SCHEMBL20691786

SCHEMBL20691786

CCC(I)C(=O)OCCC1CC2CC1C(OC(C)=O)(C(F)(F)F)C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20691782 0.82 — —
SCHEMBL18714090 0.75 — —
SCHEMBL20820946 0.73 — —
SCHEMBL18758178 0.72 ALDH1A1 (0.37) —
SCHEMBL23974084 0.71 ALDH1A1 (0.30) —
SCHEMBL20691777 0.71 — —
SCHEMBL18758177 0.71 — —
SCHEMBL22402848 0.68 — —
SCHEMBL19261137 0.65 MEN1 (0.34) —
SCHEMBL18634199 0.64 THRB (0.33) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20190033716-A1 SULFONIUM SALT, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-01-31 — — US disclosed
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