Therefor, and Optical Composition Containing said Polyrotaxane | TOKUYAMA CORPORATION (JP) | 2018-11-01 | — | — | US | disclosed |
| US-10106660-B2 | Film containing a resin having a thiourethane bond and uses thereof | MITSUI CHEMICALS, INC. (JP) | 2018-10-23 | — | — | US | disclosed |
| US-20180251657-A1 | PRIMER COMPOSITION AND PHOTOCHROMIC LAMINATE | TOKUYAMA CORPORATION (JP) | 2018-09-06 | — | — | US | disclosed |
| US-10067266-B2 | Method of producing resin for thiourethane-based optical material using general-purpose polyisocyanate compound, resin composition for thiourethane-based optical material and thiourethane-based optical material including resin produced by the method | KOC SOLUTION CO., LTD. (KR) | 2018-09-04 | — | — | US | disclosed |
| US-RE47000-E1 | Optical element compound, optical material, and optical element | CANON KABUSHIKI KAISHA (JP) | 2018-08-21 | — | — | US | disclosed |
| US-10045433-B2 | Conductive-layer-integrated flexible printed circuit board | KANEKA CORPORATION (JP) | 2018-08-07 | — | — | US | disclosed |
| US-20180217312-A1 | HOLOGRAPHIC OPTICAL ELEMENT AND METHOD FOR PRODUCING THE SAME | Konica Minolta, Inc. (JP) | 2018-08-02 | — | — | US | disclosed |
| US-20180217311-A1 | HOLOGRAPHIC OPTICAL ELEMENT AND METHOD FOR PRODUCING THE SAME | Konica Minolta, Inc. (JP) | 2018-08-02 | — | — | US | disclosed |
| US-10030133-B2 | Black photosensitive resin composition and use of same | KANEKA CORPORATION (JP) | 2018-07-24 | — | — | US | disclosed |
| EP-2660276-B1 | PROCESS FOR PRODUCTION OF FINELY FIBROUS CELLULOSE COMPOSITE PREPREG SHEET, PROCESS FOR PRODUCTION OF FINELY FIBROUS CELLULOSE COMPOSITE SHEET, AND PROCESS FOR PRODUCTION OF FINELY FIBROUS CELLULOSE COMPOSITE LAMINATE SHEET | OJI HOLDINGS CORP (JP) | 2018-07-11 | — | — | EP | disclosed |
| EP-3345954-A1 | POLYROTAXANE, PRODUCTION METHOD THEREFOR, AND OPTICAL COMPOSITION CONTAINING SAID POLYROTAXANE | Tokuyama Corporation (JP) | 2018-07-11 | — | — | EP | disclosed |
| US-10007030-B2 | Antireflective film, polarizing plate, cover glass, image display device, method for producing antireflective film, cloth for cleaning antireflective film, kit including antireflective film and cleaning cloth, and method for cleaning antireflective film | FUJIFILM CORPORATION (JP) | 2018-06-26 | — | — | US | disclosed |
| US-10000664-B2 | Underlayer film-forming composition for self-assembled films | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-06-19 | — | — | US | disclosed |
| EP-3333602-A1 | PRIMER COMPOSITION AND PHOTOCHROMIC LAYERED BODY | Tokuyama Corporation (JP) | 2018-06-13 | — | — | EP | disclosed |
| EP-3333603-A1 | HOLOGRAPHIC OPTICAL ELEMENT AND PRODUCTION METHOD THEREFOR | Konica Minolta, Inc. (JP) | 2018-06-13 | — | — | EP | disclosed |
| EP-2615054-B1 | ROPE FOR ELEVATOR | MITSUBISHI ELECTRIC CORP (JP) | 2018-06-06 | — | — | EP | disclosed |
| EP-3327472-A1 | HOLOGRAPHIC OPTICAL ELEMENT AND PRODUCTION METHOD THEREFOR | Konica Minolta, Inc. (JP) | 2018-05-30 | — | — | EP | disclosed |
| US-20180141245-A1 | METHOD OF MANUFACTURING ANTIREFLECTION FILM | FUJIFILM CORPORATION (JP) | 2018-05-24 | — | — | US | disclosed |
| US-9957390-B2 | Resin composition for pigment-containing insulating film, and use thereof | KANEKA CORPORATION (JP) | 2018-05-01 | — | — | US | disclosed |
| US-9946158-B2 | Composition for forming resist underlayer film for nanoimprint | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-04-17 | — | — | US | disclosed |
| US-20180086921-A1 | PROCESS FOR THE PREPARATION OF METALLIC NANO-PARTICLE LAYERS AND THEIR USE FOR DECORATIVE OR SECURITY ELEMENTS | BASF SE (DE) | 2018-03-29 | — | — | US | disclosed |
| US-20180058009-A1 | HIGH GLOSS METAL EFFECT PAPERS AND BOARDS | BASF SE (DE) | 2018-03-01 | — | — | US | disclosed |
| US-20180059049-A1 | GEL SENSOR AND COMPONENT CONCENTRATION ESTIMATION METHOD | SEIKO EPSON CORPORATION (JP) | 2018-03-01 | — | — | US | disclosed |
| EP-3287497-A2 | COATING COMPOSITIONS FOR SECURITY ELEMENTS AND HOLOGRAMS | BASF SE (DE) | 2018-02-28 | — | — | EP | disclosed |
| EP-3285942-A1 | PROCESS FOR THE PREPARATION OF METALLIC NANO-PARTICLE LAYERS AND THEIR USE FOR DECORATIVE OR SECURITY ELEMENTS | BASF SE (DE) | 2018-02-28 | — | — | EP | disclosed |
| EP-2461350-B1 | USE OF A COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2018-02-28 | — | — | EP | disclosed |
| EP-3277884-A1 | HIGH GLOSS METAL EFFECT PAPERS AND BOARDS | BASF SE (DE) | 2018-02-07 | — | — | EP | disclosed |
| US-9885907-B2 | Optical film, polarizing plate and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2018-02-06 | — | — | US | disclosed |
| US-20180030341-A1 | PROCESS FOR PRODUCING A PHOTOCHROMIC CURED BODY | TOKUYAMA CORPORATION (JP) | 2018-02-01 | — | — | US | disclosed |
| US-20180024083-A1 | GEL FOR SENSOR AND SENSOR | SEIKO EPSON CORPORATION (JP) | 2018-01-25 | — | — | US | disclosed |
| EP-3269774-A1 | METHOD FOR PRODUCING PHOTOCHROMIC CURED BODY | Tokuyama Corporation (JP) | 2018-01-17 | — | — | EP | disclosed |
| EP-2295484-B1 | POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYTHIOURETHANE OPTICAL MATERIAL OBTAINED FROM SAME POLYMERIZABLE COMPOSITION, AND POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL | MITSUI CHEMICALS INC (JP) | 2018-01-17 | — | — | EP | disclosed |
| US-20180002551-A1 | Coating Compositions for Security Elements and Holograms | BASF SE (DE) | 2018-01-04 | — | — | US | disclosed |
| US-20180002562-A1 | LOW-TEMPERATURE-CURABLE CROSS-SECTION REPAIR MATERIAL, AND CROSS-SECTION REPAIRING METHOD USING THE SAME | SHOWA DENKO K.K. (JP) | 2018-01-04 | — | — | US | disclosed |
| US-9856385-B2 | Thin aluminium flakes | BASF SE (DE) | 2018-01-02 | — | — | US | disclosed |
| EP-3260479-A1 | LOW-TEMPERATURE-CURABLE CROSS-SECTION REPAIR MATERIAL, AND CROSS-SECTION REPAIR METHOD USING SAME | Showa Denko K.K. (JP) | 2017-12-27 | — | — | EP | disclosed |
| EP-3250292-A1 | A METHOD OF MAKING AN AMINO SILICONE NANOEMULSION | The Procter and Gamble Company (US) | 2017-12-06 | — | — | EP | disclosed |
| US-9835942-B2 | Photosensitive resin composition and use thereof | KANEKA CORPORATION (JP) | 2017-12-05 | — | — | US | disclosed |
| EP-2379650-B1 | THIN ALUMINUM FLAKES | BASF SE (DE) | 2017-11-29 | — | — | EP | disclosed |
| EP-2902821-B1 | FILM MIRROR | FUJIFILM CORP (JP) | 2017-11-22 | — | — | EP | disclosed |
| US-9823389-B2 | Film, method of manufacturing film, polarizing plate, liquid crystal display device, and composition | FUJIFILM CORPORATION (JP) | 2017-11-21 | — | — | US | disclosed |
| EP-3244268-A1 | VOLUME HOLOGRAM TRANSFER FOIL, VOLUME HOLOGRAM LAMINATE, AND PRODUCTION METHOD THEREOF | Dai Nippon Printing Co., Ltd. (JP) | 2017-11-15 | — | — | EP | disclosed |
| EP-2407498-B1 | Polymerizable composition for polythiourethane optical material, polythiourethane optical material obtained from the polymerizable composition, and polymerization catalyst for polythiourethane optical material | MITSUI CHEMICALS INC (JP) | 2017-11-15 | — | — | EP | disclosed |
| US-20170320984-A1 | OPTICAL COMPOSITION, CURED PRODUCT, AND OPTICAL ELEMENT | CANON KABUSHIKI KAISHA (JP) | 2017-11-09 | — | — | US | disclosed |
| EP-3242165-A1 | PRINTING DIFFRACTION GRATINGS ON POLYMER SUBSTRATE | BASF SE (DE) | 2017-11-08 | — | — | EP | disclosed |
| EP-3228672-A1 | COATING COMPOSITION, AND OPTICAL PRODUCT HAVING COATING LAYER MADE FROM SAID COATING COMPOSITION | Tokuyama Corporation (JP) | 2017-10-11 | — | — | EP | disclosed |
| US-20170290141-A1 | CONDUCTIVE-LAYER-INTEGRATED FLEXIBLE PRINTED CIRCUIT BOARD | KANEKA CORPORATION | 2017-10-05 | — | — | US | disclosed |
| EP-2504400-B1 | COATING COMPOSITIONS FOR SECURITY ELEMENTS AND HOLOGRAMS | BASF SE (DE) | 2017-09-27 | — | — | EP | disclosed |
| US-9765227-B2 | Coating compositions for security elements and holograms | BASF SE (DE) | 2017-09-19 | — | — | US | disclosed |
| US-20170240769-A1 | COATING COMPOSITION AND OPTICAL ARTICLE HAVING A COAT LAYER MADE OF THE COATING COMPOSITION | TOKUYAMA CORPORATION (JP) | 2017-08-24 | — | — | US | disclosed |
| EP-2723576-B1 | PRINTING DIFFRACTION GRATINGS ON PAPER AND BOARD | BASF SE (DE) | 2017-08-09 | — | — | EP | disclosed |
| EP-2009516-B1 | Volume hologram transfer foil, volume hologram laminate, and production method thereof | DAINIPPON PRINTING CO LTD (JP) | 2017-08-09 | — | — | EP | disclosed |
| EP-3202862-A2 | CHROMOPHORIC COMPOSITIONS | BASF SE (DE) | 2017-08-09 | — | — | EP | disclosed |
| EP-2516414-B1 | HETEROAROMATIC COMPOUND, OPTICAL MATERIAL AND OPTICAL ELEMENT | CANON KK (JP) | 2017-08-02 | — | — | EP | disclosed |
| US-9718933-B2 | Optical film, and polarizing plate and liquid crystal display device employing same | FUJIFILM CORPORATION (JP) | 2017-08-01 | — | — | US | disclosed |
| US-9723708-B2 | Conductive-layer-integrated flexible printed circuit board | KANEKA CORPORATION (JP) | 2017-08-01 | — | — | US | disclosed |
| US-9715040-B2 | Optical film and manufacturing method thereof, polarizing plate protective film, polarizing plate and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2017-07-25 | — | — | US | disclosed |
| US-9715041-B2 | Optical film, polarizing plate protective film, polarizing plate and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2017-07-25 | — | — | US | disclosed |
| US-9709952-B2 | Photosensitive composition for volume hologram recording, photosensitive substrate for volume hologram recording, and volume hologram recorded medium | DAI NIPPON PRINTING CO., LTD. (JP) | 2017-07-18 | — | — | US | disclosed |
| US-9671599-B2 | Film mirror, and composite film for use in same | FUJIFILM CORPORATION (JP) | 2017-06-06 | — | — | US | disclosed |
| US-9658364-B2 | Method for storing episulfide compound and method for preparing thioepoxy-based optical material using said episulfide compound | KOC SOLUTION CO., LTD. (KR) | 2017-05-23 | — | — | US | disclosed |
| US-20170119289-A1 | FLUID COLLECTION DEVICE AND MEASUREMENT DEVICE | SEIKO EPSON CORPORATION (JP) | 2017-05-04 | — | — | US | disclosed |
| US-9638953-B2 | Liquid crystal display device | FUJIFILM CORPORATION (JP) | 2017-05-02 | — | — | US | disclosed |
| US-9632229-B2 | Optical film, barrier film, light conversion member, backlight unit, and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2017-04-25 | — | — | US | disclosed |
| US-20170106637-A1 | OPTICAL FILM, POLARIZING PLATE, AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2017-04-20 | — | — | US | disclosed |
| US-9618788-B2 | Optical film, polarizing plate and liquid crystal display using the same | FUJIFILM CORPORATION (JP) | 2017-04-11 | — | — | US | disclosed |
| US-20170097544-A1 | OPTICAL FILM, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2017-04-06 | — | — | US | disclosed |
| EP-1150183-B1 | Volume hologram multilayer structure | DAINIPPON PRINTING CO LTD (JP) | 2017-03-15 | — | — | EP | disclosed |
| US-20170050456-A1 | METHOD OF PRINTING | Océ-Technologies B.V. (NL) | 2017-02-23 | — | — | US | disclosed |
| US-9557463-B2 | Optical film, polarizing plate and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2017-01-31 | — | — | US | disclosed |
| EP-2889700-B1 | PHOTOSENSITIVE COMPOSITION FOR VOLUME HOLOGRAM RECORDING, PHOTOSENSITIVE SUBSTRATE FOR VOLUME HOLOGRAM RECORDING, AND VOLUME HOLOGRAM-RECORDED OBJECT | DAINIPPON PRINTING CO LTD (JP) | 2017-01-25 | — | — | EP | disclosed |
| US-9551813-B2 | Optical film, polarizing plate using same, and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2017-01-24 | — | — | US | disclosed |
| EP-2116558-B1 | POLYMERIZABLE COMPOSITION CONTAINING A CATALYST, OPTICAL MATERIAL OBTAINED FROM THE COMPOSITION, AND METHOD FOR PRODUCING THE OPTICAL MATERIAL | MITSUI CHEMICALS INC (JP) | 2017-01-18 | — | — | EP | disclosed |
| EP-1988110-B1 | INTERNAL MOLD RELEASE AGENT FOR PRODUCTION OF POLYTHIOURETHANE OPTICAL MATERIAL | MITSUI CHEMICALS INC (JP) | 2017-01-04 | — | — | EP | disclosed |
| US-20160376462-A1 | (METH)ACRYLIC RESIN COMPOSITION, FILM, POLARIZING PLATE PROTECTIVE FILM, POLARIZING PLATE, AND LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2016-12-29 | — | — | US | disclosed |
| US-20160355693-A1 | COATING COMPOSITIONS FOR SECURITY ELEMENTS AND HOLOGRAMS | BASF SE (DE) | 2016-12-08 | — | — | US | disclosed |
| US-20160348051-A1 | CULTURE CONTAINER, GEL MATERIAL, AND CULTURE SYSTEM | SEIKO EPSON CORPORATION (JP) | 2016-12-01 | — | — | US | disclosed |
| EP-3098604-A1 | GEL FOR SENSOR AND SENSOR | Seiko Epson Corporation (JP) | 2016-11-30 | — | — | EP | disclosed |
| EP-3098603-A1 | GEL FOR SENSOR AND SENSOR | Seiko Epson Corporation (JP) | 2016-11-30 | — | — | EP | disclosed |
| US-9505889-B2 | Stimulus-responsive gel material and method for producing stimulus-responsive gel material | SEIKO EPSON CORPORATION (JP) | 2016-11-29 | — | — | US | disclosed |
| US-20160338643-A1 | GEL FOR SENSOR AND SENSOR | SEIKO EPSON CORPORATION (JP) | 2016-11-24 | — | — | US | disclosed |
| US-20160341685-A1 | GEL FOR SENSOR AND SENSOR | SEIKO EPSON CORPORATION (JP) | 2016-11-24 | — | — | US | disclosed |
| US-9500777-B2 | Antireflection film, polarizing plate, image display device and a manufacturing method for antireflection film | FUJIFILM CORPORATION (JP) | 2016-11-22 | — | — | US | disclosed |
| EP-1849840-B1 | AQUEOUS INK COMPOSITION AND URETHANE RESIN COMPOSITION FOR AQUEOUS INK COMPOSITION | SEIKO EPSON CORP (JP) | 2016-11-16 | — | — | EP | disclosed |
| WO-2016170160-A1 | PROCESS FOR THE PREPARATION OF METALLIC NANO-PARTICLE LAYERS AND THEIR USE FOR DECORATIVE OR SECURITY ELEMENTS | BASF SE (DE) | 2016-10-27 | — | — | WO | disclosed |
| EP-2467755-B1 | METHOD FOR A SUB MICROSCOPIC AND OPTICALLY VARIABLE IMAGE CARRYING DEVICE | BASF SE (DE) | 2016-10-12 | — | — | EP | disclosed |
| US-9458279-B2 | Resin composition and use thereof | KANEKA CORPORATION (JP) | 2016-10-04 | — | — | US | disclosed |
| US-9453132-B2 | Coating compositions for security elements and holograms | BASF SE (DE) | 2016-09-27 | — | — | US | disclosed |
| EP-3070142-A1 | PHOTOCHROMIC COMPOSITION | Tokuyama Corporation (JP) | 2016-09-21 | — | — | EP | disclosed |
| US-20160264743-A1 | FILM CONTAINING A RESIN HAVING A THIOURETHANE BOND AND USES THEREOF | MITSUI CHEMICALS, INC. (JP) | 2016-09-15 | — | — | US | disclosed |
| EP-3067216-A1 | CHROMOPHORIC COMPOSITIONS | BASF SE (DE) | 2016-09-14 | — | — | EP | disclosed |
| EP-2862012-B1 | (METH)ACRYLATE COMPOUND, OPTICAL COMPOSITION, MOLDED ARTICLE, AND OPTICAL ELEMENT | CANON KK (JP) | 2016-09-14 | — | — | EP | disclosed |
| EP-2805949-B1 | METHOD FOR PREPARING THIOEPOXY-BASED OPTICAL MATERIAL AND POLYMERIZABLE COMPOSITION THEREOF | KOC SOLUTION CO LTD (KR) | 2016-08-17 | — | — | EP | disclosed |
| US-20160222248-A1 | FORMING UNDERLAYER FILM OF SELF-ASSEMBLED FILM INCLUDING ALIPHATIC POLYCYCLIC STRUCTURE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-08-04 | — | — | US | disclosed |
| US-20160222285-A1 | PHOTOCHROMIC COMPOSITION | TOKUYAMA CORPORATION (JP) | 2016-08-04 | — | — | US | disclosed |
| WO-2016123349-A1 | A METHOD OF MAKING AN AMINO SILICONE NANOEMULSION | THE PROCTER & GAMBLE COMPANY (US) | 2016-08-04 | — | — | WO | disclosed |
| US-20160213598-A1 | METHOD OF MAKING AN AMINO SILICONE NANOEMULSION | THE PROCTER & GAMBLE COMPANY | 2016-07-28 | — | — | US | disclosed |
| US-9389339-B2 | Method for producing antireflection film, antireflection film, and coating composition | FUJIFILM CORPORATION (JP) | 2016-07-12 | — | — | US | disclosed |
| US-20160187540-A2 | METHOD FOR PRODUCING ANTIREFLECTION FILM, ANTIREFLECTION FILM, AND COATING COMPOSITION | FUJIFILM CORPORATION (JP) | 2016-06-30 | — | — | US | disclosed |
| EP-2453320-B1 | Multilayer volume hologram, and label for multilayer volume hologram fabrication | DAINIPPON PRINTING CO LTD (JP) | 2016-06-29 | — | — | EP | disclosed |
| US-9372281-B2 | Method for preparing thioepoxy-based optical material and polymerizable composition thereof | KOC SOLUTION CO., LTD. (KR) | 2016-06-21 | — | — | US | disclosed |
| US-20160161801-A1 | LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2016-06-09 | — | — | US | disclosed |
| US-20160161657-A1 | OPTICAL FILM, BARRIER FILM, LIGHT CONVERSION MEMBER, BACKLIGHT UNIT, AND LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2016-06-09 | — | — | US | disclosed |
| US-9353228-B2 | Stimulus-responsive gel material | SEIKO EPSON CORPORATION (JP) | 2016-05-31 | — | — | US | disclosed |
| US-20160122516-A1 | OPTICAL FILM, AND POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY DEVICE EMPLOYING SAME | FUJIFILM CORPORATION (JP) | 2016-05-05 | — | — | US | disclosed |
| US-20160124123-A1 | CELLULOSE ACYLATE FILM, POLARIZING PLATE, AND LIQUID CRYSTAL DISPLAY USING THE SAME | FUJIFILM CORPORATION (JP) | 2016-05-05 | — | — | US | disclosed |
| US-20160122486-A1 | OPTICAL FILM, AND POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY DEVICE EMPLOYING SAME | FUJIFILM CORPORATION (JP) | 2016-05-05 | — | — | US | disclosed |
| US-9332653-B2 | Resin composition for insulating film, and use thereof | KANEKA CORPORATION (JP) | 2016-05-03 | — | — | US | disclosed |
| US-20160109621-A1 | FILM, METHOD OF MANUFACTURING FILM, POLARIZING PLATE, LIQUID CRYSTAL DISPLAY DEVICE, AND COMPOSITION | FUJIFILM CORPORATION (JP) | 2016-04-21 | — | — | US | disclosed |
| EP-1168110-B1 | Hologram transfer foil | DAINIPPON PRINTING CO LTD (JP) | 2016-04-20 | — | — | EP | disclosed |
| US-9310676-B2 | Apparatus and method for a sub microscopic and optically variable image carrying device | BASF SE (DE) | 2016-04-12 | — | — | US | disclosed |
| US-20160091630-A1 | OPTICAL FILM, POLARIZING PLATE PROTECTIVE FILM, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2016-03-31 | — | — | US | disclosed |
| EP-2624074-B1 | VOLUME HOLOGRAM TRANSFER FOIL | DAINIPPON PRINTING CO LTD (JP) | 2016-03-30 | — | — | EP | disclosed |
| US-9290656-B2 | Polymerizable composition for polythiourethane optical material | MITSUI CHEMICALS, INC. (JP) | 2016-03-22 | — | — | US | disclosed |
| US-9290597-B2 | (Meth)acrylate compound, optical composition, molded article, and optical element | CANON KABUSHIKI KAISHA (JP) | 2016-03-22 | — | — | US | disclosed |
| US-20160077240-A1 | ANTIREFLECTIVE FILM, POLARIZING PLATE, COVER GLASS, IMAGE DISPLAY DEVICE, METHOD FOR PRODUCING ANTIREFLECTIVE FILM, CLOTH FOR CLEANING ANTIREFLECTIVE FILM, KIT INCLUDING ANTIREFLECTIVE FILM AND CLEANING CLOTH, AND METHOD FOR CLEANING ANTIREFLECTIVE FILM | FUJIFILM CORPORATION (JP) | 2016-03-17 | — | — | US | disclosed |
| US-20160077239-A1 | ANTIREFLECTIVE FILM, POLARIZING PLATE, COVER GLASS, IMAGE DISPLAY DEVICE, AND METHOD OF MANUFACTURING ANTIREFLECTIVE FILM | FUJIFILM CORPORATION (JP) | 2016-03-17 | — | — | US | disclosed |
| US-20160061828-A1 | GEL SENSOR | SEIKO EPSON CORPORATION (JP) | 2016-03-03 | — | — | US | disclosed |
| US-9267004-B2 | Polyimide precursor composition and use thereof | KANEKA CORPORATION (JP) | 2016-02-23 | — | — | US | disclosed |
| US-20160047946-A1 | OPTICAL FILM AND MANUFACTURING METHOD THEREOF, POLARIZING PLATE PROTECTIVE FILM, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2016-02-18 | — | — | US | disclosed |
| US-9237645-B2 | Flexible printed circuit integrated with conductive layer | KANEKA CORPORATION (JP) | 2016-01-12 | — | — | US | disclosed |
| US-20150369960-A1 | OPTICAL FILM, POLARIZING PLATE USING SAME, AND LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2015-12-24 | — | — | US | disclosed |
| US-9213311-B2 | Volume hologram transfer foil | DAI NIPPON PRINTING CO., LTD. (JP) | 2015-12-15 | — | — | US | disclosed |
| US-9204528-B2 | Flexible printed circuit integrated with stiffener | KANEKA CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| US-20150323824-A1 | OPTICAL FILM, POLARIZING PLATE, AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2015-11-12 | — | — | US | disclosed |
| US-20150322219-A1 | BOTTOM LAYER FILM-FORMATION COMPOSITION OF SELF-ORGANIZING FILM CONTAINING POLYCYCLIC ORGANIC VINYL COMPOUND | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-11-12 | — | — | US | disclosed |
| US-20150315402-A1 | BOTTOM LAYER FILM-FORMING COMPOSITION OF SELF-ORGANIZING FILM CONTAINING STYRENE STRUCTURE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-11-05 | — | — | US | disclosed |
