Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AKR1C3 | P42330 | 3/20 | 0.52 |
| ▸ | MYC | P01106 | 1/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.45 |
| ▸ | ELANE | P08246 | 2/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | CDC25B | P30305 | 2/20 | 0.42 |
| ▸ | CDC25A | P30304 | 1/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.42 |
| ▸ | ATM | Q13315 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.41 |
| ▸ | GAA | P10253 | 2/20 | 0.41 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.41 |
| ▸ | CYP2C8 | P10632 | 1/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | USP2 | O75604 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28397888 | 0.83 | ELANE (0.43) | AKR1C3MYCKDM4EELANETDP1 | |
| SCHEMBL4849045 | 0.81 | AKR1C3 (0.44) | AKR1C3KDM4EELANETDP1HSD17B10 | |
| SCHEMBL8881467 | 0.80 | GLRA3 (0.47) | AKR1C3TDP1CDC25BCDC25AHSD17B10 | |
| SCHEMBL809324 | 0.80 | AKR1C3 (0.72) | AKR1C3MYCKDM4ECDC25BCDC25A | |
| SCHEMBL28345543 | 0.79 | AKR1C3 (0.55) | AKR1C3MYCKDM4EELANETDP1 | |
| SCHEMBL6057040 | 0.78 | AKR1C3 (0.69) | AKR1C3MYCKDM4ECDC25BCDC25A | |
| SCHEMBL6056938 | 0.78 | AKR1C3 (0.69) | AKR1C3MYCKDM4ECDC25BCDC25A | |
| SCHEMBL8713885 | 0.78 | ALDH1A1 (0.52) | AKR1C3ELANETDP1ATMALDH1A1 | |
| SCHEMBL28787250 | 0.78 | AKR1C3 (0.44) | AKR1C3KDM4EELANETDP1HSD17B10 | |
| SCHEMBL11227044 | 0.77 | AKR1C3 (0.57) | AKR1C3MYCKDM4ECDC25BCDC25A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111886545-B | Photocurable/thermosetting resin composition, dry film, cured product, and printed wiring board | 太阳油墨制造株式会社 | 2024-07-05 | — | — | CN | disclosed |
| CN-118265757-A | Pigment dispersion composition, photosensitive coloring composition, and color filter | 株式会社力森诺科 | 2024-06-28 | — | — | CN | disclosed |
| CN-118259540-A | Alkali-developable resin composition, dry film thereof, cured product thereof, and printed wiring board using the same | 太阳油墨（苏州）有限公司 | 2024-06-28 | — | — | CN | disclosed |
| CN-118259548-A | Photosensitive thermosetting developable resin composition, dry film thereof, cured product thereof, and printed wiring board using the same | 太阳油墨（苏州）有限公司 | 2024-06-28 | — | — | CN | disclosed |
| CN-118259549-A | Alkali-developable resin composition, dry film thereof, cured product thereof, and printed wiring board using the same | 太阳油墨（苏州）有限公司 | 2024-06-28 | — | — | CN | disclosed |
| CN-118251432-A | Holographic recording medium, composition for forming photopolymer layer, and optical element | 株式会社LG化学 | 2024-06-25 | — | — | CN | disclosed |
| CN-118235092-A | Polycyclic aromatic hydrocarbon-based photocurable resin composition | 日产化学株式会社 | 2024-06-21 | — | — | CN | disclosed |
| CN-118235090-A | Photosensitive resin composition and color filter | 株式会社力森诺科 | 2024-06-21 | — | — | CN | disclosed |
| CN-118055958-A | Resin composition and lining material for repairing pipe | 株式会社力森诺科 | 2024-05-17 | — | — | CN | disclosed |
| CN-117980368-A | Resin precursor, resin composition, and resin cured film | 株式会社力森诺科 | 2024-05-03 | — | — | CN | disclosed |
| US-20020110740-A1 | Photosensitive composition for volume hologram recording and photosensitive medium for volume hologram recording | DAI NIPPON PRINTING CO., LTD. (JP) | 2002-08-15 | — | — | US | disclosed |
| EP-1231511-A2 | Photosensitive composition for volume hologram recording and photosensitive medium for volume hologram recording | DAI NIPPON PRINTING CO., LTD. (JP) | 2002-08-14 | — | — | EP | disclosed |
| US-6336720-B1 | INK INCLUDING BINDER WHICH CONTAINS HOT MELT COMPOSITION, COLORANT DISPERSED IN BINDER, AND PHOTOCURING COMPOSITION, WHEREIN BINDER GRAINS ARE DISPERSED IN CURING COMPOSITION AND INK SURFACE IS COVERED WITH PHOTOCURING COMPOSITION WHEN FIXED | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2002-01-08 | — | — | US | disclosed |
| US-6303259-B1 | FOR COLOR DUPLICATORS, COLOR PRINTERS, ETC | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2001-10-16 | — | — | US | disclosed |
| US-6242149-B1 | LIGHT SENSITIVE ELEMENTS CURED WITH RADIATION, RADICAL POLYMERIZATION, PHOTOPOLYMERIZATION, ENCAPSULATION | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2001-06-05 | — | — | US | disclosed |
| US-6077879-A | RADICALLY POLYMERIZABLE CURABLE RESIN OBTAINED BY REACTING POLYEPOXIDE WITH PHENOL COMPOUND HAVING ALCOHOLIC HYDROXYL GROUP AND UNSATURATED MONOBASIC ACID | NIPPON SHOKUBAI CO., LTD. (JP) | 2000-06-20 | — | — | US | disclosed |
| EP-0762208-B1 | Light sensitive composition | KONISHIROKU PHOTO IND (JP) | 2000-04-12 | — | — | EP | disclosed |
| EP-0924569-A1 | Fast-curing photosensitive composition and recording sheet | Brother Kogyo Kabushiki Kaisha (JP) | 1999-06-23 | — | — | EP | disclosed |
| US-5773194-A | PHOTOSENSITIVITY; DURABILITY | KONICA CORPORATION (JP) | 1998-06-30 | — | — | US | disclosed |
| EP-0762208-A2 | Light sensitive composition, presensitized lithographic printing plate and image forming method employing the printing plate | KONICA CORPORATION (JP) | 1997-03-12 | — | — | EP | disclosed |