Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 11/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.48 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.46 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 3/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.45 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | HTR7 | P34969 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13683065 | 0.80 | KDM4E (0.54) | ALDH1A1KDM4ESMN1; SMN2ADRB2ADRB1 | |
| SCHEMBL26164120 | 0.78 | ALDH1A1 (0.55) | ALDH1A1KDM4ESMN1; SMN2ADRB2ADRB1 | |
| SCHEMBL20959802 | 0.78 | KMT2A (0.43) | ALDH1A1KDM4ESMN1; SMN2TDP1L3MBTL1 | |
| SCHEMBL14827295 | 0.77 | ALDH1A1 (0.57) | ALDH1A1KDM4ESMN1; SMN2TDP1L3MBTL1 | |
| SCHEMBL11326901 | 0.77 | ADRB2 (0.60) | ALDH1A1KDM4ESMN1; SMN2ADRB2ADRB1 | |
| SCHEMBL11612037 | 0.76 | THRB (0.51) | ALDH1A1KDM4ESMN1; SMN2TDP1MEN1 | |
| SCHEMBL19901959 | 0.74 | ALDH1A1 (0.51) | ALDH1A1KDM4ESMN1; SMN2ADRB2ADRB1 | |
| SCHEMBL16236883 | 0.74 | ELANE (0.59) | ALDH1A1KDM4ESMN1; SMN2TDP1L3MBTL1 | |
| SCHEMBL12389249 | 0.74 | THRB (0.56) | ALDH1A1KDM4ESMN1; SMN2TDP1L3MBTL1 | |
| SCHEMBL8670084 | 0.73 | ADRB2 (0.66) | ALDH1A1KDM4ESMN1; SMN2ADRB2ADRB1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7592118-B2 | Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile | FUJIFILM CORPORATION (JP) | 2009-09-22 | — | — | US | disclosed |
| US-20080241743-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |