SCHEMBL20928956

SCHEMBL20928956

COC(=O)C1C(S)CCCC1C(=O)O

nearest known ligand 0.43

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
▸ PPM1B O75688 1/20 0.43
▸ PTPN1 P18031 1/20 0.43
▸ PPP1CC P36873 1/20 0.43
▸ ACE P12821 3/20 0.38
▸ CHRM2 P08172 1/20 0.37
▸ CHRM4 P08173 1/20 0.37
▸ CHRM3 P20309 1/20 0.37
▸ PEPD P12955 1/20 0.34
▸ POLB P06746 1/20 0.34
▸ SLC6A2 P23975 1/20 0.34
▸ SLC6A4 P31645 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20929056 0.89 PPM1B (0.43) PPM1BPTPN1PPP1CCACECHRM2
SCHEMBL1297620 0.85 PPM1B (0.48) PPM1BPTPN1PPP1CCACECHRM2
SCHEMBL20928654 0.81 BTK (0.41) ACEPEPD
SCHEMBL20928978 0.81 PPM1B (0.47) PPM1BPTPN1PPP1CCACEPEPD
SCHEMBL1297704 0.81 PPM1B (0.48) PPM1BPTPN1PPP1CCACECHRM2
SCHEMBL20929057 0.81 ACE (0.44) ACEPEPD
SCHEMBL1297622 0.79 PPM1B (0.50) PPM1BPTPN1PPP1CCACECHRM2
SCHEMBL21216576 0.79 CHRM2 (0.46) ACECHRM2CHRM4CHRM3SLC6A2
SCHEMBL1297572 0.78 CHRM2 (0.48) PPM1BPTPN1PPP1CCCHRM2CHRM4
SCHEMBL2983239 0.77 CHRM2 (0.47) PPM1BPTPN1PPP1CCACECHRM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11022880-B2 Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound TOKYO OHKA KOGYO CO., LTD. (JP) 2021-06-01 — — US disclosed
US-20190121233-A1 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2019-04-25 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20190121233-A1 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND CUTA, POLR1C, ASIC1 PPM1B 982/4885PTPN1 372/4885PPP1CC 1997/4885
US-11022880-B2 Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound CUTA, POLR1C, ASIC1 PPM1B 982/4885PTPN1 372/4885PPP1CC 1997/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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