SCHEMBL20691736

SCHEMBL20691736

CCC(I)C(=O)OCC1CC2CC1C(C#N)C2C#N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20691730 0.76 — —
SCHEMBL18456189 0.76 ALDH1A1 (0.42) —
SCHEMBL23974114 0.74 TSHR (0.32) —
SCHEMBL20691729 0.74 — —
SCHEMBL19335843 0.67 — —
SCHEMBL18634056 0.66 THRB (0.36) —
SCHEMBL19457779 0.65 — —
SCHEMBL18772325 0.65 — —
SCHEMBL20215472 0.63 — —
SCHEMBL18403085 0.62 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20190033716-A1 SULFONIUM SALT, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-01-31 — — US disclosed
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