SCHEMBL2103832

SCHEMBL2103832

CCN[SiH](NCC)c1ccccc1C(C)CC

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.48
HTT P42858 2/20 0.33
KDM4E B2RXH2 2/20 0.33
L3MBTL1 Q9Y468 2/20 0.33
ATM Q13315 1/20 0.32
NISCH Q9Y2I1 1/20 0.32
AOC3 Q16853 1/20 0.32
PKM P14618 1/20 0.32
GABRA1 P14867 1/20 0.31
GABRB2 P47870 1/20 0.31
ALDH1A1 P00352 1/20 0.31
TP53 P04637 1/20 0.31
HSP90AA1 P07900 1/20 0.31
CYP3A4 P08684 1/20 0.31
THRB P10828 1/20 0.31
ALOX15 P16050 1/20 0.31
CASP1 P29466 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
HIF1A Q16665 1/20 0.31
HSD17B10 Q99714 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2099684 0.84 TSHR (0.50) TSHRHTTKDM4EL3MBTL1ATM
SCHEMBL2099902 0.83 TSHR (0.46) TSHRHTTKDM4EL3MBTL1ATM
SCHEMBL2102459 0.76 TSHR (0.53) TSHRHTTKDM4EL3MBTL1ATM
SCHEMBL2101258 0.74 TSHR (0.47) TSHRHTTKDM4EL3MBTL1ATM
SCHEMBL994607 0.73 TSHR (0.73) TSHRHTTKDM4EL3MBTL1ATM
SCHEMBL4999824 0.73 TSHR (0.50) TSHRHTTKDM4EL3MBTL1ATM
SCHEMBL2103062 0.73 TSHR (0.50) TSHRHTTKDM4EL3MBTL1ATM
SCHEMBL4996332 0.71 TSHR (0.48) TSHRHTTKDM4EL3MBTL1ATM
SCHEMBL2101585 0.71 TSHR (0.48) TSHRHTTKDM4EL3MBTL1ATM
SCHEMBL2101032 0.70 TSHR (0.47) TSHRHTTKDM4EL3MBTL1ATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8164166-B2 Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2012-04-24 US disclosed
US-20090085170-A1 INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2009-04-02 US disclosed