SCHEMBL20912415

SCHEMBL20912415

O=C(O)CCOc1ccc(OC(=O)COc2cccs2)s1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.38
NPC1 O15118 1/20 0.36
HPGD P15428 2/20 0.34
LTA4H P09960 1/20 0.34
TDP1 Q9NUW8 5/20 0.33
POLB P06746 3/20 0.33
L3MBTL1 Q9Y468 3/20 0.33
TSHR P16473 2/20 0.33
ALDH1A1 P00352 5/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
PKM P14618 1/20 0.32
MMP1 P03956 1/20 0.32
MMP2 P08253 1/20 0.32
MMP9 P14780 1/20 0.32
MMP12 P39900 1/20 0.32
KDM4E B2RXH2 2/20 0.31
MAPT P10636 2/20 0.31
CACNA1B Q00975 1/20 0.31
APBA1 Q02410 1/20 0.31
HSD17B10 Q99714 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1418443 0.83 LMNA (0.50) LMNANPC1HPGDLTA4HTDP1
SCHEMBL891160 0.80 MMP1 (0.44) LMNANPC1HPGDTDP1POLB
SCHEMBL5000541 0.76 HPGD (0.51) LMNANPC1HPGDLTA4HTDP1
SCHEMBL4989913 0.74 HPGD (0.54) NPC1HPGDLTA4HTDP1POLB
SCHEMBL341114 0.74 ALOX15 (0.50) LMNAHPGDTDP1POLBL3MBTL1
SCHEMBL4991638 0.73 HPGD (0.57) NPC1HPGDTDP1POLBL3MBTL1
SCHEMBL10366659 0.70 TDP1 (0.48) LMNANPC1TDP1POLBL3MBTL1
SCHEMBL8814468 0.70 KMT2A (0.51) LMNANPC1HPGDL3MBTL1ALDH1A1
SCHEMBL27766082 0.69 HPGD (0.55) LMNANPC1HPGDTDP1POLB
SCHEMBL5352083 0.69 MMP1 (0.47) LMNANPC1HPGDPOLBL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11269251-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-03-08 US disclosed
US-20190113844-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-04-18 US disclosed