SCHEMBL20959802

SCHEMBL20959802

CC(C)(C)C(=O)OCCOc1c(-c2ccccc2)cccc1-c1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.43
MEN1 O00255 2/20 0.43
GBA1 P04062 1/20 0.43
MAPT P10636 1/20 0.43
RECQL P46063 1/20 0.43
ALDH1A1 P00352 5/20 0.42
L3MBTL1 Q9Y468 4/20 0.40
TDP1 Q9NUW8 2/20 0.40
KDM4E B2RXH2 5/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
PRKCA P17252 1/20 0.39
PRKCD Q05655 1/20 0.39
LMNA P02545 2/20 0.39
MAPK1 P28482 1/20 0.39
HNF4A P41235 1/20 0.38
SCN1A P35498 1/20 0.38
SCN2A Q99250 1/20 0.38
SCN3A Q9NY46 1/20 0.38
LTB4R Q15722 1/20 0.38
PLA2G1B P04054 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14827290 0.87 ALDH1A1 (0.43) KMT2AMEN1ALDH1A1L3MBTL1TDP1
SCHEMBL20959804 0.81 KDM4E (0.42) KMT2AMEN1MAPTALDH1A1L3MBTL1
SCHEMBL13683055 0.78 ALDH1A1 (0.53) KMT2AMEN1ALDH1A1L3MBTL1TDP1
SCHEMBL16300499 0.78 ELANE (0.47) KMT2AMEN1L3MBTL1TDP1SMN1; SMN2
SCHEMBL12389249 0.78 THRB (0.56) KMT2AMEN1MAPTRECQLALDH1A1
SCHEMBL17898448 0.78 ALDH1A1 (0.45) KMT2AMEN1ALDH1A1TDP1KDM4E
SCHEMBL14827289 0.77 KDM4E (0.44) KMT2AMEN1MAPTALDH1A1L3MBTL1
SCHEMBL12416579 0.77 TDP1 (0.43) KMT2AMEN1ALDH1A1L3MBTL1TDP1
SCHEMBL4259897 0.77 THRB (0.63) KMT2AALDH1A1L3MBTL1TDP1KDM4E
SCHEMBL14069189 0.75 THRB (0.61) KMT2AALDH1A1L3MBTL1TDP1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2756353-B1 PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE FUJIFILM CORP (JP) 2019-05-01 EP disclosed