| US-9176257-B2 | Conjugated aromatic compound, optical material, and optical element | CANON KABUSHIKI KAISHA (JP) | 2015-11-03 | — | — | US | disclosed |
| US-9176258-B2 | Optical laminate | FUJIFILM CORPORATION (JP) | 2015-11-03 | — | — | US | disclosed |
| EP-2937385-A1 | BOTTOM LAYER FILM-FORMING COMPOSITION OF SELF-ORGANIZING FILM CONTAINING STYRENE STRUCTURE | Nissan Chemical Industries, Ltd. (JP) | 2015-10-28 | — | — | EP | disclosed |
| EP-2937391-A1 | BOTTOM LAYER FILM-FORMATION COMPOSITION OF SELF-ORGANIZING FILM CONTAINING POLYCYCLIC ORGANIC VINYL COMPOUND | Nissan Chemical Industries, Ltd. (JP) | 2015-10-28 | — | — | EP | disclosed |
| US-20150298387-A1 | RESIN FOR NANOIMPRINTING, LAMINATE CONTAINING RESIN FOR NANOIMPRINTING, PRINTED BOARD CONTAINING RESIN FOR NANOIMPRINTING, AND METHOD FOR PRODUCING NANOIMPRINT SUBSTRATE | JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) | 2015-10-22 | — | — | US | disclosed |
| EP-2682430-B1 | METHOD FOR MANUFACTURING RESIN FOR THIOURETHANE-BASED OPTICAL MATERIAL USING UNIVERSAL POLYISOCYANATE COMPOUND, RESIN COMPOSITION, AND OPTICAL MATERIAL MANUFACTURED THEREBY | KOC SOLUTION CO LTD (KR) | 2015-10-21 | — | — | EP | disclosed |
| US-9145610-B2 | Method for producing film with coating | FUJIFILM CORPORATION (JP) | 2015-09-29 | — | — | US | disclosed |
| US-9134610-B2 | Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-09-15 | — | — | US | disclosed |
| US-20150253621-A1 | OPTICAL FILM, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY USING THE SAME | FUJIFILM CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-20150253466-A1 | ANTIREFLECTION FILM, POLARIZING PLATE, IMAGE DISPLAY DEVICE AND A MANUFACTURING METHOD FOR ANTIREFLECTION FILM | FUJIFILM CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-20150247955-A1 | METHOD FOR STORING EPISULFIDE COMPOUND AND METHOD FOR PREPARING THIOEPOXY-BASED OPTICAL MATERIAL USING SAID EPISULFIDE COMPOUND | MITSUI CHEMICALS, INC. (JP) | 2015-09-03 | — | — | US | disclosed |
| US-20150226729-A1 | STIMULUS-RESPONSIVE GEL MATERIAL | SEIKO EPSON CORPORATION (JP) | 2015-08-13 | — | — | US | disclosed |
| US-20150226879-A1 | METHOD OF MANUFACTURING THIOURETHANE - BASED OPTICAL MATERIAL | KOC SOLUTION CO., LTD. (KR) | 2015-08-13 | — | — | US | disclosed |
| US-20150226728-A1 | STIMULUS-RESPONSIVE GEL MATERIAL AND METHOD FOR PRODUCING STIMULUS-RESPONSIVE GEL MATERIAL | SEIKO EPSON CORPORATION (JP) | 2015-08-13 | — | — | US | disclosed |
| EP-2902821-A1 | FILM MIRROR, AND COMPOSITE FILM FOR USE IN SAME | FUJI-FILM Corporation (JP) | 2015-08-05 | — | — | EP | disclosed |
| US-20150212487-A1 | PHOTOSENSITIVE COMPOSITION FOR VOLUME HOLOGRAM RECORDING, PHOTOSENSITIVE SUBSTRATE FOR VOLUME HOLOGRAM RECORDING, AND VOLUME HOLOGRAM RECORDED MEDIUM | DAI NIPPON PRINTING CO., LTD. | 2015-07-30 | — | — | US | disclosed |
| EP-2899188-A1 | METHOD FOR STORING EPISULFIDE COMPOUND AND METHOD FOR PREPARING THIOEPOXY-BASED OPTICAL MATERIAL USING SAID EPISULFIDE COMPOUND | KOC Solution Co. Ltd. (KR) | 2015-07-29 | — | — | EP | disclosed |
| US-20150205085-A1 | FILM MIRROR, AND COMPOSITE FILM FOR USE IN SAME | FUJIFILM CORPORATION (JP) | 2015-07-23 | — | — | US | disclosed |
| US-20150198742-A1 | OPTICAL FILM, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2015-07-16 | — | — | US | disclosed |
| US-9081276-B2 | Photosensitive resin composition production kit, and use thereof | KANEKA CORPORATION (JP) | 2015-07-14 | — | — | US | disclosed |
| US-20150195899-A1 | CONDUCTIVE-LAYER-INTEGRATED FLEXIBLE PRINTED CIRCUIT BOARD | KANEKA CORPORATION (JP) | 2015-07-09 | — | — | US | disclosed |
| EP-2891672-A1 | METHOD FOR MANUFACTURING THIOURETHANE-BASED OPTICAL MATERIAL | KOC Solution Co. Ltd. (KR) | 2015-07-08 | — | — | EP | disclosed |
| US-20150189740-A1 | REINFORCING-PLATE-INTEGRATED FLEXIBLE PRINTED CIRCUIT BOARD | KANEKA CORPORATION (JP) | 2015-07-02 | — | — | US | disclosed |
| US-20150183977-A1 | OPTICAL FILM AND METHOD FOR MANUFACTURING SAME, POLARIZATION PLATE, AND LIQUID CRYSTAL DISPLAY APPARATUS | FUJIFILM CORPORATION (JP) | 2015-07-02 | — | — | US | disclosed |
| EP-2889700-A1 | PHOTOSENSITIVE COMPOSITION FOR VOLUME HOLOGRAM RECORDING, PHOTOSENSITIVE SUBSTRATE FOR VOLUME HOLOGRAM RECORDING, AND VOLUME HOLOGRAM-RECORDED OBJECT | Dai Nippon Printing Co., Ltd. (JP) | 2015-07-01 | — | — | EP | disclosed |
| US-9072177-B2 | Conductive layer integrated FPC | KANEKA CORPORATION (JP) | 2015-06-30 | — | — | US | disclosed |
| US-9068024-B2 | 2,2-dimethoxy-1,2-DI[4-(meth)acryloyloxy]phenylethane-1-one, method for producing the same, radical polymerization initiator and photocurable composition | TOYO GOSEI CO., LTD. (JP) | 2015-06-30 | — | — | US | disclosed |
| US-20150175731-A1 | (METH)ACRYLATE COMPOUND, OPTICAL COMPOSITION, MOLDED ARTICLE, AND OPTICAL ELEMENT | CANON KABUSHIKI KAISHA (JP) | 2015-06-25 | — | — | US | disclosed |
| US-9050774-B2 | Antistatic laminate, optical film, polarizing plate, and image display device | FUJIFILM CORPORATION (JP) | 2015-06-09 | — | — | US | disclosed |
| US-20150137504-A1 | PRINTING DIFFRACTION GRATINGS ON PAPER AND BOARD | BASF SE (DE) | 2015-05-21 | — | — | US | disclosed |
| US-20150118396-A1 | UNDERLAYER FILM-FORMING COMPOSITION FOR SELF-ASSEMBLED FILMS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-04-30 | — | — | US | disclosed |
| US-20150099070-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT | NISSAN CHEMICAL IND LTD (JP) | 2015-04-09 | — | — | US | disclosed |
| US-8999088-B2 | Process for production of finely fibrous cellulose composite prepreg sheet, process for production of finely fibrous cellulose composite sheet, and process for production of finely fibrous cellulose composite laminate sheet | Oji Holdings Corporation (JP) | 2015-04-07 | — | — | US | disclosed |
| US-8993897-B2 | Photosensitive resin composition and use thereof | KANEKA CORPORATION (JP) | 2015-03-31 | — | — | US | disclosed |
| US-8993219-B2 | Printing diffraction gratings on paper and board | BASF SE (DE) | 2015-03-31 | — | — | US | disclosed |
| US-8980431-B2 | Primer composition for optical articles and optical articles | TOKUYAMA CORPORATION (JP) | 2015-03-17 | — | — | US | disclosed |
| CN-102557484-B | D1364 BT secondary coating on optical fiber | DSM IP ASSETS BV | 2015-02-25 | — | — | CN | disclosed |
| US-20150044451-A1 | BLACK PHOTOSENSITIVE RESIN COMPOSITION AND USE OF SAME | KANEKA CORPORATION | 2015-02-12 | — | — | US | disclosed |
| US-20150035270-A1 | THIN ALUMINIUM FLAKES | BASF SE (DE) | 2015-02-05 | — | — | US | disclosed |
| EP-2832807-A1 | UNDERLAYER FILM FORMING COMPOSITION FOR SELF-ASSEMBLED FILMS | Nissan Chemical Industries, Ltd. (JP) | 2015-02-04 | — | — | EP | disclosed |
| US-8932801-B2 | Photosensitive polyimides | ETERNAL CHEMICAL CO., LTD. (CN) | 2015-01-13 | — | — | US | disclosed |
| EP-2309340-B1 | Volume hologram transfer foil and volume hologram laminate | DAINIPPON PRINTING CO LTD (JP) | 2015-01-07 | — | — | EP | disclosed |
| US-20140370301-A1 | NOVEL RESIN COMPOSITION FOR PIGMENT-CONTAINING INSULATING FILM, AND USE THEREOF | KANEKA CORPORATION (JP) | 2014-12-18 | — | — | US | disclosed |
| US-20140363639-A1 | NOVEL RESIN COMPOSITION FOR INSULATING FILM, AND USE THEREOF | KANEKA CORPORATION (JP) | 2014-12-11 | — | — | US | disclosed |
| EP-2805949-A1 | METHOD FOR PREPARING THIOEPOXY-BASED OPTICAL MATERIAL AND POLYMERIZABLE COMPOSITION THEREOF | KOC Solution Co. Ltd. (KR) | 2014-11-26 | — | — | EP | disclosed |
| US-8895113-B2 | Method of manufacturing film with a coating layer | FUJIFILM CORPORATION (JP) | 2014-11-25 | — | — | US | disclosed |
| US-8896802-B2 | Light transmissive substrate, method of making transmissive substrate, surface light source unit, polarizing plate, and liquid crystal device | FUJIFILM CORPORATION (JP) | 2014-11-25 | — | — | US | disclosed |
| US-20140336332-A1 | METHOD FOR PREPARING THIOEPOXY-BASED OPTICAL MATERIAL AND POLYMERIZABLE COMPOSITION THEREOF | MITSUI CHEMICALS, INC. (JP) | 2014-11-13 | — | — | US | disclosed |
| US-8883894-B2 | Insulating film and printed wiring board provided with insulating film | KANEKA CORPORATION (JP) | 2014-11-11 | — | — | US | disclosed |
| US-8877286-B2 | Method for producing optical film | FUJIFILM CORPORATION (JP) | 2014-11-04 | — | — | US | disclosed |
| US-20140322554-A1 | OPTICAL FILM, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2014-10-30 | — | — | US | disclosed |
| US-8865110-B2 | Method for producing graphite film and graphite film produced by the method | KANEKA CORPORATION (JP) | 2014-10-21 | — | — | US | disclosed |
| US-8861056-B2 | Volume hologram transfer foil, volume hologram laminate, and production method thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| US-20140254014-A1 | OPTICAL FILM, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2014-09-11 | — | — | US | disclosed |
| US-20140253847-A1 | OPTICAL FILM, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2014-09-11 | — | — | US | disclosed |
| US-8828525-B2 | Flexible printed circuit board integrated with reinforcing plate, and method for manufacturing flexible printed circuit board integrated with reinforcing plate | KANEKA CORPORATION (JP) | 2014-09-09 | — | — | US | disclosed |
| US-8829230-B2 | Optical element compound, optical material, and optical element | CANON KABUSHIKI KAISHA (JP) | 2014-09-09 | — | — | US | disclosed |
| US-8815130-B2 | Method for producing a lens | DAI NIPPON PRINTING CO., LTD. (JP) | 2014-08-26 | — | — | US | disclosed |
| EP-2420871-B1 | POLYMERIZABLE COMPOSITION FOR COLOR FILTER, COLOR FILTER, AND SOLID IMAGING ELEMENT | FUJIFILM CORP (JP) | 2014-08-20 | — | — | EP | disclosed |
| US-8785108-B2 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2014-07-22 | — | — | US | disclosed |
| US-8754186-B2 | Polyimide precursor composition, use thereof and production method thereof | KANEKA CORPORATION (JP) | 2014-06-17 | — | — | US | disclosed |
| US-20140158412-A1 | NOVEL CONDUCTIVE LAYER INTEGRATED FPC | KANEKA CORPORATION (JP) | 2014-06-12 | — | — | US | disclosed |
| EP-1624851-B1 | HAIR CARE APPLICATIONS OF EMULSIONS CONTAINING ELASTOMERIC SILANES AND SILOXANES WITH NITROGEN ATOMS | DOW CORNING (US) | 2014-05-28 | — | — | EP | disclosed |
| US-8735026-B2 | Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2014-05-27 | — | — | US | disclosed |
| US-8734945-B2 | D1364 BT secondary coatings on optical fiber | DSM IP ASSETS B.V. (NL) | 2014-05-27 | — | — | US | disclosed |
| US-8729402-B2 | Polyimide precursor composition, use of the of the same, and production method of the same | KANEKA CORPORATION (JP) | 2014-05-20 | — | — | US | disclosed |
| EP-2723576-A1 | PRINTING DIFFRACTION GRATINGS ON PAPER AND BOARD | BASF SE (DE) | 2014-04-30 | — | — | EP | disclosed |
| US-20140110931-A1 | PRINTING DIFFRACTION GRATINGS ON PAPER AND BOARD | BASF SE (DE) | 2014-04-24 | — | — | US | disclosed |
| EP-1609782-B1 | MONOAZO IRON COMPLEX COMPOUND, CHARGE CONTROL AGENT CONTAINING THE SAME, AND TONER | HODOGAYA CHEMICAL CO LTD (JP) | 2014-03-26 | — | — | EP | disclosed |
| US-8679578-B2 | Method of manufacturing anti-reflection film, anti-reflection film and coating composition | FUJIFILM CORPORATION (JP) | 2014-03-25 | — | — | US | disclosed |
| US-8673540-B2 | Photosensitive polymides | ETERNAL CHEMICAL CO., LTD. (TW) | 2014-03-18 | — | — | US | disclosed |
| US-20140069702-A1 | NOVEL PHOTOSENSITIVE RESIN COMPOSITION AND USE THEREOF | KANEKA CORPORATION (JP) | 2014-03-13 | — | — | US | disclosed |
| US-20140054081-A1 | NOVEL FLEXIBLE PRINTED CIRCUIT INTEGRATED WITH CONDUCTIVE LAYER | KANEKA CORPORATION (JP) | 2014-02-27 | — | — | US | disclosed |
| US-20140048314-A1 | FLEXIBLE PRINTED CIRCUIT INTEGRATED WITH REINFORCING PLATE | KANEKA CORPORATION (JP) | 2014-02-20 | — | — | US | disclosed |
| EP-2300541-B1 | PIGMENT MIXTURES | BASF SE (DE) | 2014-02-12 | — | — | EP | disclosed |
| US-8648130-B2 | Resin composition, transparent member obtained from the resin composition, and use of the same | MITSUI CHEMICALS, INC. (JP) | 2014-02-11 | — | — | US | disclosed |
| US-20140039145-A1 | METHOD OF PRODUCING RESIN FOR THIOURETHANE-BASED OPTICAL MATERIAL USING GENERAL-PURPOSE POLYISOCYANATE COMPOUND, RESIN COMPOSITION FOR THIOURETHANE-BASED OPTICAL MATERIAL AND THIOURETHANE-BASED OPTICAL MATERIAL INCLUDING RESIN PRODUCED BY THE METHOD | KOC SOLUTION CO LTD (KR) | 2014-02-06 | — | — | US | disclosed |
| US-8642718-B2 | Curable composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-02-04 | — | — | US | disclosed |
| US-20140031582-A1 | OPTICAL ELEMENT COMPOUND, OPTICAL MATERIAL, AND OPTICAL ELEMENT | CANON KABUSHIKI KAISHA (JP) | 2014-01-30 | — | — | US | disclosed |
| US-8637633-B2 | Polymerizable composition, and resin and optical part using the same | MITSUI CHEMICALS, INC. (JP) | 2014-01-28 | — | — | US | disclosed |
| US-20140016167-A1 | VOLUME HOLOGRAM TRANSFER FOIL, VOLUME HOLOGRAM LAMINATE, AND PRODUCTION METHOD THEREOF | DAI NIPPON PRINTING CO., LTD. (JP) | 2014-01-16 | — | — | US | disclosed |
| EP-2682430-A2 | METHOD FOR MANUFACTURING RESIN FOR THIOURETHANE-BASED OPTICAL MATERIAL USING UNIVERSAL POLYISOCYANATE COMPOUND, RESIN COMPOSITION, AND OPTICAL MATERIAL MANUFACTURED THEREBY | Koc Solution Co.,LTD. (KR) | 2014-01-08 | — | — | EP | disclosed |
| US-8623476-B2 | Polarizing element and method of producing the same | FUJIFILM CORPORATION (JP) | 2014-01-07 | — | — | US | disclosed |
| US-8617772-B2 | Hologram recording material and hologram recording medium | TDK CORPORATION (JP) | 2013-12-31 | — | — | US | disclosed |
| US-20130333931-A1 | NOVEL INSULATING FILM AND PRINTED WIRING BOARD PROVIDED WITH INSULATING FILM | KANEKA CORPORATION (JP) | 2013-12-19 | — | — | US | disclosed |
| US-8609869-B2 | Heteroaromatic-containing compound, optical material and optical element | CANON KABUSHIKI KAISHA (JP) | 2013-12-17 | — | — | US | disclosed |
| US-20130324633-A1 | 2,2-DIMETHOXY-1,2-DI[4-(METH)ACRYLOYLOXY]PHENYLETHANE-1-ONE, METHOD FOR PRODUCING THE SAME, RADICAL POLYMERIZATION INITIATOR AND PHOTOCURABLE COMPOSITION | TOYO GOSEI CO., LTD (JP) | 2013-12-05 | — | — | US | disclosed |
| US-8585998-B2 | Method for producing graphite film, and graphite film produced by the method | KANEKA CORPORATION (JP) | 2013-11-19 | — | — | US | disclosed |
| US-8586694-B2 | Polymerization catalyst for polythiourethane-based optical material, polymerizable composition containing the catalyst, optical material obtained from the composition, and method for preparing the optical material | MITSUI CHEMICALS, INC. (JP) | 2013-11-19 | — | — | US | disclosed |
| US-8580470-B2 | Charge control agent composition and toner utilizing the same | HODOGAYA CHEMICAL CO., LTD. (JP) | 2013-11-12 | — | — | US | disclosed |
| US-20130293824-A1 | METHOD FOR PRODUCING OPTICAL FILM, OPTICAL FILM PRODUCED BY THE METHOD, AND POLARIZING PLATE AND IMAGE-FORMING DISPLAY DEVICE HAVING THE FILM | FUJIFILM CORPORATION (JP) | 2013-11-07 | — | — | US | disclosed |
| EP-2660276-A1 | PROCESS FOR PRODUCTION OF FINELY FIBROUS CELLULOSE COMPOSITE PREPREG SHEET, PROCESS FOR PRODUCTION OF FINELY FIBROUS CELLULOSE COMPOSITE SHEET, AND PROCESS FOR PRODUCTION OF FINELY FIBROUS CELLULOSE COMPOSITE LAMINATE SHEET | Oji Holdings Corporation (JP) | 2013-11-06 | — | — | EP | disclosed |
| EP-2423197-B1 | A monoazo iron complex compound | HODOGAYA CHEMICAL CO LTD (JP) | 2013-11-06 | — | — | EP | disclosed |
| EP-2423198-B1 | Charge controlling agaent containing a monoazo iron complex compound | HODOGAYA CHEMICAL CO LTD (JP) | 2013-11-06 | — | — | EP | disclosed |
| US-8569541-B2 | Optical element compound, optical material, and optical element | CANON KABUSHIKI KAISHA (JP) | 2013-10-29 | — | — | US | disclosed |
| US-8559084-B2 | Volume hologram transfer foil, volume hologram laminate, and production method thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-10-15 | — | — | US | disclosed |
| US-8557332-B2 | Production method of optical film, optical film and image display | FUJIFILM CORPORATION (JP) | 2013-10-15 | — | — | US | disclosed |
| US-20130265529-A1 | OPTICAL FILM, POLARIZING PLATE AND IMAGE DISPLAY DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-10-10 | — | — | US | disclosed |
| US-20130264007-A1 | PROCESS FOR PRODUCTION OF FINELY FIBROUS CELLULOSE COMPOSITE PREPREG SHEET, PROCESS FOR PRODUCTION OF FINELY FIBROUS CELLULOSE COMPOSITE SHEET, AND PROCESS FOR PRODUCTION OF FINELY FIBROUS CELLULOSE COMPOSITE LAMINATE SHEET | Oji Holdings Corporation (JP) | 2013-10-10 | — | — | US | disclosed |
| US-20130264099-A1 | NOVEL PHOTOSENSITIVE RESIN COMPOSITION AND USE THEREOF | KANEKA CORPORATION (JP) | 2013-10-10 | — | — | US | disclosed |
| EP-1542273-B1 | Circuit-connecting material and circuit terminal connected structure and connecting method | HITACHI CHEMICAL CO LTD (JP) | 2013-09-25 | — | — | EP | disclosed |
| US-8541935-B2 | Color filter and light-emitting display element | UDC IRELAND LIMITED (IE) | 2013-09-24 | — | — | US | disclosed |
| US-20130237643-A1 | D1364 BT SECONDARY COATINGS ON OPTICAL FIBER | DSM IP ASSETS B.V. (NL) | 2013-09-12 | — | — | US | disclosed |
| EP-2009505-B1 | CHARGE CONTROL AGENT COMPOSITION AND TONER UTILIZING THE SAME | HODOGAYA CHEMICAL CO LTD (JP) | 2013-08-14 | — | — | EP | disclosed |
| EP-2624074-A1 | VOLUME HOLOGRAM TRANSFER FOIL | Dai Nippon Printing Co., Ltd. (JP) | 2013-08-07 | — | — | EP | disclosed |
| US-20130189850-A1 | RESIST UNDERLAYER COATING FORMING COMPOSITION FOR FORMING PHOTO-CROSSLINKING CURED RESIST UNDERLAYER COATING | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-07-25 | — | — | US | disclosed |
| US-20130189624-A1 | NOVEL PHOTOSENSITIVE RESIN COMPOSITION PRODUCTION KIT, AND USE THEREOF | KANEKA CORPORATION (JP) | 2013-07-25 | — | — | US | disclosed |
| US-20130182301-A1 | VOLUME HOLOGRAM TRANSFER FOIL | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-07-18 | — | — | US | disclosed |
| US-20130183499-A1 | FLEXIBLE PRINTED CIRCUIT BOARD INTEGRATED WITH REINFORCING PLATE, AND METHOD FOR MANUFACTURING FLEXIBLE PRINTED CIRCUIT BOARD INTEGRATED WITH REINFORCING PLATE | KANEKA CORPORATION (JP) | 2013-07-18 | — | — | US | disclosed |
| EP-2615054-A1 | ROPE FOR ELEVATOR | Mitsubishi Electric Corporation (JP) | 2013-07-17 | — | — | EP | disclosed |
| US-20130169896-A1 | STEREO IMAGE PRINT AND METHOD OF PRODUCING THE SAME | FUJIFILM CORPORATION (JP) | 2013-07-04 | — | — | US | disclosed |
| EP-2610220-A1 | DISPERSION IN HYDROPHOBIC ORGANIC SOLVENT OF SURFACE-MODIFIED COLLOIDAL PARTICLES OF ANHYDROUS ZINC ANTIMONATE, COATING COMPOSITION CONTAINING SAME, AND COATED MEMBER | Nissan Chemical Industries, Ltd. (JP) | 2013-07-03 | — | — | EP | disclosed |
| EP-1882713-B1 | CURABLE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2013-07-03 | — | — | EP | disclosed |
| US-20130164540-A1 | PRIMER COMPOSITION FOR OPTICAL ARTICLES AND OPTICAL ARTICLES | TOKUYAMA CORPORATION (JP) | 2013-06-27 | — | — | US | disclosed |
| US-8465580-B2 | Aqueous ink composition and urethane resin composition for aqueous ink composition | SEIKO EPSON CORPORATION (JP) | 2013-06-18 | — | — | US | disclosed |
| US-20130143028-A1 | OPTICAL FILM, METHOD FOR PRODUCING THE SAME, POLARIZING PLATE AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2013-06-06 | — | — | US | disclosed |
| US-20130143035-A1 | HYDROPHOBIC-ORGANIC-SOLVENT DISPERSION OF SURFACE-MODIFIED COLLOIDAL PARTICLES OF ANHYDROUS ZINC ANTIMONATE, COATING COMPOSITION CONTAINING THE SAME, AND COATED MEMBER | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-06-06 | — | — | US | disclosed |
| EP-1988109-B1 | POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL | MITSUI CHEMICALS INC (JP) | 2013-05-29 | — | — | EP | disclosed |
| US-20130130030-A1 | ELEVATOR ROPE | MITSUBISHI ELECTRIC CORPORATION (JP) | 2013-05-23 | — | — | US | disclosed |
| US-20130120676-A1 | STEREO IMAGE PRINT AND METHOD OF PRODUCING THE SAME | FUJIFILM CORPORATION (JP) | 2013-05-16 | — | — | US | disclosed |
| US-8426021-B2 | D 1364 BT secondary coatings on optical fiber | DSM IP ASSETS B.V. (NL) | 2013-04-23 | — | — | US | disclosed |
| US-8426111-B2 | Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-04-23 | — | — | US | disclosed |
