Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.46 |
| ▸ | GLA | P06280 | 2/20 | 0.46 |
| ▸ | ELANE | P08246 | 6/20 | 0.44 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.44 |
| ▸ | GMNN | O75496 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.44 |
| ▸ | CTSG | P08311 | 1/20 | 0.44 |
| ▸ | CTSA | P10619 | 1/20 | 0.44 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.44 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.44 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.44 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13570169 | 0.92 | TDP1 (0.42) | TDP1L3MBTL1ALDH1A1GLAELANE | |
| SCHEMBL6720013 | 0.92 | CES1 (0.43) | TDP1L3MBTL1ALDH1A1GLAELANE | |
| SCHEMBL150550 | 0.88 | TDP1 (0.45) | TDP1L3MBTL1ALDH1A1GLAELANE | |
| SCHEMBL20963057 | 0.88 | ELANE (0.54) | L3MBTL1ALDH1A1GLAELANEMAPT | |
| SCHEMBL15119580 | 0.86 | CES1 (0.42) | TDP1L3MBTL1ALDH1A1GLAELANE | |
| SCHEMBL21173973 | 0.85 | ELANE (0.52) | L3MBTL1ALDH1A1GLAELANEMAPT | |
| SCHEMBL1279011 | 0.83 | L3MBTL1 (0.59) | TDP1L3MBTL1ALDH1A1GLAELANE | |
| SCHEMBL17192485 | 0.83 | CYP3A4 (0.44) | TDP1L3MBTL1ALDH1A1GLAELANE | |
| SCHEMBL24891350 | 0.81 | ELANE (0.61) | TDP1L3MBTL1ALDH1A1GLAELANE | |
| SCHEMBL5574162 | 0.80 | L3MBTL1 (0.41) | TDP1L3MBTL1ALDH1A1GLAELANE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2021125308-A1 | RELEASE LAYER FORMING COMPOSITION | 日産化学株式会社 | 2021-06-24 | — | — | WO | disclosed |
| US-20210189126-A1 | DETACHABLE LAYER-FORMING COMPOSITION AND DETACHABLE LAYER | NISSAN CHEMICAL CORPORATION (JP) | 2021-06-24 | — | — | US | disclosed |
| US-20200317963-A1 | DETACHABLE LAYER-FORMING COMPOSITION AND DETACHABLE LAYER | NISSAN CHEMICAL CORPORATION (JP) | 2020-10-08 | — | — | US | disclosed |
| US-20200317915-A1 | DETACHABLE LAYER-FORMING COMPOSITION AND DETACHABLE LAYER | NISSAN CHEMICAL CORPORATION (JP) | 2020-10-08 | — | — | US | disclosed |
| EP-3467040-A1 | DETACHABLE LAYER-FORMING COMPOSITION AND DETACHABLE LAYER | Nissan Chemical Corporation (JP) | 2019-04-10 | — | — | EP | disclosed |
| WO-2017141734-A1 | PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM, CURED PRODUCT, PRINTED CIRCUIT BOARD, AND PHOTOBASE GENERATOR | 太陽ホールディングス株式会社 | 2017-08-24 | — | — | WO | disclosed |
| WO-2015019802-A1 | PHOTOSENSITIVE RESIN COMPOSITION, RELIEF PATTERN FILM THEREOF, METHOD FOR PRODUCING RELIEF PATTERN FILM, ELECTRONIC COMPONENT OR OPTICAL PRODUCT INCLUDING RELIEF PATTERN FILM, AND ADHESIVE INCLUDING PHOTOSENSITIVE RESIN COMPOSITION | 太陽ホールディングス株式会社 (JP) | 2015-02-12 | — | — | WO | disclosed |
| US-8088882-B2 | Polymer precursor, high transparency polyimide precursor, polymer compound, resin composition and article using thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| US-20070100129-A1 | Low expansion polyimide, resin composition and article using thereof | DAI NIPPON PRINTING CO., LTD (JP) | 2007-05-03 | — | — | US | disclosed |
| US-20070100129-A1 | Low expansion polyimide, resin composition and article using thereof | DAI NIPPON PRINTING CO., LTD (JP) | 2007-05-03 | — | — | US | disclosed |
| US-20060229384-A1 | Polymer precursor, high transparency polyimide precursor, polymer compound, resin composition and article using thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2006-10-12 | — | — | US | disclosed |