SCHEMBL20869199

SCHEMBL20869199

Cc1ccc(C(O)O)cc1O

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRPA1 O75762 1/20 0.68
PTGS1 P23219 1/20 0.68
CACNA1C Q13936 1/20 0.68
TSHR P16473 3/20 0.48
CASP1 P29466 1/20 0.48
ACHE P22303 1/20 0.45
MAPT P10636 7/20 0.42
KDM4E B2RXH2 6/20 0.42
HIF1A Q16665 3/20 0.42
HSD17B10 Q99714 3/20 0.42
ALOX15 P16050 2/20 0.42
ALDH1A1 P00352 2/20 0.42
CYP1A2 P05177 2/20 0.42
CYP3A4 P08684 2/20 0.42
CYP2D6 P10635 2/20 0.42
ALOX12 P18054 2/20 0.42
MAPK1 P28482 2/20 0.42
HPGD P15428 2/20 0.42
G6PD P11413 1/20 0.42
CYP2C9 P11712 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16216342 0.82 TRPA1 (0.69) TRPA1PTGS1CACNA1CTSHRCASP1
Carvacrol SCHEMBL5326397 0.81 PTGS1 (1.00) TRPA1PTGS1CACNA1CTSHRCASP1
SCHEMBL921036 0.81 TRPA1 (0.75) TRPA1PTGS1CACNA1CTSHRCASP1
Carvacrol SCHEMBL24734 0.81 PTGS1 (1.00) TRPA1PTGS1CACNA1CTSHRCASP1
SCHEMBL283463 0.81 TDP1 (0.52) TRPA1PTGS1CACNA1CTSHRMAPT
Carvacrol SCHEMBL29544247 0.81 PTGS1 (1.00) TRPA1PTGS1CACNA1CTSHRCASP1
SCHEMBL14182599 0.80 TRPA1 (0.43) TRPA1PTGS1CACNA1CTSHRALDH1A1
Carvacrol SCHEMBL5031273 0.79 PTGS1 (0.95) TRPA1PTGS1CACNA1CTSHRCASP1
Carvacrol SCHEMBL5030301 0.79 PTGS1 (0.95) TRPA1PTGS1CACNA1CTSHRCASP1
Carvacrol SCHEMBL7075922 0.79 PTGS1 (0.95) TRPA1PTGS1CACNA1CTSHRCASP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10983434-B2 Photoresist composition for deep ultraviolet light patterning method and method of manufacturing semiconductor device SAMSUNG ELECTRONICS CO., LTD. (KR) 2021-04-20 US disclosed
US-20190101826-A1 PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LIGHT PATTERNING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2019-04-04 US disclosed