Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.34 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.34 |
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | NISCH | Q9Y2I1 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 2/20 | 0.33 |
| ▸ | RORC | P51449 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.31 |
| ▸ | PPARA | Q07869 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2101032 | 0.82 | TSHR (0.47) | TSHRKDM4EL3MBTL1GABRA1GABRB2 | |
| SCHEMBL2101258 | 0.82 | TSHR (0.47) | TSHRKDM4EL3MBTL1GABRA1GABRB2 | |
| SCHEMBL2102088 | 0.80 | TSHR (0.46) | TSHRKDM4EL3MBTL1ATMNISCH | |
| SCHEMBL2099902 | 0.80 | TSHR (0.46) | TSHRKDM4EL3MBTL1ATMNISCH | |
| SCHEMBL2099008 | 0.79 | GABRA1 (0.44) | TSHRL3MBTL1GABRA1GABRB2 | |
| SCHEMBL994607 | 0.78 | TSHR (0.73) | TSHRKDM4EL3MBTL1GABRA1GABRB2 | |
| SCHEMBL2099684 | 0.77 | TSHR (0.50) | TSHRKDM4EL3MBTL1GABRA1GABRB2 | |
| SCHEMBL2103062 | 0.77 | TSHR (0.50) | TSHRKDM4EL3MBTL1GABRA1GABRB2 | |
| SCHEMBL4999824 | 0.77 | TSHR (0.50) | TSHRKDM4EL3MBTL1GABRA1GABRB2 | |
| SCHEMBL4996332 | 0.76 | TSHR (0.48) | TSHRKDM4EL3MBTL1GABRA1GABRB2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |