SCHEMBL20959828

SCHEMBL20959828

CC1SC1(C)c1ccc(C(C)(C)C)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 2/20 0.39
▸ LMNA P02545 1/20 0.38
▸ TYR P14679 1/20 0.38
▸ HSD11B1 P28845 3/20 0.34
▸ KIF11 P52732 2/20 0.33
▸ ALDH1A1 P00352 2/20 0.32
▸ GRIN2B Q13224 1/20 0.32
▸ SIGMAR1 Q99720 2/20 0.32
▸ TP53 P04637 1/20 0.32
▸ NPC1 O15118 2/20 0.31
▸ RAB9A P51151 2/20 0.31
▸ MAPT P10636 1/20 0.31
▸ HPGD P15428 1/20 0.31
▸ MAPK1 P28482 1/20 0.31
▸ HDAC1 Q13547 1/20 0.31
▸ SLC22A2 O15244 1/20 0.31
▸ SLC22A1 O15245 1/20 0.31
▸ SLC22A3 O75751 1/20 0.31
▸ KDM4E B2RXH2 2/20 0.31
▸ KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL424728 0.68 TSHR (0.73) TSHRLMNATYRKIF11ALDH1A1
SCHEMBL28812394 0.64 TSHR (0.41) TSHRLMNATYRKIF11ALDH1A1
SCHEMBL8531819 0.63 TSHR (0.35) TSHRLMNATYRALDH1A1NPC1
SCHEMBL4494377 0.62 TSHR (0.50) TSHRLMNATYRKIF11ALDH1A1
SCHEMBL12024951 0.62 KCNH2 (0.44) TSHRLMNATYRHSD11B1KIF11
SCHEMBL2680996 0.62 TSHR (0.39) TSHRLMNATYRKIF11ALDH1A1
SCHEMBL24199119 0.62 TSHR (0.44) TSHRLMNATYRKIF11ALDH1A1
Hydrogen Peroxide SCHEMBL28677809 0.62 LMNA (0.71) TSHRLMNATYRKIF11ALDH1A1
SCHEMBL8889645 0.61 TSHR (0.55) TSHRLMNATYRKIF11ALDH1A1
SCHEMBL18253208 0.61 MAPT (0.51) TSHRLMNATYRHSD11B1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2756353-B1 PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE FUJIFILM CORP (JP) 2019-05-01 — — EP disclosed
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