SCHEMBL2104542

SCHEMBL2104542

CCNCN[SiH](c1ccccc1)N(CC)CC

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.30
HTR1B P28222 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2102746 0.86 GAA (0.32) GAA
SCHEMBL2100789 0.76 GAA (0.34) GAA
SCHEMBL2101040 0.74 GAA (0.33) GAA
SCHEMBL2102345 0.73 GAA (0.33) GAA
SCHEMBL2103817 0.70 KCNN4 (0.33) GAA
SCHEMBL2102165 0.70 GAA (0.31) GAA
SCHEMBL2101959 0.70 SIGMAR1 (0.34) GAA
SCHEMBL2102700 0.70 KCNN4 (0.34)
SCHEMBL2101106 0.69 HTT (0.33) GAA
SCHEMBL2101840 0.68 SIGMAR1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-8164166-B2 Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2012-04-24 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed
US-20090085170-A1 INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2009-04-02 US disclosed