SCHEMBL20420641

SCHEMBL20420641

CCCCC(C)Nc1cc(C(C)(C)c2ccc(O)c(NC(C)CCCC)c2)ccc1O

nearest known ligand 0.48

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
RORC P51449 1/20 0.48
ESR1 P03372 7/20 0.42
ESR2 Q92731 4/20 0.42
KLF10 Q13118 1/20 0.41
IDO1 P14902 1/20 0.38
GAA P10253 2/20 0.37
XBP1 P17861 1/20 0.37
ATM Q13315 1/20 0.37
NPSR1 Q6W5P4 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
ADRB2 P07550 4/20 0.37
ALOX15 P16050 1/20 0.36
ALOX12 P18054 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.35
AR P10275 1/20 0.34
CACNA1B Q00975 1/20 0.34
MLYCD O95822 1/20 0.34
HSP90AA1 P07900 1/20 0.33
HSP90AB1 P08238 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29441553 1.00 RORC (0.48) RORCESR1ESR2KLF10IDO1
SCHEMBL29441552 0.85 RORC (0.57) RORCESR1ESR2KLF10GAA
SCHEMBL4213149 0.85 RORC (0.57) RORCESR1ESR2KLF10GAA
SCHEMBL31419841 0.81 RORC (0.47) RORCESR1ESR2KLF10GAA
SCHEMBL21816946 0.78 CNR1 (0.47) IDO1ADRB2
SCHEMBL31419840 0.78 ESR1 (0.52) RORCESR1ESR2KLF10IDO1
SCHEMBL29441554 0.78 ESR1 (0.52) RORCESR1ESR2KLF10IDO1
SCHEMBL4219878 0.78 ESR1 (0.52) RORCESR1ESR2KLF10IDO1
SCHEMBL28535622 0.77 ADRB2 (0.40) IDO1GAAADRB2ALOX15
SCHEMBL4229486 0.75 IDO1 (0.42) IDO1L3MBTL1ADRB2HSP90AA1HSP90AB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12629792-B2 Polishing pad and method for producing polished product FUJIBO HOLDINGS, INC. (JP) 2026-05-19 US disclosed
US-12496680-B2 Polishing pad and method for manufacturing polished product FUJIBO HOLDINGS, INC. (JP) 2025-12-16 US disclosed
US-12479064-B2 Polishing pad FUJIBO HOLDINGS, INC. (JP) 2025-11-25 US disclosed
WO-2025070354-A1 POLISHING PAD AND POLISHING METHOD 富士紡ホールディングス株式会社 2025-04-03 WO disclosed
EP-3441185-B1 POLISHING PAD AND METHOD FOR PRODUCING THE SAME, AND METHOD FOR PRODUCING A POLISHED PRODUCT FUJIBO HOLDINGS INC (JP) 2024-07-31 EP disclosed
US-20240227118-A9 POLISHING PAD AND METHOD FOR MANUFACTURING POLISHING PAD FUJIBO HOLDINGS, INC. (JP) 2024-07-11 US disclosed
US-20240149389-A1 POLISHING PAD AND METHOD FOR PRODUCING POLISHED PRODUCT FUJIBO HOLDINGS, INC. (JP) 2024-05-09 US disclosed
US-20240149390-A1 POLISHING PAD AND METHOD FOR MANUFACTURING POLISHING PAD FUJIBO HOLDINGS, INC. (JP) 2024-05-09 US disclosed
US-20240139903-A1 POLISHING PAD AND METHOD FOR MANUFACTURING POLISHING PAD FUJIBO HOLDINGS, INC. (JP) 2024-05-02 US disclosed
US-20240131653-A1 POLISHING PAD AND METHOD FOR MANUFACTURING POLISHING PAD FUJIBO HOLDINGS, INC. (JP) 2024-04-25 US disclosed
US-20210347006-A1 POLISHING PAD AND METHOD FOR PRODUCING POLISHED PRODUCT FUJIBO HOLDINGS, INC. (JP) 2021-11-11 US disclosed
EP-3858547-A1 POLISHING PAD AND METHOD FOR PRODUCING POLISHED ARTICLE Fujibo Holdings, Inc. (JP) 2021-08-04 EP disclosed
CN-108349062-B Polishing material, method for producing same, and method for producing polished article 富士纺控股株式会社 2021-04-09 CN disclosed
WO-2021065619-A1 POLISHING PAD AND METHOD FOR MANUFACTURING POLISHED PRODUCT 富士紡ホールディングス株式会社 2021-04-08 WO disclosed
CN-112512747-A Polishing pad and method for manufacturing polished article 富士纺控股株式会社 2021-03-16 CN disclosed
CN-109195745-B Polishing pad, method for producing same, and method for producing polished article 富士纺控股株式会社 2021-02-05 CN disclosed
US-20200331115-A1 POLISHING PAD AND METHOD FOR PRODUCING THE SAME, AND METHOD FOR PRODUCING POLISHED PRODUCT FUJIBO HOLDINGS, INC. (JP) 2020-10-22 US disclosed
EP-3441185-A1 POLISHING PAD AND METHOD FOR MANUFACTURING SAME, AND METHOD FOR MANUFACTURING ABRASIVE Fujibo Holdings, Inc. (JP) 2019-02-13 EP disclosed
US-20180311782-A1 LAPPING MATERIAL AND METHOD FOR PRODUCING THE SAME, AND METHOD FOR PRODUCING POLISHED PRODUCT FUJIBO HOLDINGS, INC. (JP) 2018-11-01 US disclosed
EP-3354406-A1 WRAPPING MATERIAL AND METHOD FOR MANUFACTURING SAME, AND METHOD FOR MANUFACTURING ABRASIVE Fujibo Holdings, Inc. (JP) 2018-08-01 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12629792-B2 Polishing pad and method for producing polished product PUF60, SELP, PDCD10 RORC 4860/4885ESR1 2834/4885ESR2 2765/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.