| US-20130095426-A1 | PHOTOSENSITIVE POLYMIDES | ETERNAL CHEMICAL CO., LTD. (TW) | 2013-04-18 | — | — | US | disclosed |
| US-8420279-B2 | Silicon-tantalum/zirconium oxide complex and photopolymerizable compound; high refractive index change, flexibility, high sensitivity, low scattering, environment resistance, durability, and low shrinkage | TDK CORPORATION (JP) | 2013-04-16 | — | — | US | disclosed |
| US-8420280-B2 | Silicon-tantalum/zirconium oxide complex and photopolymerizable compound; green lasers; high refractive index change, flexibility, high sensitivity, low scattering, environment resistance, durability, and low shrinkage | TDK CORPORATION (JP) | 2013-04-16 | — | — | US | disclosed |
| US-20130084442-A1 | METHOD OF MANUFACTURING ANTI-REFLECTION FILM, ANTI-REFLECTION FILM AND COATING COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-04-04 | — | — | US | disclosed |
| US-8409714-B2 | Primer composition for optical articles and optical articles | TOKUYAMA CORPORATION (JP) | 2013-04-02 | — | — | US | disclosed |
| US-20130064986-A1 | METHOD FOR MANUFACTURING FILM WITH MULTILAYER | FUJIFILM CORPORATION (JP) | 2013-03-14 | — | — | US | disclosed |
| US-8394920-B2 | Composition for resin and optical lens obtained therefrom | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-03-12 | — | — | US | disclosed |
| US-8389049-B2 | Optical film, method for producing the same, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2013-03-05 | — | — | US | disclosed |
| US-20130052363-A1 | METHOD FOR MANUFACTURING FILM WITH MULTILAYER | FUJIFILM CORPORATION (JP) | 2013-02-28 | — | — | US | disclosed |
| US-20130034662-A1 | METHOD OF MANUFACTURING FILM WITH A COATING LAYER | FUJIFILM CORPORATION (JP) | 2013-02-07 | — | — | US | disclosed |
| US-8367275-B2 | Lengthy volume hologram layer transfer foil, method of producing volume hologram laminate using the same and volume hologram laminate | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-02-05 | — | — | US | disclosed |
| US-8367274-B2 | High refractive index change; flexibility; high sensitivity; low scattering; weatherproofing; durability; containing organometallic compound and photopolymerizable compound | TDK CORPORATION (JP) | 2013-02-05 | — | — | US | disclosed |
| US-8354204-B2 | hIGH REFRACTIVE INDEX, FLEXIBILITY; HIGH SENSITIVITY; LOW SCATTERING; WEATHERPROOFING; DURABILITY ; CONTAINING ORGANOMETALLIC COMPOUND WITH PHOTOPOLYMERIZABLE COMPOUND | TDK CORPORATION (JP) | 2013-01-15 | — | — | US | disclosed |
| US-8349524-B2 | High refractive index; flexibility; high sensitivity; low scattering; weatherproofing; durability; containing organometallic compound and fine metal oxide particles | TDK CORPORATION (JP) | 2013-01-08 | — | — | US | disclosed |
| US-8349539-B2 | Photosensitive polymides | ETERNAL CHEMICAL CO., LTD. (TW) | 2013-01-08 | — | — | US | disclosed |
| US-20130005934-A1 | Polymerizable Composition, and Resin and Optical Part Using the Same | MITSUI CHEMICALS, INC (JP) | 2013-01-03 | — | — | US | disclosed |
| US-8343691-B2 | Hologram recording material and hologram recording medium | TDK CORPORATION (JP) | 2013-01-01 | — | — | US | disclosed |
| WO-2012176126-A1 | PRINTING DIFFRACTION GRATINGS ON PAPER AND BOARD | BASF SE (DE) | 2012-12-27 | — | — | WO | disclosed |
| US-20120330052-A1 | CONJUGATED AROMATIC COMPOUND, OPTICAL MATERIAL, AND OPTICAL ELEMENT | CANON KABUSHIKI KAISHA (JP) | 2012-12-27 | — | — | US | disclosed |
| US-8338074-B2 | Actinic radiation-curable stereolithographic resin composition having improved stability | CMET INC. (JP) | 2012-12-25 | — | — | US | disclosed |
| US-20120315573-A1 | CHARGE CONTROL AGENT COMPOSITION AND TONER UTILIZING THE SAME | HODOGAYA CHEMICAL CO., LTD. (JP) | 2012-12-13 | — | — | US | disclosed |
| US-8322869-B2 | Optical film, polarizing plate, and image display apparatus | FUJIFILM CORPORATION (JP) | 2012-12-04 | — | — | US | disclosed |
| US-20120301639-A1 | COATING COMPOSITIONS FOR SECURITY ELEMENTS AND HOLOGRAMS | BASF SE (DE) | 2012-11-29 | — | — | US | disclosed |
| US-8313201-B2 | Optical film, polarizing plate and image display apparatus | FUJIFILM CORPORATION (JP) | 2012-11-20 | — | — | US | disclosed |
| US-8304507-B2 | Polymerizable composition for polythiourethane optical material, polythiourethane optical material obtained from the polymerizable composition, and polymerization catalyst for polythiourethane optical material | MITSUI CHEMICALS, INC. (JP) | 2012-11-06 | — | — | US | disclosed |
| US-20120270977-A1 | TITANIUM DIOXIDE DISPERSION LIQUID, METHOD FOR MANUFACTURING TITANIUM DIOXIDE DISPERSION LIQUID, AND ORGANIC OPTICAL ELEMENT | CANON KABUSHIKI KAISHA (JP) | 2012-10-25 | — | — | US | disclosed |
| EP-1717851-B1 | Circuit-connecting material and circuit terminal connected structure and connecting method | HITACHI CHEMICAL CO LTD (JP) | 2012-10-17 | — | — | EP | disclosed |
| US-20120251739-A1 | OPTICAL FILM, POLARIZER, AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2012-10-04 | — | — | US | disclosed |
| EP-2504400-A2 | COATING COMPOSITIONS FOR SECURITY ELEMENTS AND HOLOGRAMS | BASF SE (DE) | 2012-10-03 | — | — | EP | disclosed |
| US-20120237673-A1 | METHOD FOR PRODUCING OPTICAL FILM | FUJIFILM CORPORATION (JP) | 2012-09-20 | — | — | US | disclosed |
| EP-2500372-A1 | FILM AND APPLICATION THEREOF | Mitsui Chemicals, Inc. (JP) | 2012-09-19 | — | — | EP | disclosed |
| US-8268546-B2 | Variations in wettability; optically forming pattern; photocatalyst action upon pattern-wisw exposure;color filters, lenses, printing plates | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-09-18 | — | — | US | disclosed |
| US-20120225211-A1 | METHOD FOR PRODUCING LAMINATE FILM | FUJIFILM CORPORATION (JP) | 2012-09-06 | — | — | US | disclosed |
| US-20120225274-A1 | FILM AND USES THEREOF | MITSUI CHEMICALS, INC. (JP) | 2012-09-06 | — | — | US | disclosed |
| US-20120207992-A1 | PRODUCTION METHOD OF ANTIREFLECTION FILM, ANTIREFLECTION FILM AND COATING COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-08-16 | — | — | US | disclosed |
| US-20120207990-A1 | PRODUCTION METHOD OF ANTIREFLECTION FILM, ANTIREFLECTION FILM AND COATING COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-08-16 | — | — | US | disclosed |
| US-20120203012-A1 | HETEROAROMATIC-CONTAINING COMPOUND, OPTICAL MATERIAL AND OPTICAL ELEMENT | CANON KABUSHIKI KAISHA (JP) | 2012-08-09 | — | — | US | disclosed |
| US-20120199994-A1 | APPARATUS AND METHOD FOR A SUB MICROSCOPIC AND OPTICALLY VARIABLE IMAGE CARRYING DEVICE | BASF SE (DE) | 2012-08-09 | — | — | US | disclosed |
| EP-2478396-A1 | COLOR FILTER AND LIGHT-EMITTING DISPLAY ELEMENT | FUJIFILM Corporation (JP) | 2012-07-25 | — | — | EP | disclosed |
| EP-1697131-B1 | ANTIREFLECTION FILM, POLARIZING PLATE, METHOD FOR PRODUCING THEM, LIQUID CRYSTAL DISPLAY ELEMENT, LIQUID CRYSTAL DISPLAY DEVICE, AND IMAGE DISPLAY DEVICE | FUJIFILM CORP (JP) | 2012-06-27 | — | — | EP | disclosed |
| EP-2467755-A1 | APPARATUS AND METHOD FOR A SUB MICROSCOPIC AND OPTICALLY VARIABLE IMAGE CARRYING DEVICE | BASF SE (DE) | 2012-06-27 | — | — | EP | disclosed |
| US-8206779-B2 | Method for producing laminate, polarizing plate, and image display device | FUJIFILM CORPORATION (JP) | 2012-06-26 | — | — | US | disclosed |
| EP-2014700-B1 | POLYMERIZABLE COMPOSITION, RESIN USING THE SAME AND OPTICAL COMPONENT | MITSUI CHEMICALS INC (JP) | 2012-06-13 | — | — | EP | disclosed |
| EP-2461350-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2012-06-06 | — | — | EP | disclosed |
| US-8192898-B2 | Composition for fluorine-containing volume holographic data recording material and fluorine-containing volume holographic data recording media made of same | DAIKIN INDUSTRIES, LTD. (JP) | 2012-06-05 | — | — | US | disclosed |
| US-8194210-B2 | Polarizing plate protective film, polarizing plate and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2012-06-05 | — | — | US | disclosed |
| US-8187704-B2 | Optical film, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2012-05-29 | — | — | US | disclosed |
| US-20120128891-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-05-24 | — | — | US | disclosed |
| EP-2453320-A1 | Multilayer volume hologram, and label for multilayer volume hologram fabrication | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-05-16 | — | — | EP | disclosed |
| US-20120099054-A1 | COLOR FILTER AND LIGHT-EMITTING DISPLAY ELEMENT | UDC IRELAND LIMITED (IE) | 2012-04-26 | — | — | US | disclosed |
| US-20120100395-A1 | INDICATOR SYSTEM FOR MONITORING A STERILIZATION PROCESS | BASF SE (DE) | 2012-04-26 | — | — | US | disclosed |
| US-20120082863-A1 | Optical film, polarizing plate, image display, and manufacturing method of optical film | FUJITIFILM Corporation (JP) | 2012-04-05 | — | — | US | disclosed |
| US-8142605-B2 | Circuit-connecting material and circuit terminal connected structure and connecting method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-03-27 | — | — | US | disclosed |
| EP-2427761-A2 | INDICATOR SYSTEM FOR MONITORING A STERILIZATION PROCESS | BASF SE (DE) | 2012-03-14 | — | — | EP | disclosed |
| EP-2423281-A1 | COATING COMPOSITION | Tokuyama Corporation (JP) | 2012-02-29 | — | — | EP | disclosed |
| EP-2423197-A1 | A monoazo iron complex compound | Hodogaya Chemical Co., Ltd. (JP) | 2012-02-29 | — | — | EP | disclosed |
| EP-2423198-A1 | Charge controlling agaent containing a monoazo iron complex compound | Hodogaya Chemical Co., Ltd. (JP) | 2012-02-29 | — | — | EP | disclosed |
| US-8124224-B2 | Antireflection laminate, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20120029121-A1 | THIN ALUMINIUM FLAKES | BASF SE (DE) | 2012-02-02 | — | — | US | disclosed |
| US-8105752-B2 | Photosensitive polyimides | ETERNAL CHEMICAL CO., LTD. (TW) | 2012-01-31 | — | — | US | disclosed |
| EP-2207854-B1 | SECURITY ELEMENT | BASF SE (DE) | 2012-01-25 | — | — | EP | disclosed |
| EP-2407498-A2 | Polymerizable composition for polythiourethane optical material, polythiourethane optical material obtained from the polymerizable composition, and polymerization catalyst for polythiourethane optical material | Mitsui Chemicals, Inc. (JP) | 2012-01-18 | — | — | EP | disclosed |
| US-20120003474-A1 | D 1364 BT SECONDARY COATINGS ON OPTICAL FIBER | DSM IP ASSETS B.V. | 2012-01-05 | — | — | US | disclosed |
| US-20120004360-A1 | OPTICAL FILM AND MANUFACTURING METHOD THEREFOR | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |
| EP-2390684-A2 | Optical element compound, optical material, and optical element | Canon Kabushiki Kaisha (JP) | 2011-11-30 | — | — | EP | disclosed |
| US-8066917-B2 | Photochromic curable composition | TOKUYAMA CORPORATION (JP) | 2011-11-29 | — | — | US | disclosed |
| US-20110288330-A1 | OPTICAL ELEMENT COMPOUND, OPTICAL MATERIAL, AND OPTICAL ELEMENT | CANON KABUSHIKI KAISHA (JP) | 2011-11-24 | — | — | US | disclosed |
| US-8063245-B2 | Phosphazene compound, photosensitive resin composition and use thereof | KANEKA CORPORATION (JP) | 2011-11-22 | — | — | US | disclosed |
| US-20110281988-A1 | AQUEOUS INK COMPOSITION AND URETHANE RESIN COMPOSITION FOR AQUEOUS INK COMPOSITION | SEIKO EPSON CORPORATION | 2011-11-17 | — | — | US | disclosed |
| US-20110268935-A1 | Antistatic laminate, optical film, polarizing plate, and image display device | FUJIFILM CORPORATION (JP) | 2011-11-03 | — | — | US | disclosed |
| US-8048615-B2 | Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-11-01 | — | — | US | disclosed |
| US-8047662-B2 | Antiglare film, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2011-11-01 | — | — | US | disclosed |
| EP-2379650-A1 | THIN ALUMINUM FLAKES | BASF SE (DE) | 2011-10-26 | — | — | EP | disclosed |
| US-20110257146-A1 | Method of Treating Kcnq Related Disorders Using Organozinc Compounds | THE JOHNS HOPKINS UNIVERSITY (US) | 2011-10-20 | — | — | US | disclosed |
| EP-1734082-B1 | MONOAZO/IRON COMPLEX COMPOUND, CHARGE CONTROL AGENT COMPRISING THE SAME, AND TONER | HODOGAYA CHEMICAL CO LTD (JP) | 2011-10-19 | — | — | EP | disclosed |
| US-8039065-B2 | Antireflection film, polarizing plate, method for producing them, liquid crystal display element, liquid crystal display device, and image display device | FUJIFILM CORPORATION (JP) | 2011-10-18 | — | — | US | disclosed |
| US-8034651-B2 | Light receiving device and method of manufacturing light receiving device | SUMITOMO BAKELITE CO., LTD. (JP) | 2011-10-11 | — | — | US | disclosed |
| US-20110244218-A1 | Coating composition, optical film, polarizing plate, and image display apparatus | FUJIFILM CORPORATION (JP) | 2011-10-06 | — | — | US | disclosed |
| US-8022163-B2 | Internal mold release agent for production of polythiourethane optical material | MITSUI CHEMICALS, INC. (JP) | 2011-09-20 | — | — | US | disclosed |
| US-8022126-B2 | A cured acrylic polymer based on a high-refractive index (meth)acrylic diester-fluorene monomer having a refractive index of >1.55 and a nonfunctional fluorene compound; heat resistance, light resistance, and flexibility equivalent to silicone resins; radiation transparent; auto headlights; backlighting | SONY CORPORATION (JP) | 2011-09-20 | — | — | US | disclosed |
| US-8021800-B2 | Metal oxide of Silicon and Zirconium, coordinated to an aromatic carboxylic acid and a photopolymerizable compound; high refractive index change, flexibility, high sensitivity, low scattering, environment resistance, durability, low dimensional change; green and blue laser | TDK CORPORATION (JP) | 2011-09-20 | — | — | US | disclosed |
| US-20110217637-A1 | POLYMERIZABLE COMPOSITION FOR COLOR FILTER, COLOR FILTER, AND SOLID-STATE IMAGING DEVICE | FUJIFILM CORPORATION (JP) | 2011-09-08 | — | — | US | disclosed |
| US-8013084-B2 | Manufacturing method and apparatus of optical material | SEIKO EPSON CORPORATION (JP) | 2011-09-06 | — | — | US | disclosed |
| US-8007878-B2 | Antireflection film, polarizing plate, and image display device | FUJIFILM CORPORATION (JP) | 2011-08-30 | — | — | US | disclosed |
| US-7998662-B2 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2011-08-16 | — | — | US | disclosed |
| EP-2355253-A1 | ANISOTROPIC CONDUCTIVE FILM | Sumitomo Electric Industries, Ltd. (JP) | 2011-08-10 | — | — | EP | disclosed |
| US-20110190466-A1 | POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL | MITSUI CHEMICALS, INC. (JP) | 2011-08-04 | — | — | US | disclosed |
| US-7988777-B2 | Aqueous ink composition and urethane resin composition for aqueous ink composition | SEIKO EPSON CORPORATION (JP) | 2011-08-02 | — | — | US | disclosed |
| US-7982953-B2 | Antireflection film, and polarizing plate and image display device using the same | FUJIFILM CORPORATION (JP) | 2011-07-19 | — | — | US | disclosed |
| US-7965446-B2 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2011-06-21 | — | — | US | disclosed |
| WO-2011064162-A2 | COATING COMPOSITIONS FOR SECURITY ELEMENTS AND HOLOGRAMS | BASF SE (DE) | 2011-06-03 | — | — | WO | disclosed |
| US-20110114893-A1 | CIRCUIT-CONNECTING MATERIAL AND CIRCUIT TERMINAL CONNECTED STRUCTURE AND CONNECTING METHOD | HITACHI CHEMICAL CO., LTD. (JP) | 2011-05-19 | — | — | US | disclosed |
| US-7943275-B2 | Color filter with colored layer on transparent substrate, plurality of colors formed in a predetermined pattern; light shielding layerformed through a wettability-variable component layer; titanium oxide photocatalyst; printing plates, lithography; polysiloxane or silicone binder | DAI NIPPON PRINTING CO., LTD. (JP) | 2011-05-17 | — | — | US | disclosed |
| US-20110112234-A1 | PIGMENT MIXTURES | BASF SE (DE) | 2011-05-12 | — | — | US | disclosed |
| US-20110112269-A1 | POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYTHIOURETHANE OPTICAL MATERIAL OBTAINED FROM THE POLYMERIZABLE COMPOSITION, AND POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL | MITSUI CHEMICALS, INC. (JP) | 2011-05-12 | — | — | US | disclosed |
| EP-1275668-B1 | PHOTOCURABLE COMPOSITION, CURED OBJECT, AND PROCESS FOR PRODUCING THE SAME | MITSUBISHI CHEM CORP (JP) | 2011-05-11 | — | — | EP | disclosed |
| US-7939221-B2 | Metal oxide of Silicon and Zirconium, coordinated to a beta -dicarbonyl; anda photopolymerizable compound,high refractive index change, flexibility, high sensitivity, low scattering, environment resistance, durability, low dimensional change; green and blue laser | TDK CORPORATION (JP) | 2011-05-10 | — | — | US | disclosed |
| US-20110104596-A1 | POLYMERIZABLE COMPOSITION, LIGHT-BLOCKING COLOR FILTER FOR SOLID-STATE IMAGING DEVICE, AND SOLID-STATE IMAGING DEVICE | FUJIFILM CORPORATION (JP) | 2011-05-05 | — | — | US | disclosed |
| US-7932000-B2 | Titanium complex and photopolymerizable compound; green lasers; high refractive index change, flexibility, high sensitivity, low scattering, environment resistance, durability, and low shrinkage | TDK CORPORATION (JP) | 2011-04-26 | — | — | US | disclosed |
| US-20110083884-A1 | NOVEL POLYIMIDE PRECURSOR COMPOSITION AND USE THEREOF | KANEKA CORPORATION (JP) | 2011-04-14 | — | — | US | disclosed |
| EP-2309340-A1 | Volume hologram transfer foil, volume hologram laminate, and production method thereof | Dai Nippon Printing Co., Ltd. (JP) | 2011-04-13 | — | — | EP | disclosed |
| US-7923116-B2 | Optic-purpose precursor composition, optic-purpose resin, optical element, and optical article | NIKON CORPORATION (JP) | 2011-04-12 | — | — | US | disclosed |
| US-20110075075-A1 | Light transmissive substrate, method of making transmissive substrate, surface light source unit, polarizing plate, and liquid crystal device | FUJIFILM CORPORATION (JP) | 2011-03-31 | — | — | US | disclosed |
| EP-2300541-A1 | PIGMENT MIXTURES | BASF SE (DE) | 2011-03-30 | — | — | EP | disclosed |
| US-20110061915-A1 | NOVEL RESIN COMPOSITION AND USE THEREOF | KANEKA CORPORATION (JP) | 2011-03-17 | — | — | US | disclosed |
| WO-2011030883-A1 | COLOR FILTER AND LIGHT-EMITTING DISPLAY ELEMENT | FUJIFILM CORPORATION (JP) | 2011-03-17 | — | — | WO | disclosed |
| US-20110061914-A1 | NOVEL POLYIMIDE PRECURSOR COMPOSITION, USE OF THE SAME, AND PRODUCTION METHOD OF THE SAME | KANEKA CORPORATION (JP) | 2011-03-17 | — | — | US | disclosed |
| EP-2295484-A1 | POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYTHIOURETHANE OPTICAL MATERIAL OBTAINED FROM SAME POLYMERIZABLE COMPOSITION, AND POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL | Mitsui Chemicals, Inc. (JP) | 2011-03-16 | — | — | EP | disclosed |
| EP-1860161-B9 | Ink set for ink jet-jet recording, method for ink-jet recording and recorded matter | SEIKO EPSON CORP (JP) | 2011-03-02 | — | — | EP | disclosed |
| WO-2011020727-A1 | APPARATUS AND METHOD FOR A SUB MICROSCOPIC AND OPTICALLY VARIABLE IMAGE CARRYING DEVICE | BASF SE (DE) | 2011-02-24 | — | — | WO | disclosed |
| EP-2091883-B1 | D1364 BT SECONDARY COATING ON OPTICAL FIBER | DSM IP ASSETS BV (NL) | 2011-02-16 | — | — | EP | disclosed |
| US-7883821-B2 | Producing a metal oxide comprising titanium as a metal element by hydrolyzing an alkoxide compound of titanium, yielding a precursor of a metal oxide, and advancing polycondensation reaction of metal oxide precursor, thereby forming metal oxide; decreased coloration, high flexibility | TDK CORPORATION (JP) | 2011-02-08 | — | — | US | disclosed |
| US-20110026116-A1 | Optical laminate | FUJIFILM CORPORATION (JP) | 2011-02-03 | — | — | US | disclosed |
| US-20110026120-A1 | Antireflective film, polarizing plate, and image display device | FUJIFILM CORPORATION (JP) | 2011-02-03 | — | — | US | disclosed |
| US-7879956-B2 | Circuit-connecting material and circuit terminal connected structure and connecting method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2011-02-01 | — | — | US | disclosed |
| EP-2275867-A1 | POLYMERIZABLE COMPOSITION, LIGHT-BLOCKING COLOR FILTER FOR SOLID-STATE IMAGING DEVICE, AND SOLID-STATE IMAGING DEVICE | FUJIFILM Corporation (JP) | 2011-01-19 | — | — | EP | disclosed |
| EP-1398317-B1 | ALICYCLIC COMPOUND FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL CO (JP) | 2011-01-12 | — | — | EP | disclosed |
| US-7868109-B2 | Curable resin composition | SONY CORPORATION (JP) | 2011-01-11 | — | — | US | disclosed |
| US-20100331515-A1 | COMPOSITION FOR RESIN AND OPTICAL LENS OBTAINED THEREFROM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2010-12-30 | — | — | US | disclosed |
