SCHEMBL20769178

SCHEMBL20769178

CCO[Si](CCCOCCC(F)(F)F)(OCC)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3503366 0.84 TSHR (0.33)
SCHEMBL9411706 0.83 CES1 (0.34)
SCHEMBL3370922 0.82
SCHEMBL17991841 0.82 TSHR (0.32)
SCHEMBL15705449 0.82 MEN1 (0.33)
SCHEMBL20492217 0.81 LMNA (0.32)
SCHEMBL27959490 0.80
SCHEMBL27949402 0.80 CES2 (0.33)
SCHEMBL23521409 0.79
SCHEMBL3920178 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114460809-A Negative photosensitive resin composition, cured film, display device provided with cured film, and method for producing same 东丽株式会社 2022-05-10 CN disclosed
CN-108885399-B Negative photosensitive resin composition, cured film, display device provided with cured film, and method for producing same 东丽株式会社 2022-03-15 CN disclosed
US-10983436-B2 Negative-type photosensitive resin composition, cured film, display device provided with cured film, and production method therefor TORAY INDUSTRIES, INC. (JP) 2021-04-20 US disclosed
US-20190072851-A1 NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, DISPLAY DEVICE PROVIDED WITH CURED FILM, AND PRODUCTION METHOD THEREFOR TORAY INDUSTRIES, INC. (JP) 2019-03-07 US disclosed