Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 2/20 | 0.62 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.62 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.62 |
| ▸ | GLA | P06280 | 2/20 | 0.62 |
| ▸ | HPGD | P15428 | 2/20 | 0.62 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.62 |
| ▸ | MEN1 | O00255 | 1/20 | 0.62 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.62 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.62 |
| ▸ | PTPN22 | Q9Y2R2 | 1/20 | 0.47 |
| ▸ | CDK2 | P24941 | 2/20 | 0.47 |
| ▸ | GPR35 | Q9HC97 | 2/20 | 0.46 |
| ▸ | RNASEH1 | O60930 | 1/20 | 0.46 |
| ▸ | PTPN11 | Q06124 | 1/20 | 0.46 |
| ▸ | ATG4B | Q9Y4P1 | 1/20 | 0.46 |
| ▸ | ME2 | P23368 | 1/20 | 0.46 |
| ▸ | ME1 | P48163 | 1/20 | 0.46 |
| ▸ | ME3 | Q16798 | 1/20 | 0.46 |
| ▸ | LDHA | P00338 | 1/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29779946 | 0.81 | CYP1A2 (0.68) | CYP1A2KDM4EALDH1A1GLAHPGD | |
| SCHEMBL88986 | 0.81 | CYP1A2 (0.68) | CYP1A2KDM4EALDH1A1GLAHPGD | |
| SCHEMBL8078314 | 0.80 | ALDH1A1 (0.53) | CYP1A2KDM4EALDH1A1GLAHPGD | |
| Hydrochloric Acid SCHEMBL11313207 | 0.80 | CYP1A2 (0.66) | CYP1A2KDM4EALDH1A1GLAHPGD | |
| SCHEMBL28215197 | 0.79 | LDHA (0.60) | CYP1A2KDM4EALDH1A1GLAHPGD | |
| SCHEMBL11107827 | 0.79 | PTPN22 (0.63) | CYP1A2ALDH1A1HSD17B10MEN1CYP2C19 | |
| Anthracene-9-Carboxylic Acid SCHEMBL122832 | 0.78 | MEN1 (1.00) | CYP1A2KDM4EALDH1A1GLAHPGD | |
| Anthracene-9-Carboxylic Acid SCHEMBL29352186 | 0.78 | MEN1 (1.00) | CYP1A2KDM4EALDH1A1GLAHPGD | |
| SCHEMBL12492349 | 0.78 | PTPN22 (0.68) | CYP1A2KDM4EALDH1A1GLAHPGD | |
| SCHEMBL4268 | 0.77 | ALDH1A1 (0.61) | CYP1A2KDM4EALDH1A1GLAHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8158568-B2 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-04-17 | — | — | US | disclosed |
| EP-1641908-B1 | CLEANING COMPOSITION, METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD OF FORMING WIRING ON SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO LTD (JP) | 2010-11-17 | — | — | EP | disclosed |
| US-20100248477-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating a substrate therewith | YOKOI SHIGERU | 2010-09-30 | — | — | US | disclosed |
| CN-1849386-B | Cleaning composition, method for cleaning semiconductor substrate, and method for forming wiring on semiconductor substrate | TOKYO OHKA KOGYO CO LTD INTEL | 2010-07-28 | — | — | CN | disclosed |
| US-20100051582-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | YOKOI SHIGERU | 2010-03-04 | — | — | US | disclosed |
| CN-100504620-C | Etching solution for forming bimetallic mosaic structure and base plate treatment method | TOKYO APPLIED CHEMICAL INDUSTR (JP) | 2009-06-24 | — | — | CN | disclosed |
| US-20090156005-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | YOKOI SHIGERU | 2009-06-18 | — | — | US | disclosed |
| US-7442675-B2 | Cleaning composition and method of cleaning semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-10-28 | — | — | US | disclosed |
| US-20060241012-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | YOKOI SHIGERU | 2006-10-26 | — | — | US | disclosed |
| CN-1849386-A | Cleaning composition, method for cleaning semiconductor substrate, and method for forming wiring on semiconductor substrate | TOKYO OHKA KOGYO CO LTD INTEL (JP) | 2006-10-18 | — | — | CN | disclosed |
| US-20040259761-A1 | Cleaning composition, method of cleaning semiconductor substrate, and method of forming wiring on semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. INTEL CORPORATION | 2004-12-23 | — | — | US | disclosed |
| US-20040121937-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-06-24 | — | — | US | disclosed |
| CN-1495535-A | Etching solution for forming bimetallic mosaic structure craft and base phate treatment method | ͬ�Ϳ�ҵ��ʽ���� | 2004-05-12 | — | — | CN | disclosed |
| US-6515073-B2 | Comprising di-, tri- and/or tetra-(alkoxy/phenoxy)silanes and a thermosetting resin which can be condensed therewith which has an absorption capacity with respect to exposing light; can be etched at high rate for fine resist patterns | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-02-04 | — | — | US | disclosed |
| US-20010036998-A1 | Anti-reflective coating-forming composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-11-01 | — | — | US | disclosed |