| US-20100323147-A1 | ANISOTROPIC CONDUCTIVE FILM | SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) | 2010-12-23 | — | — | US | disclosed |
| EP-1860161-B1 | Ink set for ink jet-jet recording, method for ink-jet recording and recorded matter | SEIKO EPSON CORP (JP) | 2010-12-08 | — | — | EP | disclosed |
| US-7848021-B2 | Optical film, antireflection film, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2010-12-07 | — | — | US | disclosed |
| US-20100298519-A1 | POLYMERIZABLE COMPOSITION, AND RESIN AND OPTICAL PART USING THE SAME | MITSUI CHEMICALS, INC. (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20100295287-A1 | SECURITY ELEMENT | BASF SE (US) | 2010-11-25 | — | — | US | disclosed |
| WO-2010128063-A2 | INDICATOR SYSTEM FOR MONITORING A STERILIZATION PROCESS | BASF SE (DE) | 2010-11-11 | — | — | WO | disclosed |
| EP-2243798-A1 | COMPOSITION FOR RESIN AND OPTICAL LENS OBTAINED THEREFROM | Mitsubishi Gas Chemical Company, Inc. (JP) | 2010-10-27 | — | — | EP | disclosed |
| US-20100258713-A1 | LIGHT RECEIVING DEVICE AND METHOD OF MANUFACTURING LIGHT RECEIVING DEVICE | SUMITOMO BAKELITE CO., LTD (JP) | 2010-10-14 | — | — | US | disclosed |
| EP-1376228-B1 | Process for producing a lens | DAINIPPON PRINTING CO LTD (JP) | 2010-10-13 | — | — | EP | disclosed |
| US-20100256271-A1 | RESIN COMPOSITION, TRANSPARENT MEMBER OBTAINED FROM THE RESIN COMPOSITION, AND USE OF THE SAME | MITSUI CHEMICALS, INC. (JP) | 2010-10-07 | — | — | US | disclosed |
| US-20100246014-A1 | ANTIREFLECTIVE FILM, POLARIZING PLATE, IMAGE DISPLAY DEVICE AND COATING COMPOSITION FOR FORMING LOW REFRACTIVE INDEX LAYER | FUJIFILM CORPORATION (JP) | 2010-09-30 | — | — | US | disclosed |
| US-20100247839-A1 | OPTICAL DEVICE | TDK CORPORATION (JP) | 2010-09-30 | — | — | US | disclosed |
| US-20100229417-A1 | METHOD AND APPARATUS FOR CURING COATED FILM AND OPTICAL FILM | FUJIFILM CORPORATION (JP) | 2010-09-16 | — | — | US | disclosed |
| US-20100234498-A1 | INTERNAL MOLD RELEASE AGENT FOR PRODUCTION OF POLYTHIOURETHANE OPTICAL MATERIAL | MITSUI CHEMICALS, INC. (JP) | 2010-09-16 | — | — | US | disclosed |
| US-20100230650-A1 | PHOTOCHROMIC CURABLE COMPOSITION | GULFSTREAM INC. (CA) | 2010-09-16 | — | — | US | disclosed |
| US-20100218984-A1 | PHOTOSENSITIVE DRY FILM RESIST, PRINTED WIRING BOARD MAKING USE OF THE SAME, AND PROCESS FOR PRODUCING PRINTED WIRING BOARD | KANEKA CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| EP-2223969-A1 | RESIN COMPOSITION, TRANSPARENT MEMBER OBTAINED FROM THE RESIN COMPOSITION, AND USE OF THE SAME | Mitsui Chemicals, Inc. (JP) | 2010-09-01 | — | — | EP | disclosed |
| EP-2221325-A1 | PHOTOCHROMIC CURABLE COMPOSITION | Tokuyama Corporation (JP) | 2010-08-25 | — | — | EP | disclosed |
| US-7767361-B2 | Hologram recording material, process for producing the same and hologram recording medium | TDK CORPORATION (JP) | 2010-08-03 | — | — | US | disclosed |
| EP-2207854-A2 | SECURITY ELEMENT | BASF SE (DE) | 2010-07-21 | — | — | EP | disclosed |
| WO-2010069823-A1 | THIN ALUMINUM FLAKES | BASF SE (DE) | 2010-06-24 | — | — | WO | disclosed |
| CN-101738888-A | Developer, developer storing body, developing device and image forming apparatus | OKI DATA KK | 2010-06-16 | — | — | CN | disclosed |
| US-20100132989-A1 | NOVEL POLYIMIDE PRECURSOR COMPOSITION AND USE THEREOF | KANEKA CORPORATION (JP) | 2010-06-03 | — | — | US | disclosed |
| US-20100134726-A1 | POLARIZING ELEMENT AND METHOD OF PRODUCING THE SAME | FUJIFILM CORPORATION (JP) | 2010-06-03 | — | — | US | disclosed |
| EP-1319966-B1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL CO (JP) | 2010-05-26 | — | — | EP | disclosed |
| US-20100124433-A1 | Developer, developer storing body, developing device and image forming apparatus | OKI DATA CORPORATION (JP) | 2010-05-20 | — | — | US | disclosed |
| US-20100112311-A1 | STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF | KOBAYASHI HIRONORI | 2010-05-06 | — | — | US | disclosed |
| US-20100112460-A1 | COMPOSITION FOR FLUORINE-CONTAINING VOLUME HOLOGRAPHIC DATA RECORDING MATERIAL AND FLUORINE-CONTAINING VOLUME HOLOGRAPHIC DATA RECORDING MEDIA MADE OF SAME | UMEDA CENTER BUILDING (JP) | 2010-05-06 | — | — | US | disclosed |
| EP-1482002-B1 | POLYMERIZABLE COMPOSITION CONTAINING NOVEL CYCLIC SULFUR COMPOUND AND RESIN OBTAINED BY CURING THE POLYMERIZABLE COMPOSITION | MITSUI CHEMICALS INC (JP) | 2010-04-28 | — | — | EP | disclosed |
| EP-2042903-B1 | Optical film, polarizing plate and image display device | FUJIFILM CORP (JP) | 2010-04-21 | — | — | EP | disclosed |
| US-20100084171-A1 | NOVEL POLYIMIDE PRECURSOR COMPOSITION, USE THEREOF AND PRODUCTION METHOD THEREOF | KANEKA CORPORATION (JP) | 2010-04-08 | — | — | US | disclosed |
| US-20100086859-A1 | HOLOGRAM RECORDING MATERIAL AND HOLOGRAM RECORDING MEDIUM | TDK CORPORATION (JP) | 2010-04-08 | — | — | US | disclosed |
| US-20100086871-A1 | PHOTOSENSITIVE POLYIMIDES | ETERNAL CHEMICAL CO., LTD. | 2010-04-08 | — | — | US | disclosed |
| US-20100086874-A1 | Photosensitive polymides | ETERNAL CHEMICAL CO., LTD. (TW) | 2010-04-08 | — | — | US | disclosed |
| US-20100079867-A1 | OPTICAL FILM, POLARIZING PLATE AND IMAGE DISPLAY APPARATUS | FUJIFILM CORPORATION (JP) | 2010-04-01 | — | — | US | disclosed |
| EP-2169723-A1 | LIGHT RECEIVING DEVICE AND METHOD OF MANUFACTURING LIGHT RECEIVING DEVICE | Sumitomo Bakelite Co., Ltd. (JP) | 2010-03-31 | — | — | EP | disclosed |
| US-7687224-B2 | Photosensitive film | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2010-03-30 | — | — | US | disclosed |
| US-20100060986-A1 | Optic-purpose precursor composition, optic-purpose resin, optical element, and optical article | NIKON CORPORATION (JP) | 2010-03-11 | — | — | US | disclosed |
| WO-2010021476-A2 | PHOTOPOLYMERIZABLE OLIGOMER, PHOTOPOLYMERIZABLE RESIN COMPOSITION CONTAINING THE SAME, AND OPTICAL FIBER | 에스에스씨피 주식회사 (KR) | 2010-02-25 | — | — | WO | disclosed |
| US-20100016517-A1 | POLYMERIZATION CATALYST FOR POLYTHIOURETHANE-BASED OPTICAL MATERIAL, POLYMERIZABLE COMPOSITION CONTAINING THE CATALYST, OPTICAL MATERIAL OBTAINED FROM THE COMPOSITION, AND METHOD FOR PREPARING THE OPTICAL MATERIAL | MITSUI CHEMICALS, INC (JP) | 2010-01-21 | — | — | US | disclosed |
| US-7645561-B1 | Photosensitive film | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2010-01-12 | — | — | US | disclosed |
| US-7645562-B2 | Photosensitive film | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2010-01-12 | — | — | US | disclosed |
| WO-2009156275-A1 | PIGMENT MIXTURES | BASF SE (DE) | 2009-12-30 | — | — | WO | disclosed |
| US-7638259-B2 | Polyimide resin soluble in aqueous alkaline solution, composition comprising the resin and cured coating prepared from the composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-12-29 | — | — | US | disclosed |
| US-7629050-B2 | Circuit-connecting material and circuit terminal connected structure and connecting method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2009-12-08 | — | — | US | disclosed |
| US-7629056-B2 | SUPERIOR LOW-TEMPERATURE RAPID CURABILITY AND ALSO HAVING A LONG POT LIFE | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2009-12-08 | — | — | US | disclosed |
| US-7618713-B2 | interposed between circuit electrodes facing each other and electrically connects the electrodes in the pressing direction by pressing the facing electrodes against each other; the circuit-connecting material comprising as essential components, a curing agent and a hydroxy resin with radical polymer | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2009-11-17 | — | — | US | disclosed |
| EP-2116558-A1 | POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYMERIZABLE COMPOSITION CONTAINING THE CATALYST, OPTICAL MATERIAL OBTAINED FROM THE COMPOSITION, AND METHOD FOR PRODUCING THE OPTICAL MATERIAL | Mitsui Chemicals, Inc. (JP) | 2009-11-11 | — | — | EP | disclosed |
| EP-1378535-B1 | POLYMERIZATION REGULATORS AND COMPOSITIONS FOR RESIN | MITSUBISHI GAS CHEMICAL CO (JP) | 2009-11-11 | — | — | EP | disclosed |
| US-7604868-B2 | Interposed between circuit electrodes facing each other and electrically connects the electrodes in the pressing direction by pressing the facing electrodes against each other; superior low temperature rapid curability and a long pot life | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2009-10-20 | — | — | US | disclosed |
| US-20090233243-A1 | STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF | KOBAYASHI HIRONORI | 2009-09-17 | — | — | US | disclosed |
| EP-1524289-B1 | POLYMERIZABLE COMPOSITION, OPTICAL MATERIAL COMPRISING THE COMPOSITION AND METHOD FOR PRODUCING THE MATERIAL | MITSUBISHI GAS CHEMICAL CO (JP) | 2009-09-16 | — | — | EP | disclosed |
| US-20090214872-A1 | OPTICAL FILM, POLARIZING PLATE, IMAGE DISPLAY DEVICE AND METHOD FOR MANUFACTURING OPTICAL FILM | FUJIFILM CORPORATION (JP) | 2009-08-27 | — | — | US | disclosed |
| US-20090213462-A1 | OPTICAL FILM, POLARIZATION PLATE AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2009-08-27 | — | — | US | disclosed |
| EP-2091883-A1 | D1364 BT SECONDARY COATING ON OPTICAL FIBER | DSMIP Assets B.V. (NL) | 2009-08-26 | — | — | EP | disclosed |
| US-7575845-B2 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2009-08-18 | — | — | US | disclosed |
| US-20090202819-A1 | OPTICAL FILM, METHOD FOR PRODUCING THE SAME, POLARIZING PLATE AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2009-08-13 | — | — | US | disclosed |
| US-7566156-B2 | Method of manufacturing backlight unit, backlight unit, electrooptical device and electronic equipment | SEIKO EPSON CORPORATION (JP) | 2009-07-28 | — | — | US | disclosed |
| US-20090186281-A1 | METHOD FOR PRODUCING SILICON-CONTAINING COMPLEX OXIDE SOL, METHOD FOR PRODUCING SILICON-CONTAINING HOLOGRAM RECORDING MATERIAL, AND HOLOGRAM RECORDING MEDIUM | TDK CORPORATION (JP) | 2009-07-23 | — | — | US | disclosed |
| US-20090181324-A1 | PHOTOSENSITIVE POLYIMIDES | ETERNAL CHEMICAL CO., LTD. | 2009-07-16 | — | — | US | disclosed |
| US-7553890-B2 | interposed between circuit electrodes facing each other and electrically connects the electrodes in the pressing direction by pressing the facing electrodes against each other; the circuit-connecting material comprising as essential components, a curing agent and a hydroxy resin with radical polymer | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2009-06-30 | — | — | US | disclosed |
| US-7553544-B2 | Precursor composition for optical resin, resin for optical use, optical element, and optical article | NIKON CORPORATION (JP) | 2009-06-30 | — | — | US | disclosed |
| US-20090162782-A1 | Silicon-Containing Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-06-25 | — | — | US | disclosed |
| EP-2072560-A2 | Manufacturing method and apparatus of optical material | SEIKO EPSON CORPORATION (JP) | 2009-06-24 | — | — | EP | disclosed |
| US-20090156781-A1 | Manufacturing Method and Apparatus of Optical Material | SEIKO EPSON CORPORATION (JP) | 2009-06-18 | — | — | US | disclosed |
| US-20090140468-A1 | PROCESS FOR PRODUCING MOLD | ASAHI GLASS COMPANY, LIMITED (JP) | 2009-06-04 | — | — | US | disclosed |
| US-20090143505-A1 | Curable Resin Composition | SONY CHEMICAL & INFORMATION DEVICE CORPORATION (JP) | 2009-06-04 | — | — | US | disclosed |
| US-20090135356-A1 | Anti-reflection film, polarizing plate, and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2009-05-28 | — | — | US | disclosed |
| EP-1359172-B1 | ULTRAVIOLET-CURABLE RESIN COMPOSITION AND PHOTOSOLDER RESIST INK CONTAINING THE COMPOSITION | GOO CHEMICAL CO LTD (JP) | 2009-05-27 | — | — | EP | disclosed |
| US-20090130594-A1 | Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-05-21 | — | — | US | disclosed |
| US-7531234-B2 | High refraction film, high refraction film-forming coating composition, anti-reflection film, protective film for polarizing plate, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2009-05-12 | — | — | US | disclosed |
| WO-2009053391-A2 | SECURITY ELEMENT | BASF SE (CH) | 2009-04-30 | — | — | WO | disclosed |
| US-20090104554-A1 | CHARGE CONTROL AGENT COMPOSITION AND TONER UTILIZING THE SAME | HODOGAYA CHEMICAL CO., LTD. (JP) | 2009-04-23 | — | — | US | disclosed |
| US-7521155-B2 | Volume hologram layer and volume hologram transfer foil | DAI NIPPON PRINTING CO., LTD. (JP) | 2009-04-21 | — | — | US | disclosed |
| US-20090097085-A1 | HOLOGRAM RECORDING MEDIUM | TDK CORPORATION (JP) | 2009-04-16 | — | — | US | disclosed |
| EP-2047968-A1 | PROCESS FOR PRODUCING MOLD | Asahi Glass Company, Limited (JP) | 2009-04-15 | — | — | EP | disclosed |
| US-7517125-B2 | Manufacturing method of backlight unit, and backlight unit, electro-optic device, and electronic apparatus | SEIKO EPSON CORPORATION (JP) | 2009-04-14 | — | — | US | disclosed |
| US-20090091835-A1 | OPTICAL FILM, POLARIZING PLATE, AND IMAGE DISPLAY APPARATUS | FUJIFILM CORPORATION (JP) | 2009-04-09 | — | — | US | disclosed |
| US-20090091810-A1 | HOLOGRAM RECORDING MATERIAL AND HOLOGRAM RECORDING MEDIUM | TDK CORPORATION (JP) | 2009-04-09 | — | — | US | disclosed |
| US-20090092904-A1 | HOLOGRAM RECORDING MEDIUM | TDK CORPORATION (JP) | 2009-04-09 | — | — | US | disclosed |
| US-7513944-B2 | Black ink composition, ink set, recording method and recorded matter | SEIKO EPSON CORPORATION (JP) | 2009-04-07 | — | — | US | disclosed |
| EP-2042903-A2 | Optical film, polarizing plate and image display device | FUJIFILM Corporation (JP) | 2009-04-01 | — | — | EP | disclosed |
| EP-2042892-A2 | Optical film, polarizing plate, and image display apparatus | FUJIFILM Corporation (JP) | 2009-04-01 | — | — | EP | disclosed |
| EP-1324135-B1 | ULTRAVIOLET-CURABLE RESIN COMPOSITION AND PHOTOSOLDER RESIST INK CONTAINING THE COMPOSITION | GOO CHEMICAL CO LTD (JP) | 2009-04-01 | — | — | EP | disclosed |
| US-20090081447-A1 | OPTICAL FILM, POLARIZING PLATE AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2009-03-26 | — | — | US | disclosed |
| US-7505104-B2 | Antiglare antireflective film, polarizing plate and liquid crystal display | FUJIFILM CORPORATION (JP) | 2009-03-17 | — | — | US | disclosed |
| US-20090068569-A1 | Resin composition for hologram recording material, hologram recording material, and method for producing hologram recording medium | NIPPON PAINT CO., LTD. | 2009-03-12 | — | — | US | disclosed |
| EP-2030998-A1 | Method of preparing a transparent moulded article with a thermoplastic polymer and thermosetting polymer alloy base | Essilor International (Compagnie Générale D'Optique) (FR) | 2009-03-04 | — | — | EP | disclosed |
| US-20090054547-A1 | METHOD FOR THE PREPARATION OF A TRANSPARENT MOULDING BASED ON A BLEND OF THERMOPLASTIC POLYMER AND THERMOSETTING POLYMER | ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) | 2009-02-26 | — | — | US | disclosed |
| US-20090018308-A1 | Curable Composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2009-01-15 | — | — | US | disclosed |
| EP-2014700-A1 | POLYMERIZABLE COMPOSITION, RESIN USING THE SAME AND OPTICAL COMPONENT | Mitsui Chemicals, Inc. (JP) | 2009-01-14 | — | — | EP | disclosed |
| EP-2009505-A1 | CHARGE CONTROL AGENT COMPOSITION AND TONER UTILIZING THE SAME | Hodogaya Chemical Co., Ltd. (JP) | 2008-12-31 | — | — | EP | disclosed |
| EP-2009516-A2 | Volume hologram transfer foil, volume hologram laminate, and production method thereof | Dainippon Printing Co., Ltd. (JP) | 2008-12-31 | — | — | EP | disclosed |
| US-20080316556-A1 | VOLUME HOLOGRAM TRANSFER FOIL, VOLUME HOLOGRAM LAMINATE, AND PRODUCTION METHOD THEREOF | DAI NIPPON PRINTING CO., LTD. (JP) | 2008-12-25 | — | — | US | disclosed |
| US-20080299464-A1 | LENGTHY VOLUME HOLOGRAM LAYER TRANSFER FOIL, METHOD OF PRODUCING VOLUME HOLOGRAM LAMINATE USING THE SAME AND VOLUME HOLOGRAM LAMINATE | DAI NIPPON PRINTING CO., LTD. (JP) | 2008-12-04 | — | — | US | disclosed |
| EP-1995648-A2 | Lengthy volume hologram layer transfer foil, method of producing volume hologram laminate using the same and volume hologram laminate | Dainippon Printing Co., Ltd. (JP) | 2008-11-26 | — | — | EP | disclosed |
| US-20080275153-A1 | UV curable resin, its preparation and composition containing the same | CHANG CHUN PLASTICS CO., LTD. (TW) | 2008-11-06 | — | — | US | disclosed |
| EP-1988110-A1 | INTERNAL MOLD RELEASE AGENT FOR PRODUCTION OF POLYTHIOURETHANE OPTICAL MATERIAL | Mitsui Chemicals, Inc. (JP) | 2008-11-05 | — | — | EP | disclosed |
| EP-1988109-A1 | POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL | Mitsui Chemicals, Inc. (JP) | 2008-11-05 | — | — | EP | disclosed |
| US-7446163-B2 | Polymerization regulator and composition for resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-11-04 | — | — | US | disclosed |
| US-20080268349-A1 | HOLOGRAM RECORDING MATERIAL, PROCESS FOR PRODUCING THE SAME AND HOLOGRAM RECORDING MEDIUM | TDK CORPORATION (JP) | 2008-10-30 | — | — | US | disclosed |
| US-7442428-B2 | Gas barrier substrate | DAI NIPPON PRINTING CO., LTD. (JP) | 2008-10-28 | — | — | US | disclosed |
| US-20080254375-A1 | HOLOGRAM RECORDING MATERIAL AND HOLOGRAM RECORDING MEDIUM | TDK CORPORATION (JP) | 2008-10-16 | — | — | US | disclosed |
| US-20080254394-A1 | STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF | KOBAYASHI HIRONORI | 2008-10-16 | — | — | US | disclosed |
| US-20080247045-A1 | ANTIGLARE FILM, POLARIZING PLATE AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| US-20080241524-A1 | Protective Film, Polarizing Plate, and Liquid Crystal Display Device | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080239486-A1 | ANTIREFLECTION LAMINATE, POLARIZING PLATE AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080241535-A1 | D1364 BT SECONDARY COATINGS ON OPTICAL FIBER | DSM IP ASSETS B.V. (NL) | 2008-10-02 | — | — | US | disclosed |
| US-20080239488-A1 | ANTIREFLECTION FILM, POLARIZING PLATE AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| EP-1972967-A1 | Antireflection film, polarizing plate and image display device | FUJIFILM Corporation (JP) | 2008-09-24 | — | — | EP | disclosed |
| EP-1972998-A1 | SILICON-CONTAINING RESIST UNDERLYING LAYER FILM FORMING COMPOSITION FOR FORMATION OF PHOTOCROSSLINKING CURED RESIST UNDERLYING LAYER FILM | Nissan Chemical Industries, Ltd. (JP) | 2008-09-24 | — | — | EP | disclosed |
| US-7419707-B2 | Coating composition for the formation of low refractive index layer, antireflection film, polarizing plate and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2008-09-02 | — | — | US | disclosed |
| US-20080205836-A1 | HEAT-RESISTING PLASTIC OPTICAL FIBER AND MANUFACTURING METHOD THEREOF | HITACHI CABLE LTD. (JP) | 2008-08-28 | — | — | US | disclosed |
| US-20080193857-A1 | HOLOGRAM RECORDING MATERIAL, PROCESS FOR PRODUCING THE SAME AND HOLOGRAM RECORDING MEDIUM | TDK CORPORATION (JP) | 2008-08-14 | — | — | US | disclosed |
| US-7402369-B2 | Mono azo iron complex compound, and charge controlling agent and toner using the same | HODOGAYA CHEMICAL CO., LTD. (JP) | 2008-07-22 | — | — | US | disclosed |
| US-20080160421-A1 | HOLOGRAM RECORDING MEDIUM | TDK CORPORATION (JP) | 2008-07-03 | — | — | US | disclosed |
| WO-2008076285-A1 | D1364 BT SECONDARY COATING ON OPTICAL FIBER | DSM IP ASSETS B.V. (NL) | 2008-06-26 | — | — | WO | disclosed |
| US-20080145307-A1 | PROCESS FOR PRODUCING TITANIUM-CONTAINING METAL OXIDE, HOLOGRAM RECORDING MATERIAL, PROCESS FOR PRODUCING THE SAME, AND HOLOGRAM RECORDING MEDIUM | TDK CORPORATION (JP) | 2008-06-19 | — | — | US | disclosed |
| EP-1923433-A2 | Encapsulating resin composition and light-emitting device | Sony Chemical & Information Device Corporation (JP) | 2008-05-21 | — | — | EP | disclosed |
| US-7375893-B2 | Method of manufacturing microlens, microlens, optical film, screen for projection, projector system, electrooptical device and electronic equipment | SEIKO EPSON CORPORATION (JP) | 2008-05-20 | — | — | US | disclosed |
| US-20080114100-A1 | Encapsulating resin composition and light-emitting device | SONY CHEMICAL & INFORMATION DEVICE CORPORATION (JP) | 2008-05-15 | — | — | US | disclosed |
| EP-0921417-B1 | Epoxy/episulfide resin compositions for optical materials | MITSUBISHI GAS CHEMICAL CO (JP) | 2008-05-14 | — | — | EP | disclosed |
