SCHEMBL20344253

SCHEMBL20344253

CS(CC(=O)c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 9/20 0.54
RECQL P46063 2/20 0.54
KMT2A Q03164 4/20 0.50
MEN1 O00255 3/20 0.50
MAPK1 P28482 2/20 0.50
ALDH1A1 P00352 2/20 0.50
NPC1 O15118 2/20 0.50
RAB9A P51151 2/20 0.50
MAPT P10636 2/20 0.50
TDP1 Q9NUW8 2/20 0.50
KDM4E B2RXH2 1/20 0.50
CYP3A4 P08684 1/20 0.50
HPGD P15428 1/20 0.50
ALOX15 P16050 1/20 0.50
CES1 P23141 1/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
GSK3B P49841 2/20 0.47
TRPA1 O75762 1/20 0.47
HIF1A Q16665 1/20 0.47
PTPN1 P18031 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15299031 0.81 KMT2A (0.56) HSD11B1RECQLKMT2AMEN1MAPK1
SCHEMBL1699941 0.79 RECQL (0.58) HSD11B1RECQLKMT2AMEN1MAPK1
SCHEMBL11145720 0.79 KMT2A (0.54) HSD11B1RECQLKMT2AMEN1MAPK1
SCHEMBL544367 0.79 MAPK1 (0.54) HSD11B1RECQLKMT2AMEN1MAPK1
SCHEMBL452973 0.78 HSD11B1 (0.77) HSD11B1RECQLKMT2AMEN1MAPK1
Bromide SCHEMBL11059116 0.78 KMT2A (0.52) HSD11B1RECQLKMT2AMEN1MAPK1
SCHEMBL27903507 0.78 GSK3B (0.54) HSD11B1RECQLKMT2AMEN1MAPK1
Hydrochloric Acid SCHEMBL10937168 0.78 KMT2A (0.52) HSD11B1RECQLKMT2AMEN1MAPK1
Acetic Acid SCHEMBL28778736 0.76 RECQL (0.54) HSD11B1RECQLKMT2AMEN1MAPK1
Hydrochloric Acid SCHEMBL11143205 0.76 HSD11B1 (0.50) HSD11B1RECQLKMT2AMEN1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230350296-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-02 US disclosed
EP-1657286-B1 Radiation curable ink jet ink, comprising a polymerisation initiation sensitising dye FUJIFILM CORP (JP) 2018-07-04 EP disclosed