Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.58 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.58 |
| ▸ | LMNA | P02545 | 2/20 | 0.58 |
| ▸ | HTT | P42858 | 1/20 | 0.58 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.58 |
| ▸ | GAA | P10253 | 1/20 | 0.54 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.54 |
| ▸ | ENPP1 | P22413 | 4/20 | 0.50 |
| ▸ | ENPP3 | O14638 | 3/20 | 0.50 |
| ▸ | ENPP2 | Q13822 | 2/20 | 0.50 |
| ▸ | SNCA | P37840 | 1/20 | 0.47 |
| ▸ | MEN1 | O00255 | 2/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | CA1 | P00915 | 2/20 | 0.46 |
| ▸ | CA2 | P00918 | 2/20 | 0.46 |
| ▸ | CA9 | Q16790 | 2/20 | 0.46 |
| ▸ | MAOB | P27338 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6746327 | 0.92 | L3MBTL1 (0.65) | L3MBTL1TDP1LMNAHTTSMN1; SMN2 | |
| SCHEMBL2473745 | 0.86 | L3MBTL1 (0.60) | L3MBTL1TDP1LMNAHTTSMN1; SMN2 | |
| SCHEMBL28296929 | 0.86 | L3MBTL1 (0.75) | L3MBTL1TDP1LMNAHTTSMN1; SMN2 | |
| SCHEMBL21471154 | 0.86 | L3MBTL1 (0.54) | L3MBTL1TDP1LMNAHTTSMN1; SMN2 | |
| SCHEMBL2064679 | 0.85 | L3MBTL1 (0.59) | L3MBTL1TDP1LMNAHTTSMN1; SMN2 | |
| SCHEMBL22558337 | 0.83 | L3MBTL1 (0.62) | L3MBTL1TDP1LMNAHTTSMN1; SMN2 | |
| SCHEMBL2065834 | 0.82 | TDP1 (0.65) | L3MBTL1TDP1LMNAHTTSMN1; SMN2 | |
| SCHEMBL6742808 | 0.82 | SMN1; SMN2 (0.60) | L3MBTL1TDP1LMNAHTTSMN1; SMN2 | |
| SCHEMBL304050 | 0.82 | SNCA (0.65) | L3MBTL1LMNAHTTSMN1; SMN2SNCA | |
| SCHEMBL29857297 | 0.82 | SNCA (0.65) | L3MBTL1LMNAHTTSMN1; SMN2SNCA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6440634-B1 | MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-08-27 | — | — | US | claimed |
| US-8148053-B2 | DNA sequenceing, biochemical immobilization, and genetic diagnosis; forming monomolecular film using (alkoxyalkoxy)alkylsilane(triol and/or halide) such as 10-(methoxymethoxy)dodecyltrimethoxysilane which forms hydroxyl groups when exposed to acid; forming polysulfonates; radiation with high energy beams | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-04-03 | — | — | US | disclosed |
| US-7494760-B2 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-24 | — | — | US | disclosed |
| US-20080233309-A1 | Method for manufacturing substrate for making microarray | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-25 | — | — | US | disclosed |
| US-20070287096-A1 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-12-13 | — | — | US | disclosed |
| EP-1077391-B1 | Onium salts, photoacid generators for resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2006-09-27 | — | — | EP | disclosed |
| US-6916591-B2 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-07-12 | — | — | US | disclosed |
| US-20030215738-A1 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-11-20 | — | — | US | disclosed |
| US-6440634-B1 | MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-08-27 | — | — | US | disclosed |
| EP-1077391-A1 | Onium salts, photoacid generators for resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-02-21 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030215738-A1 | Photoacid generators, chemically amplified resist compositions, and patterning process | CCNH, PAH, POLH | L3MBTL1 3023/4885TDP1 2871/4885LMNA 2395/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.