| US-20080100780-A1 | POLARIZING PLATE PROTECTIVE FILM, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2008-05-01 | — | — | US | disclosed |
| US-20080103280-A1 | Ink-jet ink and cured film obtained from same | CHISSO CORPORATION | 2008-05-01 | — | — | US | disclosed |
| US-20080085478-A1 | STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF | KOBAYASHI HIRONORI | 2008-04-10 | — | — | US | disclosed |
| US-7354643-B2 | Three-dimensional object and method of producing the same | CMET INC. (JP) | 2008-04-08 | — | — | US | disclosed |
| US-7354989-B2 | Thioepoxy based polymerizable composition and method for production thereof | MITSUI CHEMICALS, INC. (JP) | 2008-04-08 | — | — | US | disclosed |
| US-20080081283-A1 | STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF | KOBAYASHI HIRONORI | 2008-04-03 | — | — | US | disclosed |
| EP-1089093-B1 | Anti-reflection film, polarizing plate comprising the same, and image display device using the anti-reflection film or the polarizing plate | FUJIFILM CORP (JP) | 2008-04-02 | — | — | EP | disclosed |
| US-20080076033-A1 | HOLOGRAM RECORDING MATERIAL AND HOLOGRAM RECORDING MEDIUM | TDK CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20080069975-A1 | Optical film | FUJIFILM CORPORATION (JP) | 2008-03-20 | — | — | US | disclosed |
| US-20080070156-A1 | STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF | KOBAYASHI HIRONORI | 2008-03-20 | — | — | US | disclosed |
| US-20080064233-A1 | CIRCUIT-CONNECTING MATERIAL AND CIRCUIT TERMINAL CONNECTED STRUCTURE AND CONNECTING METHOD | HITACHI CHEMICAL CO., LTD. (JP) | 2008-03-13 | — | — | US | disclosed |
| US-20080057404-A1 | HOLOGRAM RECORDING MATERIAL, PROCESS FOR PRODUCING THE SAME AND HOLOGRAM RECORDING MEDIUM | TDK CORPORATION (JP) | 2008-03-06 | — | — | US | disclosed |
| US-20080057742-A1 | CIRCUIT-CONNECTING MATERIAL AND CIRCUIT TERMINAL CONNECTED STRUCTURE AND CONNECTING METHOD | HITACHI CHEMICAL CO., LTD. (JP) | 2008-03-06 | — | — | US | disclosed |
| US-20080054225-A1 | interposed between circuit electrodes facing each other and electrically connects the electrodes in the pressing direction by pressing the facing electrodes against each other; the circuit-connecting material comprising as essential components, a curing agent and a hydroxy resin with radical polymer | HITACHI CHEMICAL CO., LTD. (JP) | 2008-03-06 | — | — | US | disclosed |
| US-20080057446-A1 | Polyimide resin soluble in aqueous alkaline solution, composition comprising the resin and cured coating prepared from the composition | SHIN-ETSU CHEMICAL CO., LTD. | 2008-03-06 | — | — | US | disclosed |
| US-20080057406-A1 | HOLOGRAM RECORDING MEDIUM | TDK CORPORATION (JP) | 2008-03-06 | — | — | US | disclosed |
| US-20080057405-A1 | HOLOGRAM RECORDING MEDIUM | TDK CORPORATION (JP) | 2008-03-06 | — | — | US | disclosed |
| US-20080050305-A1 | Method for Producing Graphite Film, and Graphite Film Produced By the Method | KANEKA CORPORATION (JP) | 2008-02-28 | — | — | US | disclosed |
| US-20080043337-A1 | STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF | KOBAYASHI HIRONORI | 2008-02-21 | — | — | US | disclosed |
| EP-1890324-A2 | Circuit-connecting material and circuit terminal connected structure and connecting method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2008-02-20 | — | — | EP | disclosed |
| EP-1325058-B1 | EPISULFIDE BASED POLYMERIZABLE COMPOSITION CATALYZED BY AN (ALKOXYPHENYL)PHOSPHINE | ESSILOR INT (FR) | 2008-02-13 | — | — | EP | disclosed |
| US-20080023858-A1 | STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF | KOBAYASHI HIRONORI | 2008-01-31 | — | — | US | disclosed |
| US-20080022887-A1 | Aqueous Ink Composition and Urethane Resin Composition for Aqueous Ink Composition | SEIKO EPSON CORPORATION (JP) | 2008-01-31 | — | — | US | disclosed |
| WO-2008012225-A1 | BINARY FLUORESCENT PIGMENT COMPOSITION AND ITS USE FOR FORGERY AND COUNTERFEIT PREVENTION | CIBA HOLDING INC. (CH) | 2008-01-31 | — | — | WO | disclosed |
| US-20080026304-A1 | STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF | KOBAYASHI HIRONORI | 2008-01-31 | — | — | US | disclosed |
| EP-1882713-A1 | CURABLE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-01-30 | — | — | EP | disclosed |
| US-20080014373-A1 | Optical Film, Producing Method Therefor, Polarizing Plate and Image Display Apparatus | FUJIFILM CORPORATION (JP) | 2008-01-17 | — | — | US | disclosed |
| EP-1879070-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION FOR FORMING PHOTOCROSSLINKING CURED RESIST UNDERLAYER FILM | Nissan Chemical Industries, Ltd. (JP) | 2008-01-16 | — | — | EP | disclosed |
| US-20070291363-A1 | Optical Film | FUJIFILM CORPORATION (JP) | 2007-12-20 | — | — | US | disclosed |
| EP-1860161-A1 | Ink set for ink jet-jet recording, method for ink-jet recording and recorded matter | Seiko Epson Corporation (JP) | 2007-11-28 | — | — | EP | disclosed |
| US-7301705-B2 | Alicyclic compound for optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-11-27 | — | — | US | disclosed |
| US-20070261601-A1 | Hardening Composition, Antireflective Film, Method of Producing the Same, Polarizing Plate and Image Display Unit | FUJIFILM CORPORATION (JP) | 2007-11-15 | — | — | US | disclosed |
| EP-1849840-A1 | AQUEOUS INK COMPOSITION AND URETHANE RESIN COMPOSITION FOR AQUEOUS INK COMPOSITION | SEIKO EPSON CORPORATION (JP) | 2007-10-31 | — | — | EP | disclosed |
| US-20070243474-A1 | Hologram Recording Material and Hologram Recording Medium | TDK CORPORATION (JP) | 2007-10-18 | — | — | US | disclosed |
| US-20070243370-A1 | Optical film, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2007-10-18 | — | — | US | disclosed |
| US-20070243473-A1 | Hologram Recording Material and Hologram Recording Medium | TDK CORPORATION (JP) | 2007-10-18 | — | — | US | disclosed |
| US-20070231478-A1 | Production method of optical film, optical film and image display | FUJIFILM CORPORATION (JP) | 2007-10-04 | — | — | US | disclosed |
| US-20070207298-A1 | Optical film, anti-reflection film, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2007-09-06 | — | — | US | disclosed |
| US-20070195431-A1 | Optical film, antireflection film, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2007-08-23 | — | — | US | disclosed |
| US-20070190317-A1 | Anisotropic scattering adhesive member | TOMOEGAWA CO., LTD. (JP) | 2007-08-16 | — | — | US | disclosed |
| US-20070184212-A1 | Polarizer-protective film, and polarizer and liquid-crystal display device comprising the film | FUJIFILM CORPORATION (JP) | 2007-08-09 | — | — | US | disclosed |
| US-20070177271-A1 | Antireflection film, polarizing plate and image display | FUJIFILM CORPORATION (JP) | 2007-08-02 | — | — | US | disclosed |
| EP-1321495-B1 | INK SET FOR INK JET-JET RECORDING, METHOD FOR INK-JET RECORDING AND RECORDED MATTER | SEIKO EPSON CORP (JP) | 2007-07-11 | — | — | EP | disclosed |
| US-20070146887-A1 | Antireflection film, polarizing plate, method for producing them, liquid cryatal display element, liquid crystal display device, and image display device | FUJI PHOTO FILM CO., LTD. (JP) | 2007-06-28 | — | — | US | disclosed |
| US-20070149639-A1 | Polymerizable composition, optical material comprising the composition and method for producing the material | HORIKOSHI HIROSHI | 2007-06-28 | — | — | US | disclosed |
| US-7229703-B2 | Gas barrier substrate | DAI NIPPON PRINTING CO. LTD. (JP) | 2007-06-12 | — | — | US | disclosed |
| US-20070121211-A1 | Antiglare antireflective film, polarizing plate and liquid crystal display | FUJI PHOTO FILM CO., LTD. (JP) | 2007-05-31 | — | — | US | disclosed |
| US-20070111107-A1 | HOLOGRAM RECORDING MATERIAL, AND HOLOGRAM RECORDING MEDIUM | TDK CORPORATION (JP) | 2007-05-17 | — | — | US | disclosed |
| US-20070111108-A1 | HOLOGRAM RECORDING MATERIAL AND HOLOGRAM RECORDING MEDIUM | TDK CORPORATION (JP) | 2007-05-17 | — | — | US | disclosed |
| US-20070104896-A1 | Optical film, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2007-05-10 | — | — | US | disclosed |
| US-20070092835-A1 | PHOTOSENSITIVE FILM | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2007-04-26 | — | — | US | disclosed |
| EP-1234681-B1 | Reversible thermosensitive recording medium and image processing method using the same | RICOH KK (JP) | 2007-04-18 | — | — | EP | disclosed |
| US-20070065660-A1 | Antireflection film, polarizing plate, and image display device | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-22 | — | — | US | disclosed |
| US-20070059491-A1 | Gas barrier substrate | DAI NIPPON PRINTING CO., LTD. (JP) | 2007-03-15 | — | — | US | disclosed |
| US-20070060682-A1 | Actinic radiation-curable stereolithographic resin composition having improved stability | CMET INC. (JP) | 2007-03-15 | — | — | US | disclosed |
| US-20070048509-A1 | Antireflection film, polarizing plate, and image display device | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-01 | — | — | US | disclosed |
| US-20070042173-A1 | Antireflection film, manufacturing method thereof, and polarizing plate using the same, and image display device | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-22 | — | — | US | disclosed |
| US-7169845-B2 | Polymerization regulators and compositions for resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-01-30 | — | — | US | disclosed |
| US-20070020547-A1 | Mono azo iron complex compound, and charge controlling agent and toner using the same | HODOGAYA CHEMICAL CO., LTD. | 2007-01-25 | — | — | US | disclosed |
| US-20060290839-A1 | MANUFACTURING METHOD OF BACKLIGHT UNIT, AND BACKLIGHT UNIT, ELECTRO-OPTIC DEVICE, AND ELECTRONIC APPARATUS | SEIKO EPSON CORPORATION (JP) | 2006-12-28 | — | — | US | disclosed |
| US-20060291239-A1 | METHOD OF MANUFACTURING BACKLIGHT UNIT, BACKLIGHT UNIT, ELECTROOPTICAL DEVICE AND ELECTRONIC EQUIPMENT | SEIKO EPSON CORPORATION (JP) | 2006-12-28 | — | — | US | disclosed |
| EP-1734082-A1 | MONOAZO/IRON COMPLEX COMPOUND, CHARGE CONTROL AGENT COMPRISING THE SAME, AND TONER | Hodogaya Chemical Co., Ltd. (JP) | 2006-12-20 | — | — | EP | disclosed |
| EP-1211276-B1 | Optical product, asymmetric disulfide compound used therefor and method for producing the asymmetric disulfide compound | HOYA CORP (JP) | 2006-12-20 | — | — | EP | disclosed |
| US-20060279945-A1 | BACKLIGHT UNIT MANUFACTURING METHOD, BACKLIGHT UNIT, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC DEVICE | SEIKO EPSON CORPORATION (JP) | 2006-12-14 | — | — | US | disclosed |
| US-20060269506-A1 | Personal care applications of emulsions containing elastomeric silanes and siloxanes with nitrogen atoms | DOW CORNING CORPORATION (US) | 2006-11-30 | — | — | US | disclosed |
| US-20060262410-A1 | METHOD OF MANUFACTURING MICROLENS, MICROLENS, OPTICAL FILM, SCREEN FOR PROJECTION, PROJECTOR SYSTEM, ELECTROOPTICAL DEVICE AND ELECTRONIC EQUIPMENT | SEIKO EPSON CORPORATION (JP) | 2006-11-23 | — | — | US | disclosed |
| US-20060262393-A1 | METHOD OF MANUFACTURING A MICROLENS, MICROLENS, OPTICAL FILM, SCREEN FOR PROJECTION, PROJECTOR SYSTEM, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPARATUS | SEIKO EPSON CORPORATION (JP) | 2006-11-23 | — | — | US | disclosed |
| US-7132501-B2 | Polymerizable composition containing novel cyclic sulfur compound and resin obtained by curing the polymerizable composition | MITSUI CHEMICALS, INC. (JP) | 2006-11-07 | — | — | US | disclosed |
| EP-1717851-A1 | Circuit-connecting material and circuit terminal connected structure and connecting method | Hitachi Chemical Co., Ltd. (JP) | 2006-11-02 | — | — | EP | disclosed |
| US-20060204671-A1 | Method and apparatus for curing coated film and optical film | FUJI PHOTO FILM CO., LTD. | 2006-09-14 | — | — | US | disclosed |
| US-20060199920-A1 | Photosensitive resin composition capable of being developed with aqueous developer and photosensitive dry film resist, and use thereof | KANEKA CORPORATION (JP) | 2006-09-07 | — | — | US | disclosed |
| US-20060198021-A1 | Antireflection film, and polarizing plate and image display device using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2006-09-07 | — | — | US | disclosed |
| EP-1697131-A1 | ANTIREFLECTION FILM, POLARIZING PLATE, METHOD FOR PRODUCING THEM, LIQUID CRYSTAL DISPLAY ELEMENT, LIQUID CRYSTAL DISPLAY DEVICE, AND IMAGE DISPLAY DEVICE | FUJI PHOTO FILM CO., LTD. (JP) | 2006-09-06 | — | — | EP | disclosed |
| US-7101644-B2 | Multilayer; substrate overcoated with foil, then protective coating | DAI NIPPON PRINTING CO., LTD. (JP) | 2006-09-05 | — | — | US | disclosed |
| US-20060188664-A1 | Coating composition for the formation of low refractive index layer, antireflection film, polarizing plate and liquid crystal display device | FUJI PHOTO FILM CO., LTD. (JP) | 2006-08-24 | — | — | US | disclosed |
| US-7094512-B2 | Electrophotographic printing method, monoazo iron complex compound, charge controlling agent using the same and toner using the charge controlling agent | HODOGAYA CHEMICAL CO., LTD. (JP) | 2006-08-22 | — | — | US | disclosed |
| US-7090484-B2 | Stereolithographic apparatus and method for manufacturing three-dimensional object with photohardenable resin | TEIJIN SEIKI CO., LTD. (JP) | 2006-08-15 | — | — | US | disclosed |
| US-7087297-B2 | Peelable sheet | KIMOTO CO., LTD. (JP) | 2006-08-08 | — | — | US | disclosed |
| US-20060172203-A1 | Hologram recording material, process for producing the same and hologram recording medium | TDK CORPORATION (JP) | 2006-08-03 | — | — | US | disclosed |
| US-20060141276-A1 | Three-dimensional structure and method for production thereof | CMET INC. (JP) | 2006-06-29 | — | — | US | disclosed |
| US-20060142542-A1 | Phosphazene compound, photosensitive resin composition and use thereof | KANEKA CORPORATION (JP) | 2006-06-29 | — | — | US | disclosed |
| EP-1433801-B1 | Isocyanate crosslinked episulfide resin composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2006-04-19 | — | — | EP | disclosed |
| US-7026372-B2 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-04-11 | — | — | US | disclosed |
| US-7022462-B1 | Photosensitive resin composition, photosensitive element using the same, process for producing resist pattern, and process for producing printed wiring board | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2006-04-04 | — | — | US | disclosed |
| WO-2006033456-A1 | HARDENING COMPOSITION, ANTIREFLECTIVE FILM, METHOD OF PRODUCING THE SAME, POLARIZING PLATE AND IMAGE DISPLAY UNIT | FUJIFILM CORPORATION (JP) | 2006-03-30 | — | — | WO | disclosed |
| EP-1016547-B1 | Method and material for erasable recording by heat | RICOH KK (JP) | 2006-03-29 | — | — | EP | disclosed |
| WO-2006030721-A1 | ANTI-REFLECTION FILM, POLARIZING PLATE, AND LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2006-03-23 | — | — | WO | disclosed |
| US-20060060969-A1 | Electronic circuit including circuit-connecting material | HITACHI CHEMICAL CO., LTD. (JP) | 2006-03-23 | — | — | US | disclosed |
| US-20060051703-A1 | Photosensitive film | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2006-03-09 | — | — | US | disclosed |
| US-7009031-B2 | Composition for optical material | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2006-03-07 | — | — | US | disclosed |
| EP-1624851-A1 | PERSONAL CARE APPLICATIONS OF EMULSIONS CONTAINING ELASTOMERIC SILANES AND SILOXANES WITH NITROGEN ATOMS | Dow Corning Corporation (US) | 2006-02-15 | — | — | EP | disclosed |
| US-6995276-B1 | Cyclic disulfide compound, process of producing the same and optical product comprising the same | HOYA CORPORATION (JP) | 2006-02-07 | — | — | US | disclosed |
| US-6994937-B2 | Hologram transfer foil | DAI NIPPON PRINTING CO., LTD. (JP) | 2006-02-07 | — | — | US | disclosed |
| US-20060014860-A1 | interposed between circuit electrodes facing each other and electrically connects the electrodes in the pressing direction by pressing the facing electrodes against each other; the circuit-connecting material comprising as essential components, a curing agent and a hydroxy resin with radical polymer | HITACHI CHEMICAL CO., LTD. (JP) | 2006-01-19 | — | — | US | disclosed |
| EP-1609782-A1 | MONOAZO IRON COMPLEX COMPOUND, CHARGE CONTROL AGENT CONTAINING THE SAME, AND TONER | Hodogaya Chemical Co., Ltd. (JP) | 2005-12-28 | — | — | EP | disclosed |
| EP-1270645-B1 | Resin for optical material | MITSUBISHI GAS CHEMICAL CO (JP) | 2005-12-14 | — | — | EP | disclosed |
| US-20050261467-A1 | Polymerization regulator and composition for resin | TAMURA MASAKI | 2005-11-24 | — | — | US | disclosed |
| US-6964813-B2 | Ultraviolet curable resin composition and photo solder resist including the same | GOO CHEMICAL CO., LTD. (JP) | 2005-11-15 | — | — | US | disclosed |
| US-6953645-B2 | Preparation of nanocapsule compositions and their toner composition for thermosensitive rewritable recording media | KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) | 2005-10-11 | — | — | US | disclosed |
| US-20050215757-A1 | Polymerizable composition containing novel cyclic sulfur compound and resin obtained by curing the polymerizable composition | MITSUI CHEMICALS, INC. (JP) | 2005-09-29 | — | — | US | disclosed |
| US-20050207016-A1 | Antireflection film, polarizing plate and liquid crystal display | FUJI PHOTO FILM CO., LTD. (JP) | 2005-09-22 | — | — | US | disclosed |
| US-20050208230-A1 | Antireflection film, production process of the same, polarizing plate and image displaying apparatus | FUJI PHOTO FILM, CO., LTD. (JP) | 2005-09-22 | — | — | US | disclosed |
| US-20050185232-A1 | Volume hologram recording photosensitive composition and its use | NIPPON PAINT CO., LTD. (JP) | 2005-08-25 | — | — | US | disclosed |
| US-20050175796-A1 | High refraction film, high refraction film-forming coating composition, anti-reflection film, protective film for polarizing plate, polarizing plate and image display device | FUJI PHOTO FILM CO., LTD. (JP) | 2005-08-11 | — | — | US | disclosed |
| US-20050154073-A1 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | ISHII KENJI (JP) | 2005-07-14 | — | — | US | disclosed |
| WO-2005063484-A1 | ANTIREFLECTION FILM, POLARIZING PLATE, METHOD FOR PRODUCING THEM, LIQUID CRYSTAL DISPLAY ELEMENT, LIQUID CRYSTAL DISPLAY DEVICE, AND IMAGE DISPLAY DEVICE | FUJI PHOTO FILM CO., LTD. (JP) | 2005-07-14 | — | — | WO | disclosed |
| US-6917400-B2 | Anti-reflection film, polarizing plate comprising the same, and image display device using the anti-reflection film or the polarizing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2005-07-12 | — | — | US | disclosed |
| EP-1542273-A1 | Circuit-connecting material and circuit terminal connected structure and connecting method | Hitachi Chemical Co., Ltd. (JP) | 2005-06-15 | — | — | EP | disclosed |
| US-20050124783-A1 | Thioepoxy based polymerizable composition and method for production thereof | MITSUI CHEMICALS, INC. (JP) | 2005-06-09 | — | — | US | disclosed |
| EP-1153935-B1 | PHOTOPOLYMERIZABLE RESIN COMPOSITION AND USE THEREOF | NIPPON STEEL CHEMICAL CO (JP) | 2005-05-25 | — | — | EP | disclosed |
| US-6896967-B2 | Ultraviolet-curable resin composition and photosolder resist ink containing the composition | GOO CHEMICAL CO., LTD. (JP) | 2005-05-24 | — | — | US | disclosed |
| EP-0942027-B1 | A polymerizable composition | MITSUI CHEMICALS INC (JP) | 2005-05-18 | — | — | EP | disclosed |
| EP-1424374-B1 | Black ink composition, ink set, recording method and recorded matter | SEIKO EPSON CORP (JP) | 2005-04-20 | — | — | EP | disclosed |
| EP-1524289-A1 | POLYMERIZABLE COMPOSITION, OPTICAL MATERIAL COMPRISING THE COMPOSITION AND METHOD FOR PRODUCING THE MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2005-04-20 | — | — | EP | disclosed |
| US-6872333-B2 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | MITSUBISHI GAS CHEMICAL COMPANY, LTD. (JP) | 2005-03-29 | — | — | US | disclosed |
| WO-2005016983-A1 | COATING SYSTEM CONTAINING (METH)ACRYLATE | SIKA TECHNOLOGY AG (CH) | 2005-02-24 | — | — | WO | disclosed |
| US-20050029513-A1 | Gas barrier substrate | DAI NIPPON PRINTING CO. LTD. (JP) | 2005-02-10 | — | — | US | disclosed |
| US-6852397-B2 | Counterfeit-proof volume hologram multilayer structure, and counterfeit-proof volume hologram seal | DAI NIPPON PRINTING CO., LTD. (JP) | 2005-02-08 | — | — | US | disclosed |
