SCHEMBL2111257

SCHEMBL2111257

CCCCCC(=O)/C(C)=N/OC(=O)c1ccccc1

nearest known ligand 0.56

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CES2 O00748 4/20 0.56
CES1 P23141 4/20 0.56
SMN1; SMN2 Q16637 2/20 0.47
MAPT P10636 3/20 0.46
CDK5 Q00535 2/20 0.46
CDK5R1 Q15078 2/20 0.46
PKM P14618 2/20 0.46
LMNA P02545 1/20 0.44
NPC1 O15118 4/20 0.43
RAB9A P51151 4/20 0.43
RBBP9 O75884 1/20 0.42
TNF P01375 1/20 0.42
KLF5 Q13887 1/20 0.42
NOD1 Q9Y239 1/20 0.42
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2111260 1.00 CES2 (0.56) CES2CES1SMN1; SMN2MAPTCDK5
SCHEMBL10779103 0.79 SMN1; SMN2 (0.62) SMN1; SMN2MAPTCDK5CDK5R1PKM
SCHEMBL12328529 0.79 SMN1; SMN2 (0.62) SMN1; SMN2MAPTCDK5CDK5R1PKM
SCHEMBL28249199 0.78 CES2 (0.49) CES2CES1SMN1; SMN2MAPTCDK5
SCHEMBL27893429 0.78 CES2 (0.49) CES2CES1SMN1; SMN2MAPTCDK5
SCHEMBL10658582 0.78 CES2 (0.49) CES2CES1SMN1; SMN2MAPTCDK5
SCHEMBL28907502 0.78 CES2 (0.49) CES2CES1SMN1; SMN2MAPTCDK5
SCHEMBL8532004 0.78 CES2 (0.49) CES2CES1SMN1; SMN2MAPTCDK5
SCHEMBL8532009 0.78 CES2 (0.49) CES2CES1SMN1; SMN2MAPTCDK5
SCHEMBL30956918 0.77 SMN1; SMN2 (0.56) SMN1; SMN2MAPTCDK5CDK5R1PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1959276-B1 Color Filter and Method of Manufacturing the same, and Solid-State Image Pickup Element FUJIFILM CORP (JP) 2014-11-12 EP disclosed
US-8158307-B2 Forming first color pattern in repeating pattern on substrate; forming second color pattern on substrate; removal by dry etching; forming third color pattern FUJIFILM CORPORATION (JP) 2012-04-17 US disclosed
US-20080206659-A1 COLOR FILTER AND METHOD OF MANUFACTURING THE SAME, AND SOLID-STATE IMAGE PICKUP ELEMENT FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
EP-1959276-A2 Color Filter and Method of Manufacturing the same, and Solid-State Image Pickup Element FUJIFILM Corporation (JP) 2008-08-20 EP disclosed