SCHEMBL20915437

SCHEMBL20915437

CCc1c2ccccc2c(CC)c2c(Oc3c(Oc4ccccc4)ccc4c(CC)c5ccccc5c(CC)c34)c(Oc3ccccc3)ccc12

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 3/20 0.39
MAPT P10636 3/20 0.34
KDM4E B2RXH2 2/20 0.34
GLA P06280 1/20 0.34
KMT2A Q03164 1/20 0.34
RIPK1 Q13546 1/20 0.34
SLC6A2 P23975 1/20 0.34
SLC6A4 P31645 1/20 0.34
TTR P02766 2/20 0.34
POLB P06746 2/20 0.33
L3MBTL1 Q9Y468 2/20 0.33
LMNA P02545 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
DPP4 P27487 1/20 0.33
ATM Q13315 1/20 0.33
ALDH1A1 P00352 1/20 0.33
ALOX15 P16050 1/20 0.33
DUSP3 P51452 1/20 0.33
PTPN5 P54829 1/20 0.33
PTPN11 Q06124 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20915392 0.85 KDM4E (0.41) LTA4HMAPTKDM4EGLAKMT2A
SCHEMBL20915399 0.83 LTA4H (0.40) LTA4HMAPTKDM4EKMT2APOLB
SCHEMBL20915496 0.82 LTA4H (0.40) LTA4HMAPTKDM4EPOLBL3MBTL1
SCHEMBL20915336 0.81 LTA4H (0.33) LTA4HMAPTKDM4EGLAKMT2A
SCHEMBL20398445 0.81 LTA4H (0.39) LTA4HPOLBL3MBTL1ATM
SCHEMBL20915355 0.81 LTA4H (0.39) LTA4HPOLBL3MBTL1ATM
SCHEMBL20398579 0.81 LTA4H (0.39) LTA4HPOLBL3MBTL1ATM
SCHEMBL20915526 0.80 TTR (0.34) LTA4HMAPTKDM4EGLAKMT2A
SCHEMBL20915538 0.80 TTR (0.34) LTA4HMAPTKDM4EGLAKMT2A
SCHEMBL20915282 0.79 HRH1 (0.33) LTA4HMAPTKDM4EGLAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11149103-B2 Photopolymerization sensitizer composition and photopolymerizable composition comprising the same KAWASAKI KASEI CHEMICALS LTD. (JP) 2021-10-19 US disclosed
CN-108026197-B Photopolymerizable composition 川崎化成工业株式会社 2020-11-17 CN disclosed
US-20190119426-A1 PHOTOPOLYMERIZATION SENSITIZER COMPOSITION AND PHOTOPOLYMERIZABLE COMPOSITION COMPRISING THE SAME KAWASAKI KASEI CHEMICALS LTD. (JP) 2019-04-25 US disclosed