SCHEMBL544367

SCHEMBL544367

O=C(CS(c1ccccc1)(c1ccccc1)c1ccccc1)c1ccccc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 2/20 0.54
MAPT P10636 2/20 0.54
TDP1 Q9NUW8 2/20 0.54
KDM4E B2RXH2 1/20 0.54
MEN1 O00255 1/20 0.54
CYP3A4 P08684 1/20 0.54
HPGD P15428 1/20 0.54
ALOX15 P16050 1/20 0.54
CES1 P23141 1/20 0.54
KMT2A Q03164 1/20 0.54
SMN1; SMN2 Q16637 1/20 0.54
HSD11B1 P28845 10/20 0.53
RECQL P46063 2/20 0.53
GSK3B P49841 2/20 0.50
ALDH1A1 P00352 2/20 0.50
PTPN1 P18031 2/20 0.50
TRPA1 O75762 1/20 0.50
HIF1A Q16665 1/20 0.50
NPC1 O15118 1/20 0.49
RAB9A P51151 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15571582 0.82 MMP2 (0.48) MAPK1MAPTTDP1KDM4EMEN1
SCHEMBL28194844 0.81 RAB9A (0.47) MAPK1MAPTTDP1KDM4EMEN1
SCHEMBL452973 0.81 HSD11B1 (0.77) MAPK1MAPTKDM4EMEN1HPGD
SCHEMBL7788633 0.79 MMP2 (0.50) KMT2ASMN1; SMN2HSD11B1TSHR
SCHEMBL20344253 0.79 HSD11B1 (0.54) MAPK1MAPTTDP1KDM4EMEN1
SCHEMBL29609513 0.79 HSD11B1 (0.74) MAPK1MAPTKDM4EMEN1HPGD
Hydrochloric Acid SCHEMBL11143205 0.79 HSD11B1 (0.50) MAPK1MAPTTDP1KDM4EMEN1
Bromide SCHEMBL11064873 0.79 HSD11B1 (0.50) MAPK1MAPTTDP1KDM4EMEN1
SCHEMBL29236675 0.79 HSD11B1 (0.73) MAPK1KDM4EMEN1HPGDKMT2A
SCHEMBL15572342 0.77 MMP2 (0.48) KMT2ASMN1; SMN2HSD11B1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8119311-B2 Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor FUJIFILM CORPORATION (JP) 2012-02-21 US disclosed
US-8110324-B2 Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor FUJIFILM CORPORATION (JP) 2012-02-07 US disclosed
US-20090246651-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIGHT-SHIELDING COLOR FILTER AND PRODUCTION PROCESS THEREFOR, AND IMAGE SENSOR FUJIFILM CORPORATION (JP) 2009-10-01 US disclosed
US-20090246650-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIGHT-SHIELDING COLOR FILTER AND PRODUCTION PROCESS THEREFOR, AND IMAGE SENSOR FUJIFILM CORPORATION (JP) 2009-10-01 US disclosed
EP-2105792-A1 Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor FUJIFILM Corporation (JP) 2009-09-30 EP disclosed