Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNN4 | O15554 | 1/20 | 0.36 |
| ▸ | AOC3 | Q16853 | 1/20 | 0.35 |
| ▸ | ESR1 | P03372 | 1/20 | 0.32 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.31 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2101443 | 0.84 | RIPK1 (0.30) | AOC3 | |
| SCHEMBL2271603 | 0.76 | KCNN4 (0.36) | KCNN4AOC3ESR1ESR2ALDH1A1 | |
| SCHEMBL2103614 | 0.76 | CYP2D6 (0.32) | AOC3ALDH1A1TSHRMAPK1MEN1 | |
| SCHEMBL2101735 | 0.73 | AOC3 (0.33) | KCNN4AOC3ESR1ESR2 | |
| SCHEMBL7667669 | 0.70 | ESR1 (0.34) | ESR1ESR2ALDH1A1TSHRMAPK1 | |
| SCHEMBL3457789 | 0.70 | AOC3 (0.38) | KCNN4AOC3ESR1ESR2ALDH1A1 | |
| SCHEMBL29749402 | 0.69 | ESR1 (0.37) | KCNN4AOC3ESR1ESR2ALDH1A1 | |
| SCHEMBL3526796 | 0.69 | ESR1 (0.37) | KCNN4AOC3ESR1ESR2ALDH1A1 | |
| SCHEMBL2276954 | 0.69 | ESR1 (0.37) | KCNN4AOC3ESR1ESR2ALDH1A1 | |
| SCHEMBL765973 | 0.69 | MEN1 (0.40) | KCNN4AOC3ESR1ESR2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |