SCHEMBL8078314

SCHEMBL8078314

O=C(O)c1c2ccccc2cc2cccc(-c3ccc(O)c4c(O)c5ccccc5c(O)c34)c12

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 3/20 0.53
▸ HSD17B10 Q99714 3/20 0.53
▸ MEN1 O00255 2/20 0.53
▸ KMT2A Q03164 2/20 0.53
▸ CYP1A2 P05177 2/20 0.53
▸ HPGD P15428 2/20 0.53
▸ KDM4E B2RXH2 1/20 0.53
▸ GLA P06280 1/20 0.53
▸ CYP2C19 P33261 1/20 0.53
▸ MCL1 Q07820 3/20 0.44
▸ ACMSD Q8TDX5 1/20 0.44
▸ ME2 P23368 1/20 0.40
▸ ME1 P48163 1/20 0.40
▸ ME3 Q16798 1/20 0.40
▸ DNMT1 P26358 1/20 0.40
▸ CACNA1B Q00975 1/20 0.40
▸ APBA1 Q02410 1/20 0.40
▸ APOBEC3G Q9HC16 1/20 0.40
▸ HIF1A Q16665 2/20 0.39
▸ CYP3A4 P08684 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2113598 0.80 CYP1A2 (0.62) ALDH1A1HSD17B10MEN1KMT2ACYP1A2
SCHEMBL69796 0.73 ALDH1A1 (0.67) ALDH1A1HSD17B10MEN1KMT2ACYP1A2
SCHEMBL27668321 0.72 MEN1 (0.65) ALDH1A1HSD17B10MEN1KMT2ACYP1A2
Hydrochloric Acid SCHEMBL8854745 0.72 ALDH1A1 (0.65) ALDH1A1HSD17B10MEN1KMT2ACYP1A2
SCHEMBL7054297 0.72 KMT2A (0.65) ALDH1A1HSD17B10MEN1KMT2ACYP1A2
Anthracene-9-Carboxylic Acid SCHEMBL29352186 0.72 MEN1 (1.00) ALDH1A1HSD17B10MEN1KMT2ACYP1A2
Anthracene-9-Carboxylic Acid SCHEMBL122832 0.72 MEN1 (1.00) ALDH1A1HSD17B10MEN1KMT2ACYP1A2
SCHEMBL8076729 0.71 KMT2A (0.42) ALDH1A1HSD17B10MEN1KMT2ACYP1A2
SCHEMBL88986 0.71 CYP1A2 (0.68) ALDH1A1HSD17B10MEN1KMT2ACYP1A2
SCHEMBL29779946 0.71 CYP1A2 (0.68) ALDH1A1HSD17B10MEN1KMT2ACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6068962-A NOVOLAK RESIN AS AN ALKALI-SOLUBLE COMPONENT; QUINONEDIAZIDE; ACID GENERATOR; ANTHRACENE DERIVATIVE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2000-05-30 — — US disclosed
EP-0831371-A2 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1998-03-25 — — EP disclosed
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