| EP-1316555-B1 | Episulfide compound, method for producing the same and optical product comprising the same | HOYA CORP (JP) | 2005-02-02 | — | — | EP | disclosed |
| US-20050014088-A1 | Precursor composition for optical resin, resin for optical use, optical element, and optical article | NIKON CORPORATION (JP) | 2005-01-20 | — | — | US | disclosed |
| EP-1494609-A1 | ORTHODONTIC BRACKET WITH TWO-PART ADHESIVE | 3M Innovative Properties Company (US) | 2005-01-12 | — | — | EP | disclosed |
| EP-1099721-B1 | Composition for producing resin | MITSUBISHI GAS CHEMICAL CO (JP) | 2005-01-12 | — | — | EP | disclosed |
| US-20040253521-A1 | Volume hologram layer and volume hologram transfer foil | DAI NIPPON PRINTING CO., LTD. (JP) | 2004-12-16 | — | — | US | disclosed |
| US-20040254258-A1 | Polymerizable composition, optical material comprising the composition and method for producing the material | MITSUBISHI GAS CHEMICAL CO., LTD. (JP) | 2004-12-16 | — | — | US | disclosed |
| EP-1484352-A1 | THIOEPOXY BASED POLYMERIZABLE COMPOSITION AND METHOD FOR PRODUCTION THEREOF | MITSUI CHEMICALS, INC. (JP) | 2004-12-08 | — | — | EP | disclosed |
| WO-2004103326-A1 | PERSONAL CARE APPLICATIONS OF EMULSIONS CONTAINING ELASTOMERIC SILANES AND SILOXANES WITH NITROGEN ATOMS | DOW CORNING CORPORATION (US) | 2004-12-02 | — | — | WO | disclosed |
| EP-1482002-A1 | POLYMERIZABLE COMPOSITION CONTAINING NOVEL CYCLIC SULFUR COMPOUND AND RESIN OBTAINED BY CURING THE POLYMERIZABLE COMPOSITION | MITSUI CHEMICALS, INC. (JP) | 2004-12-01 | — | — | EP | disclosed |
| US-20040235992-A1 | Photosensitive resin composition and photosensitive dry film resist and photosensitive coverlay film produced therefrom | KANEKA CORPORATION (JP) | 2004-11-25 | — | — | US | disclosed |
| US-20040222408-A1 | SUPERIOR LOW-TEMPERATURE RAPID CURABILITY AND ALSO HAVING A LONG POT LIFE | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2004-11-11 | — | — | US | disclosed |
| US-20040191660-A1 | Electrophotographic printing method, monoazo iron complex compound, charge controlling agent using the same and toner using the charge controlling agent | HODOGAYA CHEMICAL CO., LTD. (JP) | 2004-09-30 | — | — | US | disclosed |
| EP-1058133-B1 | Polymerizable composition and process for producing optical resin comprising the same | MITSUI CHEMICALS INC (JP) | 2004-09-22 | — | — | EP | disclosed |
| US-6791649-B1 | Anti-reflection film, polarizing plate comprising the same, and image display device using the anti-reflection film or the polarizing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2004-09-14 | — | — | US | disclosed |
| EP-1455200-A1 | PRECURSOR COMPOSITION FOR OPTICAL RESIN, RESIN FOR OPTICAL USE, OPTICAL ELEMENT, AND OPTICAL ARTICLE | Nikon Corporation (JP) | 2004-09-08 | — | — | EP | disclosed |
| US-6777464-B1 | ELECTRONIC CIRCUIT-CONNECTING MATERIAL HAVING A SUPERIOR LOW-TEMPERATURE RAPID CURABILITY AND ALSO HAVING A LONG POT LIFE | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2004-08-17 | — | — | US | disclosed |
| US-20040158031-A1 | Alicyclic compound for optical material | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2004-08-12 | — | — | US | disclosed |
| EP-0742244-B1 | Durable polysulfide composition for optical material | MITSUI CHEMICALS INC (JP) | 2004-08-11 | — | — | EP | disclosed |
| US-6759104-B2 | LIQUID CRYSTALS DISPLAY; MIXTURE CONTAINING ACRYLATED ESTERS; PHOTOPOLYMERIZATION USING FREE RADICAL CATALYSTS | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-07-06 | — | — | US | disclosed |
| US-20040127601-A1 | Black ink composition, ink set, recording method and recorded matter | SEIKO EPSON CORPORATION | 2004-07-01 | — | — | US | disclosed |
| EP-1433801-A1 | Composition for a resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-06-30 | — | — | EP | disclosed |
| EP-1424374-A1 | Black ink composition, ink set, recording method and recorded matter | SEIKO EPSON CORPORATION (JP) | 2004-06-02 | — | — | EP | disclosed |
| US-6743851-B2 | MIXTURE CONTAINING TETRAZOLE | NIPPON ZEON CO., LTD. (JP) | 2004-06-01 | — | — | US | disclosed |
| US-20040094870-A1 | Stereolithographic apparatus and method for manufacturing three-dimensional object with photohardenable resin | TEIJIN SEIKI CO., LTD. | 2004-05-20 | — | — | US | disclosed |
| US-6734138-B2 | SURFACE HAVING A SPECIFIED TEN-POINT MEAN ROUGHNESS (RZ) AND/OR A GIVEN RATIO SM/RZ, WHERE SM IS AVERAGE PEAK-TO-PEAK LENGTH OF THE SURFACE OF THE RECORDING MATERIAL; REVERSIBLY CHANGES ITS COLOR WHEN HEATED AND THEN COOLED | RICOH COMPANY, LTD. (JP) | 2004-05-11 | — | — | US | disclosed |
| US-6734248-B2 | CONTAINING A 1H-TETRAZOLE OR A 5,5'-BIS-1H-TETRAZOLE | NIPPON ZEON CO., LTD. (JP) | 2004-05-11 | — | — | US | disclosed |
| EP-1211090-B1 | Reversible thermosensitive recording material, and image recording and erasing method using the recording material | RICOH KK (JP) | 2004-05-06 | — | — | EP | disclosed |
| EP-0936233-B1 | Composition for a resin | MITSUBISHI GAS CHEMICAL CO (JP) | 2004-04-21 | — | — | EP | disclosed |
| EP-1398317-A1 | ALICYCLIC COMPOUND FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-03-17 | — | — | EP | disclosed |
| US-20040048978-A1 | Photosensitive resin composition, solder resist comprising the same, cover lay film, and printed circuit board | KANEKA CORPORATION (JP) | 2004-03-11 | — | — | US | disclosed |
| US-20040044102-A1 | Ultraviolet-curable resin composition and photosolder resist ink containing the composition | GOO CHEMICAL CO., LTD. (JP) | 2004-03-04 | — | — | US | disclosed |
| US-6696540-B2 | HIGH REFRACTIVE INDEX | HOYA CORPORATION (JP) | 2004-02-24 | — | — | US | disclosed |
| US-20040024165-A1 | Composition for optical material | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2004-02-05 | — | — | US | disclosed |
| EP-1387384-A1 | Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same | Hitachi Chemical Co., Ltd. (JP) | 2004-02-04 | — | — | EP | disclosed |
| US-6677273-B2 | WHEREIN IMAGES CAN BE REVERSIBLY RECORDED AND ERASED | RICOH COMPANY, LTD. (JP) | 2004-01-13 | — | — | US | disclosed |
| US-20040006161-A1 | Ultraviolet curable resin composition and photo solder resist ink including the same | GOO CHEMICAL CO., LTD. (JP) | 2004-01-08 | — | — | US | disclosed |
| EP-1378535-A1 | POLYMERIZATION REGULATORS AND COMPOSITIONS FOR RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-01-07 | — | — | EP | disclosed |
| EP-1376225-A1 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2004-01-02 | — | — | EP | disclosed |
| EP-1376226-A1 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2004-01-02 | — | — | EP | disclosed |
| EP-1376224-A1 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2004-01-02 | — | — | EP | disclosed |
| EP-1376229-A1 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2004-01-02 | — | — | EP | disclosed |
| EP-1376228-A1 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2004-01-02 | — | — | EP | disclosed |
| EP-1376227-A1 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2004-01-02 | — | — | EP | disclosed |
| EP-0980696-B1 | Process for treating a compound having epithio structures for disposal | MITSUBISHI GAS CHEMICAL CO (JP) | 2003-11-26 | — | — | EP | disclosed |
| US-20030215729-A1 | Preparation of nanocapsule compositions and their toner composition for thermosensitive rewritable recording media | KOREA RESEARCH INSTITUDE OF CHEMICAL TECHNOLOGY | 2003-11-20 | — | — | US | disclosed |
| EP-1359172-A1 | ULTRAVIOLET-CURABLE RESIN COMPOSITION AND PHOTOSOLDER RESIST INK CONTAINING THE COMPOSITION | Goo Chemical Co., Ltd. (JP) | 2003-11-05 | — | — | EP | disclosed |
| US-20030202137-A1 | Anti-reflection film, polarizing plate comprising the same, and image display device using the anti-reflection film or the polarizing plate | FUJI PHOTO FILM CO., LTD. | 2003-10-30 | — | — | US | disclosed |
| WO-2003088861-A1 | ORTHODONTIC BRACKET WITH TWO-PART ADHESIVE | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2003-10-30 | — | — | WO | disclosed |
| EP-1037111-B1 | Ultraviolet curable resin composition and photo solder resist ink using the same | GOO CHEMICAL CO LTD (JP) | 2003-10-22 | — | — | EP | disclosed |
| US-20030195270-A1 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | ISHII KENJI (JP) | 2003-10-16 | — | — | US | disclosed |
| US-6627376-B1 | Stereolithographic apparatus and method for manufacturing three-dimensional object with photohardenable resin | TEIJIN SEIKI CO., LTD. (JP) | 2003-09-30 | — | — | US | disclosed |
| US-6613715-B2 | Comprising a support, a reversible thermosensitive recording layer of which color tone is reversibly changeable with the application of heat thereto to change the temperature and a printing layer which bears a printed image | RICOH COMPANY, LTD. (JP) | 2003-09-02 | — | — | US | disclosed |
| EP-0874016-B1 | Novel resin for optical material | MITSUBISHI GAS CHEMICAL CO (JP) | 2003-08-20 | — | — | EP | disclosed |
| EP-1334974-A1 | Cyclic disulfide compound, process of producing the same and optical product comprising the same | HOYA CORPORATION (JP) | 2003-08-13 | — | — | EP | disclosed |
| US-6605353-B2 | Polyimide derived from a dianhydride and diamine having hydroxyl or carboxyl groups, which are modified with a diepoxide or unsaturated group-containing epoxide; curable; heat resistance, dielectric, film-forming | KANEKA CORPORATION (JP) | 2003-08-12 | — | — | US | disclosed |
| US-20030144431-A1 | Episulfide compound, method for producing the same and optical product comprising the same | HOYA CORPORATION | 2003-07-31 | — | — | US | disclosed |
| EP-0768573-B1 | Phosphor-containing photosensitive resin composition for use in manufacturing plasma display panel | HITACHI CHEMICAL CO LTD (JP) | 2003-07-30 | — | — | EP | disclosed |
| EP-0822229-B1 | POLYIMIDE RESIN COMPOSITION | NIPPON ZEON CO (JP) | 2003-07-30 | — | — | EP | disclosed |
| US-6596360-B2 | Multilayer volume hologram, and label for multilayer volume hologram fabrication | DAI NIPPON PRINTING CO., LTD. (JP) | 2003-07-22 | — | — | US | disclosed |
| EP-1325058-A2 | EPISULFIDE BASED POLYMERIZABLE COMPOSITION CATALYZED BY AN (ALKOXYPHENYL)PHOSPHINE | ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) | 2003-07-09 | — | — | EP | disclosed |
| EP-1324135-A1 | ULTRAVIOLET-CURABLE RESIN COMPOSITION AND PHOTOSOLDER RESIST INK CONTAINING THE COMPOSITION | Goo Chemical Co., Ltd. (JP) | 2003-07-02 | — | — | EP | disclosed |
| US-20030118941-A1 | Photocurable composition, cured product and process for producing the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2003-06-26 | — | — | US | disclosed |
| EP-1321495-A1 | INK SET FOR INK JET-JET RECORDING, METHOD FOR INK-JET RECORDING AND RECORDED MATTER | SEIKO EPSON CORPORATION (JP) | 2003-06-25 | — | — | EP | disclosed |
| EP-1319966-A1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2003-06-18 | — | — | EP | disclosed |
| US-6579260-B2 | Balloon for medical tube and medical tube equipped with the same | TERUMO KABUSHIKI KAISHA (JP) | 2003-06-17 | — | — | US | disclosed |
| US-20030104938-A1 | Erasable recording material capable of inputting additional information written thereon and information recording system and information recording method using the recording material | TORII MASAFUMI (JP) | 2003-06-05 | — | — | US | disclosed |
| EP-1316555-A1 | Episulfide compound, method for producing the same and optical product comprising the same | HOYA CORPORATION (JP) | 2003-06-04 | — | — | EP | disclosed |
| US-20030090193-A1 | Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same | NOJIRI TAKESHI (JP) | 2003-05-15 | — | — | US | disclosed |
| US-6524377-B2 | Phenolic electron accepting color developer and electron donating coloring agent such as leuco dye; achieves color on heating; erasure on cooling; durability; reusable | RICOH COMPANY, LTD. (JP) | 2003-02-25 | — | — | US | disclosed |
| EP-1275668-A1 | PHOTOCURABLE COMPOSITION, CURED OBJECT, AND PROCESS FOR PRODUCING THE SAME | MITSUBISHI CHEMICAL CORPORATION (JP) | 2003-01-15 | — | — | EP | disclosed |
| US-6503868-B2 | Phenolic electron accepting color developer and electron donating coloring agent; leuco dye; achieves color on heating; erasure on cooling; durability; reusable | RICOH COMPANY, LTD. (JP) | 2003-01-07 | — | — | US | disclosed |
| EP-1270645-A1 | Resin for optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2003-01-02 | — | — | EP | disclosed |
| US-6472495-B1 | RESIN PRODUCED BY CURING THE COMPOSITION BY POLYMERIZATION HAS AN EXCELLENT IMPACT RESISTANCE AND OPTICAL PROPERTIES, AND IS SUITABLE AS AN OPTICAL MATERIAL. POLYMERS WITH SULFIDE, SELINIUM AND TELLURIUM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2002-10-29 | — | — | US | disclosed |
| US-6465540-B1 | POLYMER CONTAINING EPOXIZED ETHYLENICALLY UNSATURATE, DIACRY-LATED POLYETHER AND POLYBASIC ANHYDRIDE WITH SUCH AS A CRESOL NOVOLAC EPOXY RESIN AND PHOTOINITIATOR; DILUTE ALKALI DEVE-LOPABLE; PROTECTIVE FILMS FOR COLOR FILTERS; PRINTED CIRCUITS | GOO CHEMICAL CO., LTD. (JP) | 2002-10-15 | — | — | US | disclosed |
| EP-0978513-B1 | Ether compound and cured resin using the same | MITSUBISHI GAS CHEMICAL CO (JP) | 2002-10-02 | — | — | EP | disclosed |
| US-6458917-B2 | CURABLE; POLYSULFIDES | MITSUI CHEMICALS, INC. (JP) | 2002-10-01 | — | — | US | disclosed |
| EP-1234681-A1 | Reversible thermosensitive recording medium and image processing method using the same | Ricoh Company, Ltd. (JP) | 2002-08-28 | — | — | EP | disclosed |
| US-6432518-B1 | Erasable recording material capable of inputting additional information written thereon and information recording system and information recording method using the recording material | RICOH COMPANY, LTD. (JP) | 2002-08-13 | — | — | US | disclosed |
| US-20020107145-A1 | Reversible thermosensitive recording material, and image recording and erasing method using the recording material | RICOH COMPANY, LTD. (JP) | 2002-08-08 | — | — | US | disclosed |
| US-20020099167-A1 | Asymmetric disulfide compounds, method for producing the same, and optical products | HOYA CORPORATION | 2002-07-25 | — | — | US | disclosed |
| EP-0872258-B1 | Balloon for medical tube and medical tube equipped with the same | TERUMO CORP (JP) | 2002-07-17 | — | — | EP | disclosed |
| US-6420467-B1 | DIESTER, HYDROXY ACRYLATE OR METHACRYLATE, PEROXIDE, REDUCING AGENT AND ELASTOMER | DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 2002-07-16 | — | — | US | disclosed |
| US-6417322-B1 | HIGH SPEED CATALYSIS; POLYTHIOETHERS; OPHTHALMIC LENSES; TRANSPARENT | ESSILOR INTERNATIONAL COMPAGNIE GENERAL D'OPTIQUE (FR) | 2002-07-09 | — | — | US | disclosed |
| US-6416931-B2 | WHEREIN LOWERING OF BRIGHTNESS IS SUPPRESSED IN A PLASMA DISPLAY PANEL | HITACHI CHEMICAL CO., LTD. (JP) | 2002-07-09 | — | — | US | disclosed |
| EP-0919870-B1 | Photosensitive resin composition and photosensitive element using the resin composition | NICHIGO MORTON CO LTD (JP) | 2002-07-03 | — | — | EP | disclosed |
| US-6410478-B1 | A LAYER COMPRISING COLORING AGENT(LEUCO DYE), COLOR DEVELOPERS AND DECOLORING PROMOTERS COATED ON A SUPPORT; IMAGE DISPLAYS AND AS A REWRITABLE PAPER | RICOH COMPANY, LTD. (JP) | 2002-06-25 | — | — | US | disclosed |
| EP-1211090-A1 | Reversible thermosensitive recording material, and image recording and erasing method using the recording material | Ricoh Company, Ltd. (JP) | 2002-06-05 | — | — | EP | disclosed |
| EP-1211276-A2 | Optical product, asymmetric disulfide compound used therefor and method for producing the asymmetric disulfide compound | HOYA CORPORATION (JP) | 2002-06-05 | — | — | EP | disclosed |
| US-6369269-B2 | Thiol and sulfur-containing O-(meth)acrylate compounds and use thereof | MITSUI CHEMICALS, INC. (JP) | 2002-04-09 | — | — | US | disclosed |
| US-6365707-B1 | CATALYTIC POLYEPOXIDES OR POLYTHIOEPOXIDES AND AMINO COMPOUNDS | MITSUI CHEMICALS, INC. (JP) | 2002-04-02 | — | — | US | disclosed |
| WO-2002024786-A2 | EPISULFIDE BASED POLYMERIZABLE COMPOSITION CATALYZED BY AN (ALKOXYPHENYL)PHOSPHINE | ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) | 2002-03-28 | — | — | WO | disclosed |
| US-20020035196-A1 | Polyimide film | TANAKA AKIRA (JP) | 2002-03-21 | — | — | US | disclosed |
| US-20020032273-A1 | Pattern forming process using polyimide resin composition | TANAKA AKIRA (JP) | 2002-03-14 | — | — | US | disclosed |
| US-20020018946-A1 | Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same | NOJIRI TAKESHI (JP) | 2002-02-14 | — | — | US | disclosed |
| US-20020019511-A1 | Polymerizable composition | MORIJIRI HIROYUKI (JP) | 2002-02-14 | — | — | US | disclosed |
| US-20020018253-A1 | Multilayer volume hologram, and label for multilayer volume hologram fabrication | DAI NIPPON PRINTING CO., LTD. | 2002-02-14 | — | — | US | disclosed |
| US-20020015897-A1 | Hologram transfer foil | DAI NIPPON PRINTING CO., LTD. | 2002-02-07 | — | — | US | disclosed |
| EP-0735062-B1 | ACTINIC-RADIATION-CURABLE COMPOSITION AND LENS SHEET | MITSUBISHI RAYON CO (JP) | 2002-01-30 | — | — | EP | disclosed |
| EP-1174767-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT COMPRISING THE SAME, PROCESS FOR PRODUCING RESIST PATTERN, AND PROCESS FOR PRODUCING PRINTED CIRCUIT BOARD | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2002-01-23 | — | — | EP | disclosed |
| US-20020006558-A1 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. | 2002-01-17 | — | — | US | disclosed |
| EP-1168110-A2 | Hologram transfer foil | DAI NIPPON PRINTING CO., LTD. (JP) | 2002-01-02 | — | — | EP | disclosed |
| EP-1168111-A2 | Multilayer volume hologram, and label for multilayer volume hologram fabrication | DAI NIPPON PRINTING CO., LTD. (JP) | 2002-01-02 | — | — | EP | disclosed |
| US-20010056174-A1 | Epoxy-modified polyimide, photosensitive composition, coverlay film, solder resist, and printed wiring board using the epoxy-modified polyimide | KANEKA CORPORATION (JP) | 2001-12-27 | — | — | US | disclosed |
| US-6329111-B1 | UNIFORM THICKNESS AND SHAPE ON THE WALL SURFACE OF A BARRIER RIB AND THE BOTTOM OF THE SPACE; SUBSTRATE HAS UNEVENNESS AND PHOSPHOR LAYER FORMED ON THE INNER SURFACE OF CONCAVE PORTION; FLAT PLATE MULTICOLOR PLASMA DISPLAY PANEL | HITACHI CHEMICAL COMPANY (JP) | 2001-12-11 | — | — | US | disclosed |
| US-20010046630-A1 | Hologram transfer foil | DAI NIPPON PRINTING CO., LTD. (JP) | 2001-11-29 | — | — | US | disclosed |
| US-20010044555-A1 | Thiol and sulfur-containing O-(meth)acrylate counpounds and use thereof | KOBAYASHI SEIICHI (JP) | 2001-11-22 | — | — | US | disclosed |
| US-20010044597-A1 | Balloon for medical tube and medical tube equipped with the same | MAKI SHIN (JP) | 2001-11-22 | — | — | US | disclosed |
| EP-1153935-A1 | PHOTOPOLYMERIZABLE RESIN COMPOSITION AND USE THEREOF | Nippon Steel Chemical Co., Ltd. (JP) | 2001-11-14 | — | — | EP | disclosed |
| US-20010039243-A1 | Reversible thermosensitive coloring composition and recording material using the composition and recording method using the recording material | TORII MASAFUMI (JP) | 2001-11-08 | — | — | US | disclosed |
| EP-1150183-A2 | Hologram transfer foil | DAI NIPPON PRINTING CO., LTD. (JP) | 2001-10-31 | — | — | EP | disclosed |
| US-6310135-B1 | PHOTOSENSITIVE RESINS WITH TETRAZOLE COMPOUND | NIPPON ZEON CO., LTD. (JP) | 2001-10-30 | — | — | US | disclosed |
| US-20010029236-A1 | Method of using reversible thermosensitive recording medium and the reversible thermosensitive recording medium | RICOH COMPANY, LTD. (JP) | 2001-10-11 | — | — | US | disclosed |
| US-6300464-B2 | HIGH HEAT RESISTANCE AND REFRACTIVE INDEX, LOW SPECIFIC GRAVITY; POLYMERS CONTAINING THIO(EPOXY) AND AT LEAST ONE DISULFIDE BOND | MITSUI CHEMICAL, INC. (JP) | 2001-10-09 | — | — | US | disclosed |
| US-20010025587-A1 | Reversible thermosensitive coloring composition and recording material using the composition and recording method using the recording material | TORII MASAFUMI (JP) | 2001-10-04 | — | — | US | disclosed |
| US-6294313-B1 | PHOTOCATALYST-CONTAINING LAYER CONTAINING A MATERIAL OF WHICH THE WETTABILITY IS VARIABLE THROUGH PHOTOCATALYTIC ACTION UPON PATTERN-WISE EXPOSURE. | DAI NIPPON PRINTING CO., LTD. (JP) | 2001-09-25 | — | — | US | disclosed |
| EP-0802208-B1 | Optical resin composition and use thereof | MITSUI CHEMICALS INC (JP) | 2001-09-05 | — | — | EP | disclosed |
