SCHEMBL2099684

SCHEMBL2099684

CCC(C)c1ccccc1[SiH](NC)NC

nearest known ligand 0.50

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.50
HTT P42858 2/20 0.34
KDM4E B2RXH2 2/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
ATM Q13315 1/20 0.33
NISCH Q9Y2I1 1/20 0.33
TAAR1 Q96RJ0 1/20 0.32
AOC3 Q16853 1/20 0.32
GABRA1 P14867 1/20 0.32
GABRB2 P47870 1/20 0.32
PKM P14618 1/20 0.32
CHRNB2 P17787 1/20 0.32
CHRNA7 P36544 1/20 0.32
CHRNA4 P43681 1/20 0.32
RORC P51449 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2103832 0.84 TSHR (0.48) TSHRHTTKDM4EL3MBTL1ATM
SCHEMBL2101258 0.82 TSHR (0.47) TSHRHTTKDM4EL3MBTL1ATM
SCHEMBL2102459 0.77 TSHR (0.53) TSHRHTTKDM4EL3MBTL1ATM
SCHEMBL994607 0.75 TSHR (0.73) TSHRHTTKDM4EL3MBTL1ATM
SCHEMBL4999824 0.74 TSHR (0.50) TSHRHTTKDM4EL3MBTL1ATM
SCHEMBL2103062 0.74 TSHR (0.50) TSHRHTTKDM4EL3MBTL1ATM
SCHEMBL2099902 0.74 TSHR (0.46) TSHRHTTKDM4EL3MBTL1ATM
SCHEMBL4996332 0.73 TSHR (0.48) TSHRHTTKDM4EL3MBTL1ATM
SCHEMBL2101585 0.73 TSHR (0.48) TSHRHTTKDM4EL3MBTL1ATM
SCHEMBL2101032 0.71 TSHR (0.47) TSHRHTTKDM4EL3MBTL1ATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8164166-B2 Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2012-04-24 US disclosed
US-20090085170-A1 INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2009-04-02 US disclosed