SCHEMBL2267939

SCHEMBL2267939

CNC(C)c1ccccc1[SiH3]

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 5/20 0.44
SLC6A4 P31645 4/20 0.44
CYP2D6 P10635 2/20 0.40
KCNH2 Q12809 2/20 0.40
TAAR1 Q96RJ0 2/20 0.34
SLC18A2 Q05940 1/20 0.34
SIGMAR1 Q99720 1/20 0.34
TSHR P16473 4/20 0.33
GABRA1 P14867 2/20 0.33
GABRB2 P47870 2/20 0.33
CYP3A4 P08684 2/20 0.33
CHRM2 P08172 1/20 0.33
ADRA1A P35348 1/20 0.33
RGS12 O14924 1/20 0.33
GLA P06280 1/20 0.33
CYP2C9 P11712 1/20 0.33
PKM P14618 1/20 0.33
ALOX15 P16050 1/20 0.33
ALOX12 P18054 1/20 0.33
ADRA2C P18825 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL235044 0.79 TSHR (0.35) HTR2ASLC6A4CYP2D6TAAR1SLC18A2
SCHEMBL2269974 0.77 SIGMAR1 (0.41) SLC6A4CYP2D6KCNH2SIGMAR1TSHR
SCHEMBL2102292 0.76 TSHR (0.32) HTR2ASLC6A4CYP2D6TSHRNFKB1
SCHEMBL3378475 0.75 GABRA1 (0.50) TSHRGABRA1GABRB2CYP3A4MEN1
SCHEMBL2402249 0.74 SLC6A4 (0.50) HTR2ASLC6A4CYP2D6KCNH2TAAR1
SCHEMBL15983857 0.73 HTR2A (0.51) HTR2ASLC6A4CYP2D6KCNH2TSHR
SCHEMBL2400173 0.73 HTT (0.51) HTR2ASLC6A4CYP2D6KCNH2TAAR1
SCHEMBL15983778 0.73 HTR2A (0.51) HTR2ASLC6A4CYP2D6KCNH2TSHR
SCHEMBL16254312 0.73 SLC6A4 (0.44) HTR2ASLC6A4CYP2D6KCNH2TAAR1
SCHEMBL10154250 0.73 GABRA1 (0.60) HTR2ASLC6A4CYP2D6KCNH2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed