Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 1/20 | 0.43 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 3/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7758884 | 0.85 | LMNA (0.37) | HTTTHRBRAB9ATSHRSMN1; SMN2 | |
| SCHEMBL17532509 | 0.80 | HTT (0.47) | HTTTP53RAB9ASMN1; SMN2KDM4E | |
| SCHEMBL22035557 | 0.79 | HTT (0.49) | HTTTP53RAB9ASMN1; SMN2KDM4E | |
| SCHEMBL206200 | 0.78 | HTT (0.44) | HTTTP53THRBRAB9ATSHR | |
| SCHEMBL4820861 | 0.78 | THRB (0.40) | HTTTHRBTSHRSMN1; SMN2KDM4E | |
| SCHEMBL15871833 | 0.78 | THRB (0.44) | HTTTHRBTSHRSMN1; SMN2TDP1 | |
| SCHEMBL1077589 | 0.76 | ALDH1A1 (0.46) | HTTTHRBTSHRSMN1; SMN2TDP1 | |
| SCHEMBL2036447 | 0.76 | THRB (0.44) | HTTTHRBTSHRSMN1; SMN2TDP1 | |
| SCHEMBL22263203 | 0.76 | MAPK1 (0.54) | HTTTP53RAB9ATSHRSMN1; SMN2 | |
| SCHEMBL17532499 | 0.76 | HTT (0.49) | HTTTP53RAB9ASMN1; SMN2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 145 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6716946-B2 | Coating | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-04-06 | — | — | US | claimed |
| EP-4634157-A1 | CYCLIC IMIDES AND ADHESIVE COMPOSITIONS INCLUDING THEM | 3M Innovative Properties Company (US) | 2025-10-22 | — | — | EP | disclosed |
| EP-4347673-B1 | COMPOSITION INCLUDING CYCLIC IMIDE-CONTAINING MONOMER AND ORGANOBORANE COMPLEX AND RELATED ARTICLES AND METHODS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2024-10-09 | — | — | EP | disclosed |
| US-20240271021-A1 | COMPOSITION INCLUDING CYCLIC IMIDE-CONTAINING MONOMER AND ORGANOBORANE COMPLEX AND RELATED ARTICLES AND METHODS | 3M INNOVATIVE PROPERTIES COMPANY | 2024-08-15 | — | — | US | disclosed |
| WO-2024122416-A1 | METHOD FOR PRODUCING LAMINATED BODY WITH HARD COAT LAYER | 東亞合成株式会社 | 2024-06-13 | — | — | WO | disclosed |
| WO-2024122417-A1 | METHOD FOR PRODUCING LAMINATE WITH HARD COAT LAYER, AND LAMINATE WITH HARD COAT LAYER | 東亞合成株式会社 | 2024-06-13 | — | — | WO | disclosed |
| WO-2024117229-A1 | PHOTOCURABLE ADHESIVE COMPOSITION FOR PRINTING, CURED PRODUCT, AND LAMINATE | 積水化学工業株式会社 | 2024-06-06 | — | — | WO | disclosed |
| WO-2024117230-A1 | PHOTOCURABLE RESIN COMPOSITION, ADHESIVE SHEET, AND METHOD FOR MANUFACTURING LAMINATE | 積水化学工業株式会社 | 2024-06-06 | — | — | WO | disclosed |
| US-20240158904-A1 | UNDERCOAT AGENT COMPOSITION FOR LAYERING INORGANIC MATERIAL LAYER, CURED PRODUCT THEREOF AND PRODUCTION METHOD THEREOF | TOAGOSEI CO., LTD. (JP) | 2024-05-16 | — | — | US | disclosed |
| WO-2024101411-A1 | CURABLE COMPOSITION FOR ORGANIC EL ELEMENTS, CURED PRODUCT FOR ORGANIC EL ELEMENTS AND METHOD FOR PRODUCING SAME, ORGANIC EL ELEMENT, AND POLYMER | JSR株式会社 | 2024-05-16 | — | — | WO | disclosed |
| EP-2182410-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PHOTOSENSITIVE RESIN PRODUCT, PHOTOSENSITIVE RESIN FILM, CURED PHOTOSENSITIVE RESIN FILM PRODUCT, AND OPTICAL WAVEGUIDE PRODUCED BY USING THOSE PRODUCTS | Hitachi Chemical Company, Ltd. (JP) | 2010-05-05 | — | — | EP | disclosed |
| US-20100027950-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN CURED MATTER, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE RESIN FILM CURED MATTER AND OPTICAL WAVEGUIDE OBTAINED BY USING THE SAME | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2010-02-04 | — | — | US | disclosed |
| US-20090196559-A1 | Resin Composition for Optical Materials, Resin Film for Optical Material, and Optical Waveguide | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2009-08-06 | — | — | US | disclosed |
| EP-2045629-A1 | RESIN COMPOSITION FOR OPTICAL MATERIAL, RESIN FILM FOR OPTICAL MATERIAL, AND OPTICAL WAVEGUIDE | Hitachi Chemical Company, Ltd. (JP) | 2009-04-08 | — | — | EP | disclosed |
| US-20070213467-A1 | Resin Composition and Semiconductor Device Produced By Using the Same | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2007-09-13 | — | — | US | disclosed |
| EP-1736520-A1 | RESIN COMPOSITION AND SEMICONDUCTOR DEVICES MADE BY USING THE SAME | Sumitomo Bakelite Company, Ltd. (JP) | 2006-12-27 | — | — | EP | disclosed |
| EP-1264870-B1 | Coating | SHINETSU CHEMICAL CO (JP) | 2005-10-12 | — | — | EP | disclosed |
| US-6716946-B2 | Coating | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-04-06 | — | — | US | disclosed |
| US-20030004269-A1 | Acrylated resins; high strength, heat resistance | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-01-02 | — | — | US | disclosed |
| EP-1264870-A1 | Coating | Shin-Etsu Chemical Co., Ltd. (JP) | 2002-12-11 | — | — | EP | disclosed |