⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2100456 | 0.82 | — | — | |
| SCHEMBL2100087 | 0.73 | — | — | |
| SCHEMBL2104196 | 0.71 | — | — | |
| SCHEMBL2102553 | 0.71 | — | — | |
| SCHEMBL2100359 | 0.69 | DNM1 (0.32) | — | |
| SCHEMBL2100352 | 0.69 | — | — | |
| SCHEMBL2102472 | 0.69 | — | — | |
| SCHEMBL2104021 | 0.66 | — | — | |
| SCHEMBL9789070 | 0.64 | — | — | |
| SCHEMBL2104219 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |
| EP-0654544-B1 | Process for lining a chemical reactor with silicon-based ceramic materials by thermal decomposition of silazane precursors | ENICHEM SPA (IT) | 1998-01-28 | — | — | EP | disclosed |
| US-5616754-A | ORGANO DISILAZANE OR TRISILAZANE CHEMICAL INTERMEDIATES | ENICHEM S.P.A. (IT) | 1997-04-01 | — | — | US | disclosed |
| EP-0654544-A2 | Compounds useful as chemical precursors in chemical vapor deposition of silicon-based ceramic materials | ENICHEM S.p.A. (IT) | 1995-05-24 | — | — | EP | disclosed |
| US-5413813-A | Pyrolysis of compounds to form ceramics | ENICHEM S.P.A. (IT) | 1995-05-09 | — | — | US | disclosed |