⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20691782 | 0.88 | — | — | |
| SCHEMBL23974057 | 0.85 | — | — | |
| SCHEMBL19335284 | 0.82 | — | — | |
| SCHEMBL18897963 | 0.78 | — | — | |
| SCHEMBL18897904 | 0.75 | — | — | |
| SCHEMBL20215430 | 0.75 | — | — | |
| SCHEMBL20691876 | 0.71 | — | — | |
| SCHEMBL20820945 | 0.71 | — | — | |
| SCHEMBL20691786 | 0.71 | — | — | |
| SCHEMBL20215472 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10234757-B2 | Polymer, making method, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-03-19 | — | — | US | disclosed |
| US-20190033716-A1 | SULFONIUM SALT, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-01-31 | — | — | US | disclosed |