| US-6265510-B1 | OPTICS; LENSES | MITSUI CHEMICALS, INC. (JP) | 2001-07-24 | — | — | US | disclosed |
| US-6261992-B1 | AMIDE ERASURE PROMOTER | RICOH COMPANY, LTD. (JP) | 2001-07-17 | — | — | US | disclosed |
| US-6248501-B1 | RESINS WITH CARBOXY GROUPS AND ETHYLENEIC UNSATURATED COMPOUNDS | HITACHI CHEMICAL CO., LTD. (JP) | 2001-06-19 | — | — | US | disclosed |
| US-6242158-B1 | POLYMER WITH CARBOXY DERIVATIVES, ETHYLENE AND ACRYLIC ESTER DERIVATIVES | NICHIGO-MORTON CO., LTD. (JP) | 2001-06-05 | — | — | US | disclosed |
| US-20010002413-A1 | Polymerizable composition | MORIJIRI HIROYUKI (JP) | 2001-05-31 | — | — | US | disclosed |
| EP-1099721-A1 | Composition for producing resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-05-16 | — | — | EP | disclosed |
| US-6232266-B1 | COMPRISES TWO OR MORE KINDS OF COMPOUNDS, AND AT LEAST ONE OF WHICH IS FORMED A COLOR-FORMATION CONTROLLING LAYER OBTAINED BY POLYMERIZING A COMPOUND HAVING AN UNSATURATED CARBON BOND. | MITSUBISHI PAPER MILLS LIMITED (JP) | 2001-05-15 | — | — | US | disclosed |
| EP-0753550-B1 | CONDUCTIVE COATING COMPOSITION | SEKISUI CHEMICAL CO LTD (JP) | 2001-04-25 | — | — | EP | disclosed |
| EP-1089093-A2 | Anti-reflection film, polarizing plate comprising the same, and image display device using the anti-reflection film or the polarizing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2001-04-04 | — | — | EP | disclosed |
| US-6206550-B1 | BACKLIGHT WITH LENS PORTION MADE FROM A CURABLE COMPOSITION WHICH INCLUDES A BIS(4-(METH)ACRYLOYL-THIOPHENYL) SULFIDE AND (METH)ACRYLATES; HIGH BRIGHTNESS-ENHANCING EFFECT ON LENSES OF PROJECTION TVS AND STEREOSCOPIC PHOTOGRAPHY. | MITSUBISHI RAYON COMPANY LTD. (JP) | 2001-03-27 | — | — | US | disclosed |
| US-6207613-B1 | ELECTRON ACCEPTING COLOR DEVELOPER INCLUDES A PHENOLIC COMPOUND | RICOH COMPANY, LTD. (JP) | 2001-03-27 | — | — | US | disclosed |
| US-6204311-B1 | (THIO)EPOXY COMPOUND HAVING AT LEAST ONE INTRAMOLECULAR DISULFIDE BOND AND A CURING CATALYST. | MITSUI CHEMICALS, INC. (JP) | 2001-03-20 | — | — | US | disclosed |
| US-6201061-B1 | CURING A RESIN FOR OPTICAL USE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-03-13 | — | — | US | disclosed |
| US-6197226-B1 | COMPRISING DIPPING RESIN INTO A LIQUID CONTAINING POLAR COMPOUND SELECTED FROM POLAR INORGANIC COMPOUNDS AND POLAR ORGANIC COMPOUNDS AND TINTING RESIN, WHEREIN RESIN IS OBTAINED BY CURING BY POLYMERIZATION A SULFUR CONTAINING COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY (JP) | 2001-03-06 | — | — | US | disclosed |
| US-6180753-B1 | ADDING ACIDS, CURING AND SOLIDIFICATION WITH CASTING | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-01-30 | — | — | US | disclosed |
| EP-0793145-B1 | Photopolymerizable composition for a photosensitive lithographic printing plate and photosensitive lithographic printing plate employing it | MITSUBISHI CHEM CORP (JP) | 2001-01-24 | — | — | EP | disclosed |
| US-6177511-B1 | ANIONIC, CATIONIC, NONIONIC OR AMPHOTERIC SURFACTANTS; DIACRYLATES AND/OR OLIGOACRYLATES | WACKER-CHEMIE GMBH (DE) | 2001-01-23 | — | — | US | disclosed |
| EP-0810210-B1 | Thiol and sulfur-containing o-(meth)acrylate compounds and use thereof | MITSUI CHEMICALS INC (JP) | 2001-01-10 | — | — | EP | disclosed |
| US-6160081-A | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 2000-12-12 | — | — | US | disclosed |
| EP-1057615-A2 | Stereolithographic apparatus and method | Teijin Seiki Co., Ltd. (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1058133-A2 | Polymerizable composition and process for producing optical resin comprising the same | Mitsui Chemicals, Inc. (JP) | 2000-12-06 | — | — | EP | disclosed |
| US-6130307-A | POLY(THIO)URETHANES | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2000-10-10 | — | — | US | disclosed |
| EP-0756204-B1 | Photopolymerizable composition and photosensitive lithographic printing plate employing it | MITSUBISHI CHEM CORP (JP) | 2000-09-20 | — | — | EP | disclosed |
| EP-1037111-A1 | Ultraviolet curable resin composition and photo solder resist ink using the same | Goo Chemical Co., Ltd. (JP) | 2000-09-20 | — | — | EP | disclosed |
| US-6117923-A | OXIDATION RESISTANCE. POLYMERIZING A NOVEL SULFUR-CONTAINING COMPOUND HAVING AN EPISULFIDE STRUCTURE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-09-12 | — | — | US | disclosed |
| US-6114485-A | STARTING MATERIAL FOR A RESIN COMPOSITION USED IN OPTICAL APPLICATIONS SUCH AS A LENS | MITSUI CHEMICALS, INC. (JP) | 2000-09-05 | — | — | US | disclosed |
| US-6090748-A | IMAGEWISE HEATING THE RECORDING LAYER TO NOT LOWER THAN AN IMAGE FORMING TEMPERATURE TO FORM A COLORED IMAGE, AND ERASING BY HEATING TO A TEMPERATURE LOWER THAN IMAGE FORMING TEMPERATURE, NOT LOWER THAN IMAGE ERASING TEMPERATURE | RICOH COMPANY, LTD. (JP) | 2000-07-18 | — | — | US | disclosed |
| US-6090192-A | COMPRISING DEVELOPER AND COLORING AGENT, WHERE THE DEVELOPER IS A 1-(HYDROCARBYL(OXYGEN OR NITROGEN-CONTAINING DIVALENT GROUP)ALKYLCARBONYLAMINO),(MONO-, DI- OR TRI-)HYDROXY BENZENE; DISCOLORIZATION SPEED AND GOOD STORAGE STABILITY | RICOH COMPANY, LTD. (JP) | 2000-07-18 | — | — | US | disclosed |
| EP-1016547-A1 | Method and material for erasable recording by heat | Ricoh Company, Ltd. (JP) | 2000-07-05 | — | — | EP | disclosed |
| US-6077647-A | BACK PLATE FOR PLASMA DISPLAY PANEL | HITACHI CHEMICAL CO., LTD. (JP) | 2000-06-20 | — | — | US | disclosed |
| EP-0551867-B1 | Laminated transparent plastic material and polymerizable monomer | MITSUI CHEMICALS INC (JP) | 2000-06-07 | — | — | EP | disclosed |
| EP-0980696-A1 | Process for treating a compound having epithio structures for disposal | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-02-23 | — | — | EP | disclosed |
| EP-0979854-A1 | CIRCUIT CONNECTING MATERIAL, AND STRUCTURE AND METHOD OF CONNECTING CIRCUIT TERMINAL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2000-02-16 | — | — | EP | disclosed |
| EP-0978513-A1 | Ether compound and cured resin using the same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-02-09 | — | — | EP | disclosed |
| US-6019915-A | PHOTOCURING A MIXTURE OF A THIOURETHANE POLYMER FROM A POLYTHIOL HAVING AT LEAST 3 MERCAPTO GROUPS AND AN INTRAMOLECULAR SULFIDE BOND AND POLYISOCYANATE, POLY(METH)ACRYLATE AND AN UNSATURATED COMPOUND | MITSUI CHEMICALS, INC. (JP) | 2000-02-01 | — | — | US | disclosed |
| EP-0626431-B1 | PHOTOCURABLE CONDUCTIVE COATING COMPOSITION | SEKISUI CHEMICAL CO LTD (JP) | 2000-01-26 | — | — | EP | disclosed |
| EP-0505861-B1 | Coated film | MITSUBISHI POLYESTER FILM CORP (JP) | 1999-12-01 | — | — | EP | disclosed |
| US-5981115-A | RECORDING LAYER COMPRISES A RESIN AN ISOCYANATE COMPOUND CROSSLINKED WITH RESIN, ELECTRON DONATING COLORING AGENT AND AN ELECTRON ACCEPTING COLORING DEVELOPER | RICOH COMPANY, LTD. (JP) | 1999-11-09 | — | — | US | disclosed |
| EP-0952466-A2 | Lens sheet | MITSUBISHI RAYON CO., LTD. (JP) | 1999-10-27 | — | — | EP | disclosed |
| EP-0950905-A2 | Process for producing a novel resin for optical materials having excellent color tone and transparency | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1999-10-20 | — | — | EP | disclosed |
| US-5969867-A | ACRYLIC ESTERS | MITSUBISHI RAYON COMPANY LTD. (JP) | 1999-10-19 | — | — | US | disclosed |
| US-5955225-A | HEAT SENSITIVE ELEMENTS FOR COLORING AND DECOLORING | RICOH COMPANY LTD. (JP) | 1999-09-21 | — | — | US | disclosed |
| EP-0942027-A2 | A polymerizable composition | Mitsui Chemicals, Inc. (JP) | 1999-09-15 | — | — | EP | disclosed |
| US-5948727-A | COMPOSITE LAMINATED RECORDING LAYER ON SUPPORT | RICOH COMPANY, LTD. (JP) | 1999-09-07 | — | — | US | disclosed |
| EP-0692389-B1 | REVERSIBLE HEAT-SENSITIVE RECORDING MEDIUM, AND IMAGE FORMING AND ERASING METHOD | RICOH KK (JP) | 1999-09-01 | — | — | EP | disclosed |
| US-5942377-A | PHENOLIC COMPOUND; HEAT RESISTANCE, COLORFASTNESS, DURABILITY | RICOH COMPANY, LTD. (JP) | 1999-08-24 | — | — | US | disclosed |
| EP-0936233-A2 | Composition for a resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1999-08-18 | — | — | EP | disclosed |
| EP-0932081-A1 | PATTERN FORMING BODY, PATTERN FORMING METHOD, AND THEIR APPLICATIONS | DAI NIPPON PRINTING CO., LTD. (JP) | 1999-07-28 | — | — | EP | disclosed |
| EP-0928802-A2 | Process for tinting a resin having a large refractivity index and optical material tinted by the process | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1999-07-14 | — | — | EP | disclosed |
| US-5916987-A | OPTICAL RESIN; LENSES | MITSUI CHEMICALS, INC. (JP) | 1999-06-29 | — | — | US | disclosed |
| EP-0921417-A2 | Epoxy/episulfide resin compositions for optical materials | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1999-06-09 | — | — | EP | disclosed |
| EP-0919870-A1 | Photosensitive resin composition and photosensitive element using the resin composition | Nichigo-Morton Co Ltd (JP) | 1999-06-02 | — | — | EP | disclosed |
| US-5908876-A | Optical resin composition comprising a thiourethane prepolymer and use thereof | MITSUI CHEMICALS, INC. (JP) | 1999-06-01 | — | — | US | disclosed |
| US-5891823-A | SUBSTITUTED ALKANOYLAMINOPHENOL ELECTRON ACCEPTORS | RICOH COMPANY LTD. (JP) | 1999-04-06 | — | — | US | disclosed |
| WO-1999015936-A1 | PHOTOSENSITIVE ELEMENT COMPRISING A PROTECTIVE FILM | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1999-04-01 | — | — | WO | disclosed |
| US-5886136-A | Pattern forming process | NIPPON ZEON CO., LTD. (JP) | 1999-03-23 | — | — | US | disclosed |
| EP-0659844-B1 | Transparent conductive coating composition and transparent antistatic molded article | SEKISUI CHEMICAL CO LTD (JP) | 1999-03-17 | — | — | EP | disclosed |
| US-5869422-A | CAPABLE OF RECORDING AND ERASING IMAGES REPEATEDLY BY REVERSIBLY CHANGING BETWEEN A TRANSPARENT STATE AND AN OPAQUE STATE BY CHANGING THE TEMPERATURE OF THE RECORDING MEDIUM | RICOH COMPANY, LTD. (JP) | 1999-02-09 | — | — | US | disclosed |
| US-5858616-A | Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same, and phosphor subjected to surface treatment and process for preparing the same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1999-01-12 | — | — | US | disclosed |
| EP-0886660-A1 | PHOTOCURABLE PUTTY FOR REPAIRING SHEET METAL | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1998-12-30 | — | — | EP | disclosed |
| US-5847071-A | Photosensitive resin composition | HITACHI, CHEMICAL CO., LTD. (JP) | 1998-12-08 | — | — | US | disclosed |
| EP-0874016-A2 | Novel resin for optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1998-10-28 | — | — | EP | disclosed |
| EP-0872258-A2 | Balloon for medical tube and medical tube equipped with the same | TERUMO KABUSHIKI KAISHA (JP) | 1998-10-21 | — | — | EP | disclosed |
| EP-0566353-B1 | Photopolymerizable composition | MITSUBISHI RAYON CO (JP) | 1998-08-19 | — | — | EP | disclosed |
| US-5777068-A | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 1998-07-07 | — | — | US | disclosed |
| US-5747413-A | CHANGE IN TRANSPARENCY | RICOH COMPANY, LTD. (JP) | 1998-05-05 | — | — | US | disclosed |
| EP-0769038-B1 | SYNTHETIC MORTAR RESIN COMPOSITIONS | CRAY VALLEY SA (FR) | 1998-03-04 | — | — | EP | disclosed |
| EP-0822229-A1 | POLYIMIDE RESIN COMPOSITION | NIPPON ZEON CO., LTD. (JP) | 1998-02-04 | — | — | EP | disclosed |
| EP-0563894-B1 | Two-part room temperature curable composition | CEMEDINE CO LTD (JP) | 1998-01-07 | — | — | EP | disclosed |
| US-5702846-A | COMPRISING CATIONIC POLYMERIZABLE COMPOUND, RADICAL POLYMERIZABLE COMPOUND, INITIATORS FOR BOTH, WHEREIN AT LEAST ONE POLYMERIZABLE COMPOUND CONTAINS SILOXANE GROUP | NIPPON PAINT CO. LTD. (JP) | 1997-12-30 | — | — | US | disclosed |
| EP-0810210-A2 | Thiol and sulfur-containing o-(meth)acrylate compounds and use thereof | MITSUI TOATSU CHEMICALS, INC. (JP) | 1997-12-03 | — | — | EP | disclosed |
| EP-0802208-A1 | Optical resin composition and use thereof | MITSUI TOATSU CHEMICALS, INC. (JP) | 1997-10-22 | — | — | EP | disclosed |
| WO-1997033928-A1 | PHOTOCURABLE PUTTY FOR REPAIRING SHEET METAL | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1997-09-18 | — | — | WO | disclosed |
| US-5668248-A | POLYAMIC ACID ESTERS | HITACHI CHEMICAL CO., LTD. (JP) | 1997-09-16 | — | — | US | disclosed |
| EP-0793145-A1 | Photopolymerizable composition for a photosensitive lithographic printing plate and photosensitive lithographic printing plate employing it | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-09-03 | — | — | EP | disclosed |
| EP-0785565-A1 | Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same | Hitachi Chemical Co., Ltd. (JP) | 1997-07-23 | — | — | EP | disclosed |
| WO-1997023809-A1 | PHOTOSENSITIVE RESIN COMPOSITION | KOLON INDUSTRIES, INC. (KR) | 1997-07-03 | — | — | WO | disclosed |
| EP-0551697-B1 | Photoinitiator system and photopolymerizable composition using the same | HITACHI CHEMICAL CO LTD (JP) | 1997-05-14 | — | — | EP | disclosed |
| EP-0768573-A1 | Phosphor-containing photosensitive resin composition for use in manufacturing plasma display panel | Hitachi Chemical Co., Ltd. (JP) | 1997-04-16 | — | — | EP | disclosed |
| EP-0763779-A2 | Unsaturated group-containing urethane compound, photopolymerizable composition containing it, and photosensitive lithographic printing plate | Mitsubishi Chemical Corporation (JP) | 1997-03-19 | — | — | EP | disclosed |
| EP-0756204-A1 | Photopolymerizable composition and photosensitive lithographic printing plate employing it | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-01-29 | — | — | EP | disclosed |
| EP-0570133-B1 | Styrene resin composition and method of producing a molding thereof | SUMITOMO CHEMICAL CO (JP) | 1997-01-15 | — | — | EP | disclosed |
| EP-0753550-A1 | CONDUCTIVE COATING COMPOSITION | SEKISUI CHEMICAL CO., LTD. (JP) | 1997-01-15 | — | — | EP | disclosed |
| US-5585221-A | GRAFT POLYMER; EXCELLENT BONDING STRENGTH | CANON KABUSHIKI KAISHA (JP) | 1996-12-17 | — | — | US | disclosed |
| EP-0742244-A2 | Durable polysulfide composition for optical material | MITSUI TOATSU CHEMICALS, INC. (JP) | 1996-11-13 | — | — | EP | disclosed |
| EP-0524654-B1 | Recording media for a sublimation-type heat-sensitive recording process | MITSUBISHI RAYON CO (JP) | 1996-10-16 | — | — | EP | disclosed |
| EP-0735062-A1 | ACTINIC-RADIATION-CURABLE COMPOSITION AND LENS SHEET | MITSUBISHI RAYON CO., LTD. (JP) | 1996-10-02 | — | — | EP | disclosed |
| US-5559186-A | MOLDING MATERIALS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1996-09-24 | — | — | US | disclosed |
| EP-0544052-B1 | Use of a photocurable resin composition for the preparation of a laminated film. | DAICEL UCB CO LTD (JP) | 1996-09-04 | — | — | EP | disclosed |
| EP-0385456-B1 | High surface hardness transparent resin and polymerizable monomer | MITSUI TOATSU CHEMICALS (JP) | 1996-09-04 | — | — | EP | disclosed |
| EP-0540003-B1 | Cast resin for optical use | NOF CORP (JP) | 1996-05-08 | — | — | EP | disclosed |
| US-5503897-A | POLYMER LAYER DERIVED FROM MULTIFUNCTIONAL MONOMER(S) HAVING AT LEAST TWO (METH)ACRYLOYLOXY GROUPS PER MOLECULE; UV RADIATION THROUGH CONTROLLING MATERIAL; ALKALI TREATMENT | MITSUBISHI RAYON CO., LTD. (JP) | 1996-04-02 | — | — | US | disclosed |
| EP-0702270-A2 | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 1996-03-20 | — | — | EP | disclosed |
| US-5500040-A | Ultraviolet-curable thermochromic ink composition | SAKURA COLOR PRODUCTS CORPORATION (JP) | 1996-03-19 | — | — | US | disclosed |
| EP-0692389-A1 | REVERSIBLE HEAT-SENSITIVE RECORDING MEDIUM, AND IMAGE FORMING AND ERASING METHOD | Ricoh Company, Ltd (JP) | 1996-01-17 | — | — | EP | disclosed |
| EP-0520773-B1 | Expandable polyolefin resin compositions | SEKISUI CHEMICAL CO LTD (JP) | 1996-01-17 | — | — | EP | disclosed |
| EP-0424037-B1 | Sublimation dispersion dye receptive resin compositions | MITSUBISHI RAYON CO (JP) | 1996-01-03 | — | — | EP | disclosed |
| US-5480536-A | CHROME PLATING AND HEAT TREATMENT OF PISTON ROD, IMPREGNATING HOLES WITH CURABLE RESIN | KOWA INDUSTRY WORKS CO., LTD. (JP) | 1996-01-02 | — | — | US | disclosed |
| US-5478575-A | Polymers having benzeneboronic acid groups and insulin complexes of same of a sugar response type | NIPPON OIL & FATS CO., LTD. (JP) | 1995-12-26 | — | — | US | disclosed |
| US-5472823-A | Polyamic acids | HITACHI CHEMICAL CO., LTD. (JP) | 1995-12-05 | — | — | US | disclosed |
| US-5459206-A | Acrylate monomer and modified silicone, elasticity, hardness | CEMEDINE CO., LTD. (JP) | 1995-10-17 | — | — | US | disclosed |
| EP-0675411-A1 | Photosensitive resin composition and photosensitive film using the same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1995-10-04 | — | — | EP | disclosed |
| EP-0675166-A1 | Thermoplastic resin composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1995-10-04 | — | — | EP | disclosed |
| EP-0674225-A1 | Photosensitive resin composition and photosensitive film | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1995-09-27 | — | — | EP | disclosed |
| US-5451695-A | Acrylic ester monomer with carbamate group, glazing for windows | MITSUI TOATSU CHEMICALS, INC. (JP) | 1995-09-19 | — | — | US | disclosed |
| US-5440358-A | Scratch, heat, chemical resistant crosslinked copolymer | MITSUI TOATSU CHEMICALS, INC. (JP) | 1995-08-08 | — | — | US | disclosed |
| EP-0451680-B1 | Process for producing propylene resin formed articles with hard coat | MITSUBISHI PETROCHEMICAL CO (JP) | 1995-07-12 | — | — | EP | disclosed |
| US-5429846-A | Antimony oxide-containing tin oxide powder, (meth) acrylate compound, acetal resin, photopolymerization initiator and organic solvent | SEKISUI CHEMICAL CO., LTD. (JP) | 1995-07-04 | — | — | US | disclosed |
| EP-0659844-A1 | Transparent conductive coating composition and transparent antistatic molded article | SEKISUI CHEMICAL CO., LTD. (JP) | 1995-06-28 | — | — | EP | disclosed |
| US-5426086-A | Reversible thermosensitive recording medium | RICOH COMPANY, LTD. (JP) | 1995-06-20 | — | — | US | disclosed |
| EP-0409555-B1 | Heat-sensitive transfer recording medium of the sublimation type | MITSUBISHI RAYON CO (JP) | 1995-05-10 | — | — | EP | disclosed |
| US-5408003-A | Dissolving uncrosslinked resin in mixture of monomers to form crosslinked styrene resin; bulk polymerization | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1995-04-18 | — | — | US | disclosed |
| EP-0562578-B1 | Polyester resin for a dye receptive-layer used in thermal transfer recording | MITSUBISHI RAYON CO (JP) | 1995-03-15 | — | — | EP | disclosed |
| US-5393607-A | Glazing materials; hardness, impact strength, scratch resistance | MITSUI TOATSU CHEMICLAS, INC. (JP) | 1995-02-28 | — | — | US | disclosed |
| EP-0373952-B1 | Photosensitive resin composition and photosensitive element using the same | HITACHI CHEMICAL CO LTD (JP) | 1995-02-08 | — | — | EP | disclosed |
| US-5376500-A | Storage stability, discoloration inhibition | MITSUBISHI RAYON CO., LTD. (JP) | 1994-12-27 | — | — | US | disclosed |
| EP-0473780-B1 | ANTIFOG SHEET AND METHOD OF ITS PRODUCTION | DAINIPPON PRINTING CO LTD (JP) | 1994-11-30 | — | — | EP | disclosed |
| EP-0626431-A1 | PHOTOCURABLE CONDUCTIVE COATING COMPOSITION | SEKISUI CHEMICAL CO., LTD. (JP) | 1994-11-30 | — | — | EP | disclosed |
| JP-H06230571-A | HEAT RESISTANT PHOTOSENSTIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD | 1994-08-19 | — | — | JP | disclosed |
| US-5336743-A | Diallylphthalate component and an alkylene bis-allylcarbonate component | NOF CORPORATION (JP) | 1994-08-09 | — | — | US | disclosed |
| US-5322762-A | High contrast, visible after irradiation; tribromomethyl phenyl sulfone, leuco diamond green, and dye | MITSUBISHI RAYON CO., LTD. (JP) | 1994-06-21 | — | — | US | disclosed |
| EP-0385457-B1 | High surface hardness transparent resin and polymerizable monomer | MITSUI TOATSU CHEMICALS (JP) | 1994-06-01 | — | — | EP | disclosed |
| EP-0294220-B1 | Photopolymerizable composition | HITACHI CHEMICAL CO LTD (JP) | 1994-05-25 | — | — | EP | disclosed |
| US-5304580-A | Polypropylene, polyethylene, diacrylate or dimethacrylate of aliphatic dihydric alcohol, blowing agent | SEKISUI CHEMICAL CO., LTD. (JP) | 1994-04-19 | — | — | US | disclosed |
