Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.33 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2269974 | 0.85 | SIGMAR1 (0.41) | POLBSIGMAR1ADRB2TSHR | |
| SCHEMBL2272357 | 0.75 | TSHR (0.37) | SIGMAR1ADRB2TSHR | |
| SCHEMBL2102335 | 0.75 | POLB (0.35) | POLBSIGMAR1ADRB2TSHR | |
| SCHEMBL234051 | 0.72 | SIGMAR1 (0.38) | POLBSIGMAR1ADRB2TSHR | |
| SCHEMBL2267939 | 0.71 | HTR2A (0.44) | POLBSIGMAR1TSHR | |
| SCHEMBL2100217 | 0.69 | SIGMAR1 (0.36) | SIGMAR1ADRB2TSHR | |
| SCHEMBL2269781 | 0.69 | SIGMAR1 (0.37) | SIGMAR1TSHR | |
| SCHEMBL15915010 | 0.67 | TSHR (0.59) | TSHR | |
| SCHEMBL2103331 | 0.67 | MAPT (0.33) | ADRB2 | |
| SCHEMBL2273792 | 0.67 | TAAR1 (0.52) | SIGMAR1ADRB2TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |