Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.58 |
| ▸ | CA12 | O43570 | 1/20 | 0.55 |
| ▸ | CA1 | P00915 | 1/20 | 0.55 |
| ▸ | CA2 | P00918 | 1/20 | 0.55 |
| ▸ | CA9 | Q16790 | 1/20 | 0.55 |
| ▸ | MEN1 | O00255 | 3/20 | 0.54 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.54 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.54 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | ATM | Q13315 | 1/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
| ▸ | BPTF | Q12830 | 1/20 | 0.40 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.39 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.39 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.39 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.39 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29254327 | 0.84 | ALDH1A1 (0.59) | ALDH1A1CA12CA1CA2CA9 | |
| SCHEMBL7305803 | 0.83 | ALDH1A1 (0.58) | ALDH1A1CA12CA1CA2CA9 | |
| SCHEMBL12406395 | 0.81 | ALDH1A1 (0.61) | ALDH1A1CA12CA1CA2CA9 | |
| SCHEMBL6474189 | 0.81 | ALDH1A1 (0.56) | ALDH1A1CA12CA1CA2CA9 | |
| SCHEMBL16451613 | 0.81 | ALDH1A1 (0.56) | ALDH1A1CA12CA1CA2CA9 | |
| SCHEMBL6474186 | 0.81 | ALDH1A1 (0.56) | ALDH1A1CA12CA1CA2CA9 | |
| SCHEMBL24361098 | 0.79 | ALDH1A1 (0.54) | ALDH1A1CA12CA1CA2CA9 | |
| SCHEMBL15371097 | 0.79 | ALDH1A1 (0.54) | ALDH1A1CA12CA1CA2CA9 | |
| SCHEMBL3213948 | 0.78 | ALDH1A1 (0.53) | ALDH1A1CA12CA1CA2CA9 | |
| SCHEMBL12705028 | 0.78 | ALDH1A1 (0.57) | ALDH1A1CA12CA1CA2CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024105962-A1 | RADIOACTIVE-RAY-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2024-05-23 | — | — | WO | disclosed |
| WO-2024106020-A1 | RADIATION SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2024-05-23 | — | — | WO | disclosed |
| US-20240152048-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2024-05-09 | — | — | US | disclosed |
| WO-2024090041-A1 | RADIOACTIVE-RAY-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2024-05-02 | — | — | WO | disclosed |
| WO-2024057751-A1 | RADIOACTIVE-RAY-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2024-03-21 | — | — | WO | disclosed |
| US-20230384676-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2023-11-30 | — | — | US | disclosed |
| WO-2023223624-A1 | RADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RADIATION SENSITIVE ACID GENERATOR, AND ACID DIFFUSION CONTROL AGENT | JSR株式会社 | 2023-11-23 | — | — | WO | disclosed |
| WO-2023203827-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-10-26 | — | — | WO | disclosed |
| US-20230341772-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2023-10-26 | — | — | US | disclosed |
| WO-2023199881-A1 | METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND RESIST UNDERLAYER FILM FORMING COMPOSITION | JSR株式会社 | 2023-10-19 | — | — | WO | disclosed |
| US-11747725-B2 | Radiation-sensitive resin composition and method for forming resist pattern | JSR CORPORATION (JP) | 2023-09-05 | — | — | US | disclosed |
| US-20230273519-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2023-08-31 | — | — | US | disclosed |
| US-11709428-B2 | Radiation-sensitive resin composition, method for forming pattern, and method for producing monomeric compound | JSR CORPORATION (JP) | 2023-07-25 | — | — | US | disclosed |
| US-20230104260-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2023-04-06 | — | — | US | disclosed |
| WO-2023032973-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-03-09 | — | — | WO | disclosed |
| US-20220299875-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND METHOD FOR FORMING PATTERN | JSR CORPORATION (JP) | 2022-09-22 | — | — | US | disclosed |
| US-20210284773-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING MONOMERIC COMPOUND | JSR CORPORATION (JP) | 2021-09-16 | — | — | US | disclosed |
| US-20200401043-A1 | PATTERN FORMING METHOD AND DEVELOPER | JSR CORPORATION (JP) | 2020-12-24 | — | — | US | disclosed |
| WO-2020241277-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND COMPOUND | JSR株式会社 | 2020-12-03 | — | — | WO | disclosed |
| US-20180299773-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2018-10-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230341772-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | RER1, XRCC5, F12 | ALDH1A1 2075/4885CA12 1254/4885CA1 251/4885 |
| US-20240152048-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | RER1, RAD51, TAS1R1 | ALDH1A1 1003/4885CA12 2378/4885CA1 366/4885 |
| US-11747725-B2 | Radiation-sensitive resin composition and method for forming resist pattern | RER1, AFF1, RAD51 | ALDH1A1 2008/4885CA12 1235/4885CA1 456/4885 |
| US-20230384676-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, POLYMER, AND COMPOUND | RER1, RFT1, RAD51 | ALDH1A1 347/4885CA12 2313/4885CA1 471/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.