| US-5300536-A | Vinyl compound capable of free radical polymerization | TOAGOSEI CHEMICAL INDUSTRY CO., LTD. (JP) | 1994-04-05 | — | — | US | disclosed |
| EP-0584382-A1 | Image-receiving sheet for a sublimation-type heat-sensitive transfer recording process | MITSUBISHI RAYON CO., LTD (JP) | 1994-03-02 | — | — | EP | disclosed |
| US-5290750-A | Optical recording media with heat sensitive elements | MITSUBISHI RAYON CO., LTD. (JP) | 1994-03-01 | — | — | US | disclosed |
| EP-0261505-B1 | Composition easily dyeable with sublimable disperse dye | MITSUBISHI RAYON CO (JP) | 1994-01-26 | — | — | EP | disclosed |
| US-5273812-A | Forming a film by rolling a sovent-free composition of polymer, hydrophilic monomer and surfactant; crosslinking by ionizing radiation | DAI NIPPON INSATSU KABUSHIKI KAISHA (JP) | 1993-12-28 | — | — | US | disclosed |
| EP-0316507-B1 | Graded index lens array | MITSUBISHI RAYON CO (JP) | 1993-12-15 | — | — | EP | disclosed |
| EP-0570133-A1 | Styrene resin composition and method of producing a molding thereof | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1993-11-18 | — | — | EP | disclosed |
| US-5262277-A | Light sensitive elements for electrical thick films with heat resistance | HITACHI CHEMICAL COMPANY, INC. (JP) | 1993-11-16 | — | — | US | disclosed |
| US-5260439-A | With acrylic ester | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1993-11-09 | — | — | US | disclosed |
| EP-0566353-A1 | Photopolymerizable composition | MITSUBISHI RAYON COMPANY LTD. (JP) | 1993-10-20 | — | — | EP | disclosed |
| EP-0563894-A1 | Two-part room temperature curable composition | CEMEDINE CO., LTD. (JP) | 1993-10-06 | — | — | EP | disclosed |
| US-5250723-A | Copolymerizable monomer containing carbamate or thiocarbamate, ether and isopropenylphenyl groups; protective coatings; optical lenses; hardness; scratch, heat and chemical resistances | MITSUI TOATSU CHEMICALS, INC. (JP) | 1993-10-05 | — | — | US | disclosed |
| EP-0562578-A1 | Polyester resin for a dye receptive-layer used in thermal transfer recording | MITSUBISHI RAYON CO., LTD (JP) | 1993-09-29 | — | — | EP | disclosed |
| EP-0424168-B1 | POLYMER COMPLEXES OF A SUGAR RESPONSE TYPE | NIPPON OIL AND FATS COMPANY, LIMITED (JP) | 1993-09-01 | — | — | EP | disclosed |
| EP-0551867-A1 | Laminated transparent plastic material and polymerizable monomer | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1993-07-21 | — | — | EP | disclosed |
| EP-0551697-A1 | Photoinitiator system and photopolymerizable composition using the same | HITACHI CHEMICAL CO., LTD. (JP) | 1993-07-21 | — | — | EP | disclosed |
| EP-0324483-B1 | METHOD FOR FORMING HARD COAT ON POLYOLEFIN | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1993-07-07 | — | — | EP | disclosed |
| US-5218019-A | Polyester with crosslinking agent, crosslinkable silicon- or fluorine-containing release agent; for thermal dye transfer | MITSUBISHI RAYON CO., LTD. (JP) | 1993-06-08 | — | — | US | disclosed |
| EP-0544052-A1 | Use of a photocurable resin composition for the preparation of a laminated film. | DAICEL-UCB CO., LTD. (JP) | 1993-06-02 | — | — | EP | disclosed |
| EP-0540003-A1 | Cast resin for optical use | NOF CORPORATION (JP) | 1993-05-05 | — | — | EP | disclosed |
| JP-H0596630-A | OPTICAL SHAPING METHOD | I C I JAPAN KK | 1993-04-20 | — | — | JP | disclosed |
| EP-0208300-B1 | LIQUID JET RECORDING HEAD | CANON KABUSHIKI KAISHA (JP) | 1993-04-14 | — | — | EP | disclosed |
| EP-0232033-B1 | TRANSPARENT ELECTRICALLY CONDUCTIVE PLASTIC MOLDED ARTICLES | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-04-07 | — | — | EP | disclosed |
| EP-0321618-B1 | PHOTOSENSITIVE HARDENABLE COMPOSITIONS | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 1993-02-17 | — | — | EP | disclosed |
| EP-0524654-A1 | Recording media for a sublimation-type heat-sensitive recording process | MITSUBISHI RAYON CO., LTD (JP) | 1993-01-27 | — | — | EP | disclosed |
| EP-0520773-A2 | Expandable polyolefin resin compositions | SEKISUI CHEMICAL CO., LTD. (JP) | 1992-12-30 | — | — | EP | disclosed |
| US-5174848-A | PROCESS FOR PRODUCING PROPYLENE RESIN FORMED ARTICLES WITH HARD COAT | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1992-12-29 | — | — | US | disclosed |
| US-5153236-A | Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images | HITACHI CHEMICAL CO., LTD. (JP) | 1992-10-06 | — | — | US | disclosed |
| EP-0505861-A2 | Laminated film | DIAFOIL HOECHST CO., LTD (JP) | 1992-09-30 | — | — | EP | disclosed |
| US-5149611-A | Resin composing toner having nitrogen-containing polar group or fluorine functional group; stable, non-flying, clear images | MINOLTA CAMERA KABUSHIKI KAISHA (JP) | 1992-09-22 | — | — | US | disclosed |
| EP-0206086-B1 | ACTIVE ENERGY RAY-CURING RESIN COMPOSITION | CANON KABUSHIKI KAISHA (JP) | 1992-09-09 | — | — | EP | disclosed |
| US-5145927-A | Protective cover for display devices or optical lenses | MITSUI TOATSU CHEMICALS, INC. (JP) | 1992-09-08 | — | — | US | disclosed |
| US-5124226-A | Narrow particle size distribution | NIPPON PAINT CO., LTD. (JP) | 1992-06-23 | — | — | US | disclosed |
| EP-0295044-B1 | PHOTOINITIATOR AND PHOTOPOLYMERIZABLE COMPOSITION USING THE SAME | Hitachi Chemical Co., Ltd. (JP) | 1992-04-22 | — | — | EP | disclosed |
| US-5096877-A | Polyester film adhered to one surface of paper; dye receiving layer cured on film; wrinkle resistance | MITSUBISHI RAYON CO., LTD. (JP) | 1992-03-17 | — | — | US | disclosed |
| EP-0473780-A1 | ANTIFOG SHEET AND METHOD OF ITS PRODUCTION | DAI NIPPON INSATSU KABUSHIKI KAISHA (JP) | 1992-03-11 | — | — | EP | disclosed |
| US-5089291-A | Coating surface with uv rad curable methyl methacrylates with acryloyl side chains | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1992-02-18 | — | — | US | disclosed |
| US-5084538-A | HIGH SURFACE HARDNESS TRANSPARENT RESIN PREPARED FROM A COMPOUND HAVING AT LEAST ONE ISOPROPENYL PHENYL GROUP | MITSUI TOATSU CHEMICALS, INC. (JP) | 1992-01-28 | — | — | US | disclosed |
| US-5059667-A | Copolymer with a vinyl monomer; molding material | IDEMITSU PETROCHEMICAL COMPANY, LTD. (JP) | 1991-10-22 | — | — | US | disclosed |
| EP-0451680-A2 | Process for producing propylene resin formed articles with hard coat | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1991-10-16 | — | — | EP | disclosed |
| US-5034429-A | An unsaturated monomer, a photoinitiator and a benzene derivative for providing a cured film | HITACHI CHEMICAL CO., LTD. (JP) | 1991-07-23 | — | — | US | disclosed |
| EP-0424037-A2 | Sublimation dispersion dye receptive resin compositions | MITSUBISHI RAYON CO., LTD (JP) | 1991-04-24 | — | — | EP | disclosed |
| EP-0424168-A1 | Polymer complexes of a sugar response type | NIPPON OIL AND FATS COMPANY, LIMITED (JP) | 1991-04-24 | — | — | EP | disclosed |
| JP-H0370715-A | OPTICAL RESIN EXCELLENT IN IMPACT RESISTANCE | NIPPON OIL & FATS CO LTD | 1991-03-26 | — | — | JP | disclosed |
| EP-0409555-A2 | Heat-sensitive transfer recording medium of the sublimation type | MITSUBISHI RAYON CO., LTD. (JP) | 1991-01-23 | — | — | EP | disclosed |
| US-4987057-A | HIGH SENSITIVITY TO VISIBLE LIGHT RAYS | HITACHI CHEMICAL CO., LTD. (JP) | 1991-01-22 | — | — | US | disclosed |
| EP-0385456-A2 | High surface hardness transparent resin and polymerizable monomer | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1990-09-05 | — | — | EP | disclosed |
| EP-0385457-A2 | High surface hardness transparent resin and polymerizable monomer | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1990-09-05 | — | — | EP | disclosed |
| EP-0379284-A2 | Styrene-based polymer and method for the preparation thereof | IDEMITSU PETROCHEMICAL CO., LTD. (JP) | 1990-07-25 | — | — | EP | disclosed |
| EP-0373952-A2 | Photosensitive resin composition and photosensitive element using the same | Hitachi Chemical Co., Ltd. (JP) | 1990-06-20 | — | — | EP | disclosed |
| EP-0368165-A2 | Curable resin compositions | IDEMITSU PETROCHEMICAL CO. LTD. (JP) | 1990-05-16 | — | — | EP | disclosed |
| US-4915997-A | MULTILAYER SEALED STRUCTURE; ADHESIVE IS EPOXY RESIN AND ORGANOSILICON POLYMER | RICOH COMPANY, LTD. (JP) | 1990-04-10 | — | — | US | disclosed |
| US-4885229-A | CONTAINING ACRYLATED ESTERS | 501 DAICEL CHEMICAL INDUSTRIES LTD. (JP) | 1989-12-05 | — | — | US | disclosed |
| US-4877922-A | POLYESTER, RADIATION CURABLE CROSSLINKING AGENT, SURFACTANT | MITSUBISHI RAYON COMPANY, LTD. (JP) | 1989-10-31 | — | — | US | disclosed |
| US-4852982-A | RESOLUTION; ACRYLIC RESIN AND FLUORINATED ALKYL ACRYLATE | MITSUBISHI RAYON CO., LTD. (JP) | 1989-08-01 | — | — | US | disclosed |
| EP-0324483-A2 | Method for forming hard coat on polyolefin | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1989-07-19 | — | — | EP | disclosed |
| EP-0321618-A1 | Photosensitive hardenable compositions | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 1989-06-28 | — | — | EP | disclosed |
| EP-0316507-A2 | Graded index lens array | MITSUBISHI RAYON CO., LTD. (JP) | 1989-05-24 | — | — | EP | disclosed |
| EP-0295044-A2 | Photoinitiator and photopolymerizable composition using the same | Hitachi Chemical Co., Ltd. (JP) | 1988-12-14 | — | — | EP | disclosed |
| EP-0294220-A2 | Photopolymerizable composition | Hitachi Chemical Co., Ltd. (JP) | 1988-12-07 | — | — | EP | disclosed |
| US-4737409-A | Heat-resistant resin molded article with excellent abrasion resistance and process for producing the same | MITSUBISHI RAYON CO., LTD. (JP) | 1988-04-12 | — | — | US | disclosed |
| EP-0261505-A2 | Composition easily dyeable with sublimable disperse dye | MITSUBISHI RAYON CO., LTD. (JP) | 1988-03-30 | — | — | EP | disclosed |
| US-4734319-A | TIN OXIDE AND HARDENING RESIN | SUMITOMO CHEMICAL CO., LTD. (JP) | 1988-03-29 | — | — | US | disclosed |
| JP-S634988-A | PRINTABLE POLYOLEFIN SHEET | SEKISUI SEIKEI KOGYO KK | 1988-01-09 | — | — | JP | disclosed |
| US-4704006-A | HIGH REFRACTIVE INDEX, DYEABILITY, SOLVENT RESISTANCE | KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1987-11-03 | — | — | US | disclosed |
| EP-0142921-B1 | HALOGEN-CONTAINING RESIN LENS MATERIAL | KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1987-08-26 | — | — | EP | disclosed |
| US-4689243-A | A POLYDIMETHYLGLUTARIMIDE RESIN COATED WITH A CURED RESIN OF POLY(METH)ACRYLOYLOXY-GROUP CONTAINING MONOMER | MITSUBISHI RAYON CO., LTD. (JP) | 1987-08-25 | — | — | US | disclosed |
| US-4688054-A | Liquid jet recording head | CANON KABUSHIKI KAISHA (JP) | 1987-08-18 | — | — | US | disclosed |
| EP-0232033-A2 | Transparent electrically conductive plastic molded articles | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1987-08-12 | — | — | EP | disclosed |
| EP-0102830-B1 | DELUSTERING COATING COMPOSITION EXCELLENT IN ABRASION RESISTANCE | MITSUBISHI RAYON CO., LTD. (JP) | 1987-05-27 | — | — | EP | disclosed |
| JP-S6274912-A | PHOTOSENSITIVE POLYMER COMPOSITION | DAICEL CHEM IND LTD | 1987-04-06 | — | — | JP | disclosed |
| EP-0208300-A2 | Liquid jet recording head | CANON KABUSHIKI KAISHA (JP) | 1987-01-14 | — | — | EP | disclosed |
| EP-0193643-A2 | Curable resin composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1986-09-10 | — | — | EP | disclosed |
| US-4596616-A | Using thermosetting adhesive comprising a silicon polymer to adhere sheets of cloth to each other, heat pressing, sewing | TOKYO MEN'S APPAREL CORP. (JP) | 1986-06-24 | — | — | US | disclosed |
| EP-0071235-B1 | METHOD AND APPARATUS FOR SURFACE-HARDENING TREATMENT OF SYNTHETIC RESIN SHAPED ARTICLES | MITSUBISHI RAYON CO., LTD. (JP) | 1986-04-02 | — | — | EP | disclosed |
| EP-0071948-B1 | METHOD AND APPARATUS FOR SURFACE-HARDENING TREATMENT OF SYNTHETIC RESIN ARTICLES | MITSUBISHI RAYON CO., LTD. (JP) | 1986-03-26 | — | — | EP | disclosed |
| EP-0174373-A1 | PROCESS FOR PRODUCING HEAT-RESISTANT RESIN MOLDINGS HAVING EXCELLENT ABRASION RESISTANCE | MITSUBISHI RAYON CO., LTD. (JP) | 1986-03-19 | — | — | EP | disclosed |
| US-4564580-A | SAPONIFIED VINYL ACETATE POLYMER REACTED WITH STRYLPYRIDINIUM OR S | KOGYO GIJUTSUIN (JP) | 1986-01-14 | — | — | US | disclosed |
| EP-0164459-A1 | Method of basting in the tailoring of clothes | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1985-12-18 | — | — | EP | disclosed |
| EP-0057906-B1 | COATING COMPOSITION AND PROCESS FOR PREPARING SYNTHETIC RESIN SHAPED ARTICLES BY USING SAME | MITSUBISHI RAYON CO., LTD. (JP) | 1985-05-29 | — | — | EP | disclosed |
| EP-0142921-A1 | Halogen-containing resin lens material | KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1985-05-29 | — | — | EP | disclosed |
| US-4518472-A | COMPOUND CONTAINING AT LEAST THREE (METH)ACRYLOYLOXY GROUPS, PHOTOSENSITIZER, EMULSION-TYPE CROSSLINKED POLYMER | MITSUBISHI RAYON COMPANY LTD. (JP) | 1985-05-21 | — | — | US | disclosed |
| EP-0130804-A2 | Photosensitive resin composition | KOGYO GIJUTSUIN (JP) | 1985-01-09 | — | — | EP | disclosed |
| EP-0035272-B1 | COATING COMPOSITION AND PROCESS FOR PREPARING SYNTHETIC RESIN SHAPED ARTICLES BY USING SAME | MITSUBISHI RAYON CO., LTD. (JP) | 1984-07-25 | — | — | EP | disclosed |
| EP-0109073-A2 | Polymerizable compositions | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1984-05-23 | — | — | EP | disclosed |
| US-4446254-A | ETHYLENE-VINYL ACETATE COPOLYMER | THE FURUKAWA ELECTRIC CO., LTD. (JP) | 1984-05-01 | — | — | US | disclosed |
| EP-0102830-A2 | Delustering coating composition excellent in abrasion resistance | MITSUBISHI RAYON CO., LTD. (JP) | 1984-03-14 | — | — | EP | disclosed |
| EP-0021369-B1 | PROCESS FOR PRODUCING A SHAPED RESIN ARTICLE HAVING A MAT SURFACE | MITSUBISHI RAYON CO., LTD. (JP) | 1984-03-14 | — | — | EP | disclosed |
| US-4436764-A | Method and apparatus for surface-hardening treatment of synthetic resin shaped articles | MITSUBISHI RAYON COMPANY, LTD. (JP) | 1984-03-13 | — | — | US | disclosed |
| US-4411930-A | Method and apparatus for surface-hardening treatment of synthetic resin articles | MITSUBISHI RAYON COMPANY LTD. (JP) | 1983-10-25 | — | — | US | disclosed |
| US-4394494-A | DIURETHANE TETRAACRYLATES AS POLYMERIZABLE MONOMERS | LION CORPORATION (JP) | 1983-07-19 | — | — | US | disclosed |
| US-4388421-A | PRIMERS | LION CORPORATION (JP) | 1983-06-14 | — | — | US | disclosed |
| US-4388345-A | ULTRAVIOLET-INDUCED POLYMERIZATION | MITSUBISHI RAYON COMPANY LTD. (JP) | 1983-06-14 | — | — | US | disclosed |
| US-4383903-A | POLYFUNCTIONAL AROMATIC CYANATE, ACRYLIC COMPOUND, POLYFUNCTIONAL MALEIMIDE, PHOTOINITIATOR | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1983-05-17 | — | — | US | disclosed |
| US-4383052-A | 1-Methacryloxyethane-1,1-diphosphonic acid and its salts and dental adhesive composition containing same | LION CORPORATION (JP) | 1983-05-10 | — | — | US | disclosed |
| EP-0071948-A1 | Method and apparatus for surface-hardening treatment of synthetic resin articles | MITSUBISHI RAYON CO., LTD. (JP) | 1983-02-16 | — | — | EP | disclosed |
| EP-0071235-A2 | Method and apparatus for surface-hardening treatment of synthetic resin shaped articles | MITSUBISHI RAYON CO., LTD. (JP) | 1983-02-09 | — | — | EP | disclosed |
| EP-0012948-B1 | SCRATCH-RESISTANT, DYEABLE COATING COMPOSITIONS FOR SYNTHETIC RESIN ARTICLES | MITSUBISHI RAYON CO., LTD. (JP) | 1983-02-02 | — | — | EP | disclosed |
| EP-0057906-A1 | Coating composition and process for preparing synthetic resin shaped articles by using same | MITSUBISHI RAYON CO., LTD. (JP) | 1982-08-18 | — | — | EP | disclosed |
| US-4339474-A | POLYFUNCTIONAL ACRYLATE, MONO- OR DIACRYLATE, ULTRAVIOLET ABSORBER, PHOTOINITIATOR | MITSUBISHI RAYON COMPANY, LTD. (JP) | 1982-07-13 | — | — | US | disclosed |
| US-4323592-A | WEAR RESISTANT COATING OF IRRADIATED ACRYLIC ESTER POLYMER AND A POLYFUNCTIONAL ACRYLOYLOXY MONOMER | MITSUBISHI RAYON COMPANY, LTD. (JP) | 1982-04-06 | — | — | US | disclosed |
| US-4291097-A | PHOTOPOLYMERIZATION OF AN ACRYLIC ESTER MIXTURE WITH PHOSPHORIC ACID ESTER AND AN ETHANOLAMINE | MITSUBISHI RAYON CO., LTD. (JP) | 1981-09-22 | — | — | US | disclosed |
| EP-0035272-A1 | Coating composition and process for preparing synthetic resin shaped articles by using same | MITSUBISHI RAYON CO., LTD. (JP) | 1981-09-09 | — | — | EP | disclosed |
| US-4273799-A | POLYFUNCTIONAL MONOMERS CONTAINING (METH)ACRYLOYLOXY GROUPS | MITSUBISHI RAYON CO., LTD. (JP) | 1981-06-16 | — | — | US | disclosed |
| US-4273802-A | POLYFUNCTIONAL MONOMERS CONTAINING (METH)ACRYLOYLOXY GROUPS | MITSUBISHI RAYON CO., LTD. (JP) | 1981-06-16 | — | — | US | disclosed |
| EP-0012948-A1 | Scratch-resistant, dyeable coating compositions for synthetic resin articles | MITSUBISHI RAYON CO., LTD. (JP) | 1980-07-09 | — | — | EP | disclosed |
| US-4199421-A | Coating composition and a method for producing a synthetic resin molded product having an abrasion resistant surface | MITSUBISHI RAYON COMPANY, LIMITED (JP) | 1980-04-22 | — | — | US | disclosed |
| JP-H00596630-A | — | — | 0001-01-01 | — | — | JP | disclosed |
| JP-H00596630-A | — | — | 0001-01-01 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (20 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260110823-A1 | OPTICAL ELEMENT, OPTICAL APPARATUS, IMAGING APPARATUS, AND COMPOUND | RAD51, PIEZO1, ZYX | THRB 3328/4885THRA 2981/4885EGFR 2914/4885 |
| US-20220213050-A1 | CHROMENE COMPOUND AND PHOTOCHROMIC OPTICAL ARTICLE | CRY1, CRY2, TRIP13 | THRB 2458/4885THRA 1815/4885EGFR 3238/4885 |
| US-20160213598-A1 | METHOD OF MAKING AN AMINO SILICONE NANOEMULSION | SMURF1, SMURF2, ASNS | THRB 4240/4885THRA 3519/4885EGFR 1071/4885 |
| US-20120203012-A1 | HETEROAROMATIC-CONTAINING COMPOUND, OPTICAL MATERIAL AND OPTICAL ELEMENT | AR, AHR, ARNT | THRB 2636/4885THRA 1494/4885EGFR 1984/4885 |
| US-20210247546-A1 | (METH)ACRYLATE COMPOUND | MTX1, METTL3, MET | THRB 922/4885THRA 194/4885EGFR 740/4885 |
| US-12066593-B2 | (Meth)acrylate compound | MTX1, METTL3, MET | THRB 922/4885THRA 194/4885EGFR 740/4885 |
| US-20070020547-A1 | Mono azo iron complex compound, and charge controlling agent and toner using the same | CA2, ASH2L, SLC40A1 | THRB 3837/4885THRA 2387/4885EGFR 3736/4885 |
| US-20010044555-A1 | Thiol and sulfur-containing O-(meth)acrylate counpounds and use thereof | MSRB3, BHMT2, HBS1L | THRB 2106/4885THRA 1700/4885EGFR 4394/4885 |
| US-10182980-B2 | Method of making an amino silicone nanoemulsion | SMURF1, SMURF2, ASNS | THRB 4240/4885THRA 3519/4885EGFR 1071/4885 |
| US-20120330052-A1 | CONJUGATED AROMATIC COMPOUND, OPTICAL MATERIAL, AND OPTICAL ELEMENT | AHR, AXIN2, NR2E3 | THRB 4568/4885THRA 4010/4885EGFR 1735/4885 |
| US-20150175731-A1 | (METH)ACRYLATE COMPOUND, OPTICAL COMPOSITION, MOLDED ARTICLE, AND OPTICAL ELEMENT | SMYD2, ZYX, MMAB | THRB 2988/4885THRA 2473/4885EGFR 3476/4885 |
| US-20150253621-A1 | OPTICAL FILM, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY USING THE SAME | SSTR3, FFAR3, CNPY3 | THRB 3128/4885THRA 2415/4885EGFR 3133/4885 |
| US-20200190106-A1 | CHROMENE COMPOUND, CURABLE COMPOSITION COMPRISING THE COMPOUND, AND OPTICAL ARTICLE INCLUDING A CURED BODY OF THE CURABLE COMPOSITION | INCENP, SMCHD1, ILK | THRB 437/4885THRA 345/4885EGFR 3045/4885 |
| US-20060269506-A1 | Personal care applications of emulsions containing elastomeric silanes and siloxanes with nitrogen atoms | CUTA, POLR1C, ITCH | THRB 3271/4885THRA 2838/4885EGFR 503/4885 |
| US-20160376462-A1 | (METH)ACRYLIC RESIN COMPOSITION, FILM, POLARIZING PLATE PROTECTIVE FILM, POLARIZING PLATE, AND LIQUID CRYSTAL DISPLAY DEVICE | YTHDC1, ARID2, YTHDF1 | THRB 1930/4885THRA 660/4885EGFR 4076/4885 |
| US-20220226198-A1 | REDOX CURING DENTAL COMPOSITION | CBR1, CBR3, NOX1 | THRB 3101/4885THRA 2487/4885EGFR 4566/4885 |
| US-12529822-B2 | Optical element, optical apparatus, imaging apparatus, and compound | RAD51, SEM1, PSMA3 | THRB 3666/4885THRA 3221/4885EGFR 3919/4885 |
| US-12552956-B2 | Photopolymerizable type dental surface coating composition | CDH1, DCLRE1A, ITGA1 | THRB 1415/4885THRA 601/4885EGFR 2317/4885 |
| US-20110257146-A1 | Method of Treating Kcnq Related Disorders Using Organozinc Compounds | KCNQ3, KCNQ1, KCNQ5 | THRB 2759/4885THRA 2913/4885EGFR 4068/4885 |
| US-20110288330-A1 | OPTICAL ELEMENT COMPOUND, OPTICAL MATERIAL, AND OPTICAL ELEMENT | CENPE, AXIN2, CCNE2 | THRB 4553/4885THRA 4040/4885EGFR 2309/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.