SCHEMBL21114727

SCHEMBL21114727

CCCCCCCC[Si](C)(CCCCCCCC)O[Si](C)(CCCCCCCC)CCCCCCCC

nearest known ligand 0.44

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.44
THRB P10828 1/20 0.44
DNM1 Q05193 7/20 0.35
ALDH1A1 P00352 3/20 0.35
LMNA P02545 2/20 0.35
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
HSD17B10 Q99714 1/20 0.35
SLC22A1 O15245 1/20 0.35
EPHX1 P07099 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL957733 0.94 TSHR (0.37) TSHRTHRBLMNASLC22A1
SCHEMBL15847538 0.90 TSHR (0.40) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL30466503 0.90 TSHR (0.40) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL29628957 0.90 TSHR (0.40) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL31196697 0.90 TSHR (0.40) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL38655990 0.90 TSHR (0.40) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL2513042 0.90 TSHR (0.40) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL38654723 0.90 TSHR (0.40) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL31084192 0.90 TSHR (0.40) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL30466502 0.90 TSHR (0.40) TSHRTHRBDNM1ALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025106343-A1 ETCHING METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2025-05-22 WO claimed
US-20250157825-A1 ETCHING METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2025-05-15 US claimed
US-20240258111-A1 Surface Treatment Compositions and Methods FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2024-08-01 US claimed
US-11447642-B2 Methods of using surface treatment compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2022-09-20 US claimed
US-11174394-B2 Surface treatment compositions and articles containing same FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2021-11-16 US claimed
US-20210122925-A1 METHODS OF USING SURFACE TREATMENT COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2021-04-29 US claimed
CN-112513192-A Surface treatment composition and method 富士胶片电子材料美国有限公司 2021-03-16 CN claimed
CN-111565859-A Surface treatment composition and method 富士胶片电子材料美国有限公司 2020-08-21 CN claimed
US-20200035494-A1 Surface Treatment Compositions and Methods FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2020-01-30 US claimed
US-20190211210-A1 SURFACE TREATMENT COMPOSITIONS AND METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2019-07-11 US claimed
US-20260018421-A1 SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD CENTRAL GLASS CO LTD (JP) 2026-01-15 US disclosed
US-20250343040-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD CENTRAL GLASS CO LTD (JP) 2025-11-06 US disclosed
WO-2025106343-A1 ETCHING METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2025-05-22 WO disclosed
US-20250157825-A1 ETCHING METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2025-05-15 US disclosed
WO-2025096565-A1 ETCHING COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2025-05-08 WO disclosed
CN-111565859-A Surface treatment composition and method 富士胶片电子材料美国有限公司 2020-08-21 CN disclosed
WO-2020028214-A1 SURFACE TREATMENT COMPOSITIONS AND METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2020-02-06 WO disclosed
US-20200035494-A1 Surface Treatment Compositions and Methods FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2020-01-30 US disclosed
US-20190211210-A1 SURFACE TREATMENT COMPOSITIONS AND METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2019-07-11 US disclosed
WO-2019135901-A1 SURFACE TREATMENT COMPOSITIONS AND METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2019-07-11 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260018421-A1 SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD ESPL1, SMS, SGMS1 TSHR 2961/4885THRB 2882/4885DNM1 927/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.