Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.31 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2102165 | 0.85 | GAA (0.31) | GAAHTT | |
| SCHEMBL2269967 | 0.84 | KCNN4 (0.35) | KCNN4 | |
| SCHEMBL2101841 | 0.82 | SIGMAR1 (0.34) | — | |
| SCHEMBL2100789 | 0.80 | GAA (0.34) | GAAHTTKCNN4ADRB2 | |
| SCHEMBL2101040 | 0.78 | GAA (0.33) | GAAHTTKCNN4ADRB2 | |
| SCHEMBL2102746 | 0.76 | GAA (0.32) | GAAHTTKCNN4 | |
| SCHEMBL2103817 | 0.74 | KCNN4 (0.33) | GAAHTTKCNN4 | |
| SCHEMBL2101959 | 0.74 | SIGMAR1 (0.34) | GAAHTT | |
| SCHEMBL2104542 | 0.73 | GAA (0.30) | GAA | |
| SCHEMBL2101106 | 0.73 | HTT (0.33) | GAAHTTADRB2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |