Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 5/20 | 0.52 |
| ▸ | TP53 | P04637 | 1/20 | 0.52 |
| ▸ | PDE10A | Q9Y233 | 1/20 | 0.48 |
| ▸ | ESR1 | P03372 | 8/20 | 0.46 |
| ▸ | ESR2 | Q92731 | 6/20 | 0.46 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.45 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.45 |
| ▸ | CACNA1C | Q13936 | 1/20 | 0.45 |
| ▸ | AR | P10275 | 3/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.42 |
| ▸ | MAPT | P10636 | 4/20 | 0.42 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.42 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.42 |
| ▸ | G6PD | P11413 | 1/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL172412 | 0.84 | TDP1 (0.50) | TDP1TP53PDE10AESR1ESR2 | |
| SCHEMBL30142684 | 0.83 | TP53 (0.54) | TDP1TP53PDE10AESR1ESR2 | |
| SCHEMBL29465801 | 0.83 | TP53 (0.54) | TDP1TP53PDE10AESR1ESR2 | |
| SCHEMBL674987 | 0.83 | TP53 (0.54) | TDP1TP53PDE10AESR1ESR2 | |
| SCHEMBL217919 | 0.83 | TP53 (0.54) | TDP1TP53PDE10AESR1ESR2 | |
| SCHEMBL30343462 | 0.83 | TP53 (0.54) | TDP1TP53PDE10AESR1ESR2 | |
| Methyl Alcohol SCHEMBL7106413 | 0.82 | TDP1 (0.48) | TDP1TP53PDE10AESR1ESR2 | |
| SCHEMBL20869199 | 0.81 | TRPA1 (0.68) | TDP1TRPA1PTGS1CACNA1CKDM4E | |
| SCHEMBL1397101 | 0.81 | PTGS1 (0.68) | TDP1TP53PDE10AESR1ESR2 | |
| SCHEMBL29657745 | 0.81 | TDP1 (0.52) | TDP1TP53PDE10AESR1ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 185 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11520083-B2 | Member, imaging apparatus, and method for producing member | CANON KABUSHIKI KAISHA (JP) | 2022-12-06 | — | — | US | claimed |
| CN-111978224-B | Sulfur-containing monomolecular resin and photoresist composition thereof | 中国科学院理化技术研究所 | 2022-10-28 | — | — | CN | claimed |
| CN-112142955-B | Adamantane-polyphenol oligomer, photoresist composition and application thereof | 中国科学院理化技术研究所 | 2022-04-29 | — | — | CN | claimed |
| CN-104144908-B | Spirofluorene derivative molecular glass, preparation method thereof and application thereof in photoetching | TECHNICAL INSTITUTE OF PHYSICS AND CHEMISTRY CHINESE ACADEMY OF SCIENCES (CN) | 2016-02-03 | — | — | CN | claimed |
| CN-103304385-B | Molecular glass photoresist containing bisphenol A skeleton structure as well as preparation method and application thereof | CHINESE ACAD INST CHEMISTRY | 2015-04-15 | — | — | CN | claimed |
| CN-103304385-A | Molecular glass photoresist containing bisphenol A skeleton structure as well as preparation method and application thereof | CHINESE ACAD INST CHEMISTRY | 2013-09-18 | — | — | CN | claimed |
| WO-2026105628-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 日産化学株式会社 | 2026-05-21 | — | — | WO | disclosed |
| WO-2026105630-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 日産化学株式会社 | 2026-05-21 | — | — | WO | disclosed |
| US-20260118765-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| US-12601972-B2 | Resist underlayer film-forming composition with suppressed degeneration of crosslinking agent | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-14 | — | — | US | disclosed |
| EP-4692943-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | Nissan Chemical Corporation (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-20260022203-A1 | SELF-CROSSLINKABLE POLYMER AND RESIST UNDERLAYER FILM FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2026-01-22 | — | — | US | disclosed |
| EP-4679176-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | Nissan Chemical Corporation (JP) | 2026-01-14 | — | — | EP | disclosed |
| EP-0558149-A1 | Epoxy resin and epoxy resin composition | SHELL INTERNATIONALE RESEARCHMAATSCHAPPIJ B.V. (NL) | 1993-09-01 | — | — | EP | disclosed |
| EP-0549080-A1 | Epoxy resin composition | SHELL INTERNATIONALE RESEARCHMAATSCHAPPIJ B.V. (NL) | 1993-06-30 | — | — | EP | disclosed |
| EP-0273980-B1 | CAN WITH AN EASILY OPENABLE LID AND A PROCESS FOR PRODUCING THE SAME | TOYO SEIKAN KAISHA, LTD. (JP) | 1992-02-19 | — | — | EP | disclosed |
| US-4916031-A | HYDROXYMETHYLPHENOL PRIMER | TOYO SEIKAN KAISHA, LTD. (JP) | 1990-04-10 | — | — | US | disclosed |
| US-4828136-A | CORROSION AND HOT WATER RESISTANCE | TOYO SEIKAN KAISHA, LTD. (JP) | 1989-05-09 | — | — | US | disclosed |
| EP-0273980-A1 | CAN WITH AN EASILY OPENABLE LID AND A PROCESS FOR PRODUCING THE SAME | TOYO SEIKAN KAISHA, LTD. (JP) | 1988-07-13 | — | — | EP | disclosed |
| US-4701354-A | VAPOR DEPOSITION OF AN HYDROXYMETHYL SUBSTITUTED PHENOL | TOYO SEIKAN KAISHA, LTD. (JP) | 1987-10-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118765-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | ASH2L, ASIC1, RPA1 | TDP1 349/4885TP53 4776/4885PDE10A 1104/4885 |
| US-20260022203-A1 | SELF-CROSSLINKABLE POLYMER AND RESIST UNDERLAYER FILM FORMING COMPOSITION | SMC2, SMC4, SMC3 | TDP1 999/4885TP53 4219/4885PDE10A 4735/4885 |
| US-12601972-B2 | Resist underlayer film-forming composition with suppressed degeneration of crosslinking agent | BHMT, AADAT, PNMT | TDP1 70/4885TP53 3901/4885PDE10A 455/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.