SCHEMBL2087563

SCHEMBL2087563

Cc1cc(O)ccc1C12CC3CC(C1)CC(c1ccc(O)cc1C)(C3)C2

nearest known ligand 0.56

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CNR2 P34972 2/20 0.43
ESR1 P03372 1/20 0.40
KMT2A Q03164 3/20 0.39
POLB P06746 2/20 0.38
MEN1 O00255 2/20 0.38
GAA P10253 1/20 0.38
GFER P55789 1/20 0.38
LMNA P02545 1/20 0.37
MAPT P10636 1/20 0.37
ALOX12 P18054 1/20 0.37
NPSR1 Q6W5P4 1/20 0.37
GPR55 Q9Y2T6 1/20 0.37
PGR P06401 1/20 0.35
ALDH1A1 P00352 1/20 0.34
HSP90AA1 P07900 1/20 0.34
NPC1 O15118 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27419643 0.90 CNR2 (0.48) CNR2KMT2APOLBMEN1GAA
SCHEMBL2426368 0.83 KMT2A (0.43) CNR2ESR1KMT2APOLBMEN1
SCHEMBL14040564 0.81 CNR2 (0.43) CNR2ESR1KMT2APOLBMEN1
SCHEMBL3749653 0.79 MEN1 (0.47) CNR2ESR1KMT2APOLBMEN1
SCHEMBL18009651 0.79 GRIN2D (0.42) CNR2ESR1POLBLMNAMAPT
SCHEMBL4607854 0.78 KMT2A (0.39) CNR2ESR1KMT2APOLBMEN1
SCHEMBL4606696 0.77 CNR2 (0.46) CNR2KMT2APOLBMEN1GAA
SCHEMBL3845041 0.75 KMT2A (0.40) CNR2ESR1KMT2APOLBMEN1
SCHEMBL3845893 0.75 CNR2 (0.38) CNR2ESR1KMT2APOLBMEN1
SCHEMBL3849641 0.74 CNR2 (0.37) CNR2ESR1KMT2APOLBMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7862981-B2 Compound, positive resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2011-01-04 US disclosed
US-20100009284-A1 COMPOUND, POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2010-01-14 US disclosed
EP-1336597-B1 Hydroxyphenyl adamantanes and process for the production of the same HONSHU CHEMICAL IND (JP) 2008-07-16 EP disclosed
US-6720460-B2 FORMING HEAT RESISTANT, MECHANICAL STRENGTH POLYMER ADDITIVES; ACID CATALYZED REACTION OF ADAMANTANE DIOL OR TRIOL WITH PHENOLIC DERIVATIVE HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2004-04-13 US disclosed
US-20030187307-A1 Hydroxyphenyl adamantanes and process for the production of the same HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2003-10-02 US disclosed
EP-1336597-A1 Hydroxyphenyl adamantanes and process for the production of the same Honshu Chemical Industry Co., Ltd. (JP) 2003-08-20 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030187307-A1 Hydroxyphenyl adamantanes and process for the production of the same CYP8B1, DHPS, P4HA1 CNR2 1992/4885ESR1 4719/4885KMT2A 4019/4885
US-20100009284-A1 COMPOUND, POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN MRPS27, PSMC2, PSMD7 CNR2 1185/4885ESR1 966/4885KMT2A 3178/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.