SCHEMBL20451248

SCHEMBL20451248

CCN(CC)[SiH](O[SiH](C)C)O[SiH](C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20451334 0.74
SCHEMBL1182508 0.69
SCHEMBL19985076 0.69
SCHEMBL1184495 0.67
SCHEMBL20451324 0.65
SCHEMBL433963 0.63
SCHEMBL329235 0.63
SCHEMBL16669068 0.63
SCHEMBL20451320 0.63
SCHEMBL27822717 0.63 LMNA (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230167549-A1 ORGANOAMINO-POLISILOXANES FOR DEPOSITION OF SILICON-CONTAINING FILMS VERSUM MAT US LLC (US) 2023-06-01 US claimed
US-11591692-B2 Organoamino-polysiloxanes for deposition of silicon-containing films VERSUM MATERIALS US, LLC (US) 2023-02-28 US claimed
WO-2018148201-A1 ORGANOAMINO-POLYSILOXANES FOR DEPOSITION OF SILICON-CONTAINING FILMS VERSUM MATERIALS US, LLC (US) 2018-08-16 WO claimed
US-20180223428-A1 Organoamino-Polysiloxanes For Deposition Of Silicon-Containing Films VERSUM MATERIALS US, LLC (US) 2018-08-09 US claimed
US-20230167549-A1 ORGANOAMINO-POLISILOXANES FOR DEPOSITION OF SILICON-CONTAINING FILMS VERSUM MAT US LLC (US) 2023-06-01 US disclosed
US-20180223428-A1 Organoamino-Polysiloxanes For Deposition Of Silicon-Containing Films VERSUM MATERIALS US, LLC (US) 2018-08-09 US disclosed