SCHEMBL2104329

SCHEMBL2104329

CCC(C)[SiH](NCN(CC)CC)c1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CACNA2D1 P54289 9/20 0.38
SIGMAR1 Q99720 1/20 0.33
MEN1 O00255 3/20 0.33
KMT2A Q03164 3/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33
NPY2R P49146 1/20 0.33
ALDH1A1 P00352 3/20 0.32
SMN1; SMN2 Q16637 2/20 0.32
TP53 P04637 1/20 0.32
HSP90AA1 P07900 1/20 0.32
CYP3A4 P08684 1/20 0.32
THRB P10828 1/20 0.32
ALOX15 P16050 1/20 0.32
TSHR P16473 1/20 0.32
CASP1 P29466 1/20 0.32
HIF1A Q16665 1/20 0.32
HSD17B10 Q99714 1/20 0.32
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2100739 0.87 CACNA2D1 (0.40) CACNA2D1SIGMAR1ALDH1A1CHRM2HTR1A
SCHEMBL2268681 0.81 TSHR (0.38) SIGMAR1MEN1KMT2AALDH1A1SMN1; SMN2
SCHEMBL2100765 0.75 KCNH2 (0.37) CACNA2D1SIGMAR1ALDH1A1KDM4ECHRM2
SCHEMBL2272256 0.75 TAAR1 (0.35) SIGMAR1MEN1KMT2ACYP3A4TSHR
SCHEMBL2101840 0.75 SIGMAR1 (0.33) SIGMAR1TSHRTDP1
SCHEMBL2101247 0.74 CACNA2D1 (0.36) CACNA2D1SIGMAR1MEN1KMT2ACYP2D6
SCHEMBL2102330 0.73 CACNA2D1 (0.35) CACNA2D1SIGMAR1ALDH1A1KDM4ECHRM2
SCHEMBL15914960 0.70 LMNA (0.38) SIGMAR1MEN1KMT2AALDH1A1SMN1; SMN2
SCHEMBL2100481 0.70 CACNA2D1 (0.36) CACNA2D1SIGMAR1ALDH1A1CHRM2HTR1A
SCHEMBL2103508 0.70 MEN1 (0.37) CACNA2D1SIGMAR1MEN1KMT2ACYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-8164166-B2 Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2012-04-24 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed
US-20090085170-A1 INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2009-04-02 US disclosed