⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24526587 | 0.80 | DPP4 (0.32) | — | |
| SCHEMBL10033541 | 0.79 | HMGCR (0.31) | — | |
| SCHEMBL24994362 | 0.77 | CYP2C9 (0.30) | — | |
| SCHEMBL18898101 | 0.75 | — | — | |
| SCHEMBL23963257 | 0.74 | TSHR (0.33) | — | |
| SCHEMBL18893324 | 0.73 | — | — | |
| SCHEMBL24512614 | 0.69 | — | — | |
| SCHEMBL16744315 | 0.68 | CHRM1 (0.35) | — | |
| SCHEMBL13430242 | 0.67 | — | — | |
| SCHEMBL23059482 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230350290-A1 | PATTERN FORMING METHOD, KIT, AND RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2023-11-02 | — | — | US | disclosed |
| US-11747727-B2 | Chemical liquid, chemical liquid storage body, pattern forming method, and kit | FUJIFILM CORPORATION (JP) | 2023-09-05 | — | — | US | disclosed |
| US-9551933-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-01-24 | — | — | US | disclosed |