SCHEMBL21044980

SCHEMBL21044980

CC1=C(C)C(C)([Zr](Cc2ccccc2)(Cc2ccccc2)C2(C)C(C)=C(C)C(C)=C2C)C(C)=C1C

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.34
TSHR P16473 2/20 0.34
IDO1 P14902 1/20 0.34
TP53 P04637 1/20 0.34
TRPA1 O75762 1/20 0.34
TAAR1 Q96RJ0 3/20 0.33
SLC6A2 P23975 2/20 0.33
MAOA P21397 1/20 0.33
SLC6A4 P31645 1/20 0.33
SLC6A3 Q01959 1/20 0.33
SIGMAR1 Q99720 1/20 0.33
CYP2A6 P11509 1/20 0.33
ADORA2A P29274 1/20 0.33
ADORA1 P30542 1/20 0.33
ELANE P08246 1/20 0.32
CALM1 P0DP23 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.31
KDM4E B2RXH2 2/20 0.30
TDP1 Q9NUW8 1/20 0.30
CYP3A4 P08684 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21044913 0.84 TP53 (0.34) ALDH1A1TSHRIDO1TP53TRPA1
SCHEMBL4425491 0.72 ELANE (0.33) TP53ELANE
SCHEMBL1135061 0.72 ELANE (0.33) TP53ELANE
SCHEMBL21084790 0.68 ELANE (0.48) ALDH1A1TSHRIDO1TP53MAOA
SCHEMBL21044879 0.68 LMNA (0.32) TSHR
SCHEMBL7883164 0.67 TP53 (0.30) TP53ELANE
SCHEMBL21044925 0.64 CA4 (0.34) TSHR
SCHEMBL726480 0.63 TSHR (0.48) ALDH1A1TSHRIDO1TP53TRPA1
SCHEMBL8596972 0.63 CALM1 (0.45) ALDH1A1TSHRIDO1TP53TRPA1
SCHEMBL7596414 0.63 ALDH1A1 (0.46) ALDH1A1TSHRIDO1TP53TRPA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110612315-B Catalyst system for forming multi-block copolymers 陶氏环球技术有限责任公司 2022-08-26 CN disclosed
CN-114402256-A Organic film, method for producing same, composition, laminate, and semiconductor device 富士胶片株式会社 2022-04-26 CN disclosed
CN-113383273-A Photosensitive resin composition, pattern forming method, cured film, laminate, and device 富士胶片株式会社 2021-09-10 CN disclosed
CN-113168093-A Pattern forming method, photosensitive resin composition, cured film, laminate, and device 富士胶片株式会社 2021-07-23 CN disclosed
CN-112004818-A Silicon-terminated organometallic compounds and methods of making the same 陶氏环球技术有限责任公司 2020-11-27 CN disclosed
EP-3492982-B1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, METHOD FOR PRODUCING CURED FILM, METHOD FOR PRODUCING LAMINATE, AND SEMICONDUCTOR DEVICE FUJIFILM CORP (JP) 2020-11-11 EP disclosed
CN-110612315-A Catalyst system for forming multi-block copolymers 陶氏环球技术有限责任公司 2019-12-24 CN disclosed
CN-110546171-A catalyst system for forming multi-block copolymers DOW GLOBAL TECHNOLOGIES LLC 2019-12-06 CN disclosed
EP-3492982-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, METHOD FOR PRODUCING CURED FILM, METHOD FOR PRODUCING LAMINATE, AND SEMICONDUCTOR DEVICE FUJIFILM Corporation (JP) 2019-06-05 EP disclosed
CN-101142247-A Pseudo-block copolymers and methods of using chain shuttling agents DOW GLOBAL TECHNOLOGIES INC (US) 2008-03-12 CN disclosed
CN-1954005-A Catalyst composition comprising shuttling agent for ethylene multi-block copolymer formation DOW GLOBAL TECHNOLOGIES INC (US) 2007-04-25 CN disclosed
CN-1216548-A Yttrium-containing metal complexes and olefin polymerization process DOW CHEMICAL CO (US) 1999-05-12 CN disclosed