SCHEMBL20693286

SCHEMBL20693286

C=CC(=O)OCCCCOc1ccc(C(=O)OC2=CC=C(OC(O)c3ccc(OC(=O)NCCOC(=O)C=C)cc3)CC2)cc1

nearest known ligand 0.34

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 1/20 0.34
THRB P10828 1/20 0.34
HTT P42858 1/20 0.33
SMN1; SMN2 Q16637 2/20 0.32
TSHR P16473 2/20 0.32
NPC1 O15118 2/20 0.31
LMNA P02545 2/20 0.31
CYP3A4 P08684 2/20 0.31
CYP1A2 P05177 1/20 0.31
CYP2D6 P10635 1/20 0.31
CYP2C9 P11712 1/20 0.31
CYP2C19 P33261 1/20 0.31
FAAH O00519 3/20 0.31
NFKB1 P19838 1/20 0.31
NFKB2 Q00653 1/20 0.31
RELA Q04206 1/20 0.31
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21883828 0.91 MGLL (0.40) MGLLTHRBHTTSMN1; SMN2TSHR
SCHEMBL21883935 0.90 THRB (0.38) THRBHTTSMN1; SMN2TSHRNPC1
SCHEMBL20693221 0.90 MGLL (0.39) MGLLTHRBHTTSMN1; SMN2TSHR
SCHEMBL20693212 0.87 THRB (0.37) THRBHTTTSHRFAAHALDH1A1
SCHEMBL21883937 0.86 ADRB2 (0.39) THRBHTTSMN1; SMN2TSHRNPC1
SCHEMBL20693225 0.86 ADRB2 (0.39) THRBHTTSMN1; SMN2TSHRNPC1
SCHEMBL20693209 0.86 THRB (0.36) THRBHTTSMN1; SMN2TSHRNPC1
SCHEMBL21883934 0.86 MGLL (0.39) MGLLTHRBHTTSMN1; SMN2TSHR
SCHEMBL20693142 0.86 HTT (0.37) THRBHTTSMN1; SMN2TSHRNPC1
SCHEMBL23071732 0.85 THRB (0.42) THRBHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11209688-B2 Reflective layer obtained by immobilizing cholesteric liquid crystalline phase FUJIFILM CORPORATION (JP) 2021-12-28 US disclosed
US-20190033634-A1 METHOD FOR PRODUCING REFLECTIVE LAYER AND REFLECTIVE LAYER FUJIFILM CORPORATION (JP) 2019-01-31 US disclosed