SCHEMBL2065760

SCHEMBL2065760

CCc1ccc2nc(Cl)c(S(N)(=O)=O)n2n1

nearest known ligand 0.35

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TNF P01375 1/20 0.35
AKT1 P31749 1/20 0.34
AKT2 P31751 1/20 0.34
PDE10A Q9Y233 1/20 0.33
CA2 P00918 2/20 0.32
CA12 O43570 1/20 0.32
CA1 P00915 1/20 0.32
CA9 Q16790 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2065746 0.89 PDE10A (0.37) TNFPDE10ACA2CA12CA1
SCHEMBL2067943 0.87 PDE10A (0.34) TNFAKT1AKT2PDE10A
SCHEMBL2066200 0.87 CA2 (0.36) TNFPDE10ACA2CA12CA1
SCHEMBL2066427 0.85 TLR7 (0.34) TNFPDE10ACA2CA1
SCHEMBL3169997 0.84 AKT1 (0.35) TNFAKT1AKT2PDE10ACA2
SCHEMBL2065783 0.83 AKT1 (0.34) TNFAKT1AKT2CA2CA12
SCHEMBL2067926 0.83 AKT1 (0.34) TNFAKT1AKT2CA2CA12
SCHEMBL3157242 0.80 TNF (0.54) TNFAKT1AKT2
SCHEMBL3341259 0.80 CA1 (0.35) TNFCA2CA12CA1CA9
SCHEMBL9366390 0.80 HTT (0.40) TNFAKT1AKT2PDE10ACA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8399381-B2 Condensed heterocyclic sulfonyl urea compound, a herbicide containing the same, and a method for weed control using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-03-19 US disclosed
US-8399381-B2 Condensed heterocyclic sulfonyl urea compound, a herbicide containing the same, and a method for weed control using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-03-19 US disclosed
US-8399381-B2 Condensed heterocyclic sulfonyl urea compound, a herbicide containing the same, and a method for weed control using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-03-19 US disclosed
US-8148524-B2 Process for producing sulfonyl chloride compound SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-04-03 US disclosed
EP-1932846-B1 METHOD FOR PRODUCING SULFONYL CHLORIDE COMPOUND SUMITOMO CHEMICAL CO (JP) 2010-10-27 EP disclosed
US-7816526-B2 Condensed heterocyclic sulfonyl urea compound, a herbicide containing the same, and a method for weed control using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-10-19 US disclosed
US-7816526-B2 Condensed heterocyclic sulfonyl urea compound, a herbicide containing the same, and a method for weed control using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-10-19 US disclosed
US-20100160163-A1 Fused heterocyclic sulfonylurea compound, herbicide containing the same, and method for controlling weed with the same TANAKA YASUSHI 2010-06-24 US disclosed
US-20100160163-A1 Fused heterocyclic sulfonylurea compound, herbicide containing the same, and method for controlling weed with the same TANAKA YASUSHI 2010-06-24 US disclosed
EP-1541575-B1 NOVEL PROCESS FOR PRODUCING IMIDAZO(1,2-B)PYRIDAZINE DERIVATIVE SUMITOMO CHEMICAL CO (JP) 2010-03-03 EP disclosed
EP-1466527-B1 FUSED HETEROCYCLIC SULFONYLUREA COMPOUND, HERBICIDE CONTAINING THE SAME, AND METHOD OF CONTROLLING WEED WITH THE SAME SUMITOMO CHEMICAL CO (JP) 2008-07-16 EP disclosed
EP-1466527-B1 FUSED HETEROCYCLIC SULFONYLUREA COMPOUND, HERBICIDE CONTAINING THE SAME, AND METHOD OF CONTROLLING WEED WITH THE SAME SUMITOMO CHEMICAL CO (JP) 2008-07-16 EP disclosed
EP-1932846-A1 METHOD FOR PRODUCING SULFONYL CHLORIDE COMPOUND Sumitomo Chemical Company, Limited (JP) 2008-06-18 EP disclosed
US-7307165-B2 Process for producting imidazo[1,2-b]pyridazine derivative SUMITOMO CHEMICAL TAKEDA AGRO COMPANY, LIMITED (JP) 2007-12-11 US disclosed
US-7307165-B2 Process for producting imidazo[1,2-b]pyridazine derivative SUMITOMO CHEMICAL TAKEDA AGRO COMPANY, LIMITED (JP) 2007-12-11 US disclosed
US-7307165-B2 Process for producting imidazo[1,2-b]pyridazine derivative SUMITOMO CHEMICAL TAKEDA AGRO COMPANY, LIMITED (JP) 2007-12-11 US disclosed
US-20050171108-A1 Novel process for producting imidazo[1,2-b]pyridazine derivative SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-08-04 US disclosed
EP-1541575-A1 NOVEL PROCESS FOR PRODUCING IMIDAZO(1,2-B)PYRIDAZINE DERIVATIVE Sumitomo Chemical Takeda Agro Company, Limited (JP) 2005-06-15 EP disclosed
US-20050032650-A1 Fused heterocyclic sulfonylurea compound herbicide containing the same and method of controlling weed with the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-02-10 US disclosed
EP-1466527-A1 FUSED HETEROCYCLIC SULFONYLUREA COMPOUND, HERBICIDE CONTAINING THE SAME, AND METHOD OF CONTROLLING WEED WITH THE SAME Sumitomo Chemical Takeda Agro Company, Limited (JP) 2004-10-13 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050171108-A1 Novel process for producting imidazo[1,2-b]pyridazine derivative POR, CBR3, NR2C2 TNF 4860/4885AKT1 3599/4885AKT2 2267/4885
US-20100160163-A1 Fused heterocyclic sulfonylurea compound, herbicide containing the same, and method for controlling weed with the same NOTUM, WEE1, DDT TNF 3641/4885AKT1 2815/4885AKT2 2897/4885
US-20050032650-A1 Fused heterocyclic sulfonylurea compound herbicide containing the same and method of controlling weed with the same NOTUM, WEE1, DDT TNF 3532/4885AKT1 2677/4885AKT2 2759/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.