Octanol

Octanol

SCHEMBL208036

CCCCCCCCO.O=S(=O)(O)O

nearest known ligand 0.72

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

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

The experimentally established mechanism targets of Octanol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.72
ALDH1A1 P00352 2/20 0.72
TSHR P16473 2/20 0.72
HSD17B10 Q99714 1/20 0.72
MEN1 O00255 1/20 0.72
KMT2A Q03164 1/20 0.72
SMN1; SMN2 Q16637 1/20 0.67
TP53 P04637 1/20 0.48
CA1 P00915 2/20 0.46
CA2 P00918 2/20 0.46
NAAA Q02083 1/20 0.45
PPARA Q07869 2/20 0.44
THRB P10828 1/20 0.44
FAAH O00519 2/20 0.44
EPHX1 P07099 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Cetostearyl Alcohol SCHEMBL28668273 1.00 LMNA (0.72) LMNAALDH1A1TSHRHSD17B10MEN1
Cetyl Alcohol SCHEMBL9782972 1.00 LMNA (0.72) LMNAALDH1A1TSHRHSD17B10MEN1
Decanol SCHEMBL28463807 1.00 LMNA (0.72) LMNAALDH1A1TSHRHSD17B10MEN1
1-Hexanol SCHEMBL8015503 1.00 LMNA (0.72) LMNAALDH1A1TSHRHSD17B10MEN1
Cetyl Alcohol SCHEMBL1360724 1.00 LMNA (0.72) LMNAALDH1A1TSHRHSD17B10MEN1
Docosanol SCHEMBL6307010 1.00 LMNA (0.72) LMNAALDH1A1TSHRHSD17B10MEN1
Myristyl Alcohol SCHEMBL4612309 1.00 LMNA (0.72) LMNAALDH1A1TSHRHSD17B10MEN1
Sulfuric Acid SCHEMBL5510760 1.00 LMNA (0.72) LMNAALDH1A1TSHRHSD17B10MEN1
Sulfuric Acid SCHEMBL9563634 1.00 LMNA (0.72) LMNAALDH1A1TSHRHSD17B10MEN1
Undecanol SCHEMBL16150770 1.00 LMNA (0.72) LMNAALDH1A1TSHRHSD17B10MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 317 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118219648-A Elastomer laminated film and preparation method thereof 畅的新材料科技(上海)有限公司 2024-06-21 CN claimed
CN-117626465-A Polyester fiber and preparation method and application thereof 深圳麦克韦尔科技有限公司 2024-03-01 CN claimed
WO-2024036929-A1 POLYESTER FIBER, PREPARATION METHOD THEREFOR, AND APPLICATION THEREOF 深圳麦克韦尔科技有限公司 2024-02-22 WO claimed
CN-114276543-A Polyimide resin and preparation method thereof, and anti-rust and anti-corrosion coating and preparation method thereof 成都普利美特科技有限公司 2022-04-05 CN claimed
EP-0390480-B1 Developer composition for PS plates for use in making lithographic printing plate and method of platemaking FUJI PHOTO FILM CO LTD (JP) 1994-06-01 EP claimed
US-5126229-A No background contamination FUJI PHOTO FILM CO., LTD. (JP) 1992-06-30 US claimed
US-5043252-A Phenolic alcohols FUJI PHOTO FILM CO., LTD. (JP) 1991-08-27 US claimed
EP-0390480-A1 Developer composition for PS plates for use in making lithographic printing plate and method of platemaking FUJI PHOTO FILM CO., LTD. (JP) 1990-10-03 EP claimed
CN-118219648-A Elastomer laminated film and preparation method thereof 畅的新材料科技(上海)有限公司 2024-06-21 CN disclosed
CN-117626465-A Polyester fiber and preparation method and application thereof 深圳麦克韦尔科技有限公司 2024-03-01 CN disclosed
WO-2024036929-A1 POLYESTER FIBER, PREPARATION METHOD THEREFOR, AND APPLICATION THEREOF 深圳麦克韦尔科技有限公司 2024-02-22 WO disclosed
CN-116802774-A Hollow microsphere 株式会社德山 2023-09-22 CN disclosed
CN-115916463-A Microspheres containing polymerizable functional groups 株式会社德山 2023-04-04 CN disclosed
US-20220387956-A1 MICROBALLOON PRODUCTION METHOD TOKUYAMA CORPORATION (JP) 2022-12-08 US disclosed
EP-0279630-A1 Developer for light-sensitive lithographic printing plate capable of processing commonly the negative-type and the positive type and developer composition for light-sensitive material KONICA CORPORATION (JP) 1988-08-24 EP disclosed
EP-0080042-B1 METHOD FOR THE DEVELOPMENT OF PHOTORESIST LAYERS, AND DEVELOPER FUJI PHOTO FILM CO., LTD. (JP) 1988-01-20 EP disclosed
EP-0080042-A1 Method for the development of photoresist layers, and developer FUJI PHOTO FILM CO., LTD. (JP) 1983-06-01 EP disclosed
US-4294905-A DIAZO COMPOUNDS, OLEOPHILIC AND STORAGE STABLE FUJI PHOTO FILM CO., LTD. (JP) 1981-10-13 US disclosed
US-4000047-A PYRIDINE OR QUINOLINE COMPOUND BRIGHTENERS LEA-RONAL, INC. (US) 1976-12-28 US disclosed
US-3998707-A Cadmium electroplating process and bath therefor MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1976-12-21 US disclosed