SCHEMBL28535622

SCHEMBL28535622

CCCCC(C)Nc1cc(C(CC)c2ccc(O)c(NC(C)CCCC)c2)ccc1O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 8/20 0.40
GAA P10253 3/20 0.38
LMNA P02545 2/20 0.38
ALDH1A1 P00352 2/20 0.38
IDO1 P14902 1/20 0.38
MEN1 O00255 1/20 0.38
TP53 P04637 1/20 0.38
MAPT P10636 1/20 0.38
MAPK1 P28482 1/20 0.38
KMT2A Q03164 1/20 0.38
BCHE P06276 2/20 0.36
TYR P14679 2/20 0.36
ACHE P22303 2/20 0.36
ADRB3 P13945 1/20 0.36
HTT P42858 1/20 0.36
USP2 O75604 1/20 0.36
PKM P14618 1/20 0.36
HPGD P15428 1/20 0.36
ALOX15 P16050 1/20 0.36
HSD17B10 Q99714 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28539633 0.86 ALDH1A1 (0.41) ADRB2GAALMNAALDH1A1MEN1
SCHEMBL28533528 0.82 ADRB2 (0.43) ADRB2GAALMNAALDH1A1IDO1
SCHEMBL21816946 0.78 CNR1 (0.47) ADRB2LMNAIDO1MAPTMAPK1
SCHEMBL29441553 0.77 RORC (0.48) ADRB2GAAIDO1ALOX15
SCHEMBL20420641 0.77 RORC (0.48) ADRB2GAAIDO1ALOX15
SCHEMBL4229486 0.75 IDO1 (0.42) ADRB2LMNAIDO1
SCHEMBL6246037 0.69 TYR (0.47) GAAALDH1A1MEN1TP53MAPT
SCHEMBL3395176 0.69 IDO1 (0.47) ADRB2IDO1MAPK1
SCHEMBL3934205 0.69 TDP1 (0.56) ADRB2LMNAALDH1A1MEN1MAPT
SCHEMBL11405356 0.68 IDO1 (0.49) ADRB2GAAALDH1A1IDO1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112512747-B Polishing pad and method for producing polished product 富士纺控股株式会社 2024-04-05 CN disclosed
CN-116917081-A Polishing pad and method for producing polished product 富士纺控股株式会社 2023-10-20 CN disclosed
CN-116897097-A Polishing pad and method for manufacturing polishing pad 富士纺控股株式会社 2023-10-17 CN disclosed
CN-116887946-A Polishing pad and method for manufacturing polishing pad 富士纺控股株式会社 2023-10-13 CN disclosed
CN-116867606-A Polishing pad and method for manufacturing polishing pad 富士纺控股株式会社 2023-10-10 CN disclosed
CN-116568734-A Polishing pad, method for producing same, method for producing polished article, and polishing pad, method for producing same, and method for producing polished article 富士纺控股株式会社 2023-08-08 CN disclosed
CN-116348245-A Polishing pad and method for producing polished product 富士纺控股株式会社 2023-06-27 CN disclosed
CN-116323100-A Polishing pad 富士纺控股株式会社 2023-06-23 CN disclosed
CN-108349062-B Polishing material, method for producing same, and method for producing polished article 富士纺控股株式会社 2021-04-09 CN disclosed
CN-109195745-B Polishing pad, method for producing same, and method for producing polished article 富士纺控股株式会社 2021-02-05 CN disclosed